Inventor · disambiguated record
Helmuth Treichel
Also filed as: TREICHEL HELMUTH · TREICHEL HELMUTH W
13 granted patents·16 pending applications·345 citations·filing 1987–2015
93Inventor score
Top patents by PatentIndex Score
29 records- 0186US6693043B1Method for removing photoresist from low-k films in a downstream plasma systemNOVELLUS SYSTEMS INC·Filed 2002·Granted Feb 17, 2004·56 cites·36 claims
- 0283US6187684B1Methods for cleaning substrate surfaces after etch operationsLAM RES CORP·Filed 1999·Granted Feb 13, 2001·71 cites·22 claims
- 0382US5478780AMethod and apparatus for producing conductive layers or structures for VLSI circuitsSIEMENS AG·Filed 1992·Granted Dec 26, 1995·57 cites·3 claims
- 0478US6543084B2Wafer scrubbing brush coreLAM RES CORP·Filed 2001·Granted Apr 8, 2003·20 cites·5 claims
- 0577US10329447B2Polymer based roll coatingDIELECTRIC COATING IND·Filed 2015·Granted Jun 25, 2019·1 cites·9 claims
- 0670US6240588B1Wafer scrubbing brush coreLAM RES CORP·Filed 1999·Granted Jun 5, 2001·34 cites·20 claims
- 0765US6875091B2Method and apparatus for conditioning a polishing pad with sonic energyLAM RES CORP·Filed 2001·Granted Apr 5, 2005·12 cites·31 claims
- 0859US5399389AMethod for locally and globally planarizing chemical vapor deposition of SiO2 layers onto structured silicon substratesSIEMENS AG·Filed 1993·Granted Mar 21, 1995·31 cites·15 claims
- 0954US5629053AMethod for manufacturing microcrystalline cubic boron-nitride-layersSIEMENS AG·Filed 1991·Granted May 13, 1997·17 cites·11 claims
- 1054US2008038486A1Radical Assisted Batch Film DepositionTREICHEL HELMUTH·Filed 2007·Application pending·0 cites
- 1150US2007031598A1Method for depositing silicon-containing filmsOKUYAMA YOSHIKAZU·Filed 2006·Application pending·0 cites
- 1250US2007160756A1Apparatus and method for the deposition of ruthenium containing filmsTREICHEL HELMUTH·Filed 2006·Application pending·0 cites
- 1345US4755486AMethod of producing a defined arsenic doping in silicon semiconductor substratesSIEMENS AG·Filed 1987·Granted Jul 5, 1988·13 cites·11 claims
- 1444US6057229AMethod for metallizing submicron contact holes in semiconductor bodiesSIEMENS AG·Filed 1997·Granted May 2, 2000·12 cites·14 claims
- 1544US2007137794A1Thermal processing system with across-flow linerAVIZA TECH INC·Filed 2007·Application pending·0 cites
- 1643US6261407B1Method and apparatus for removal of thin films from wafersLAM RES CORP·Filed 1999·Granted Jul 17, 2001·10 cites·12 claims
- 1742US2006264066A1Multilayer multicomponent high-k films and methods for depositing the sameAVIZA TECH INC·Filed 2006·Application pending·0 cites
- 1842US2010117203A1Oxide-containing film formed from siliconAVIZA TECH INC·Filed 2007·Application pending·0 cites
- 1941US4990365AMethod for producing silicon boronitride layersSIEMENS AG·Filed 1989·Granted Feb 5, 1991·11 cites·12 claims
- 2041US2012129344A1Process and apparatus for removal of contaminating material from substratesTREICHEL HELMUTH·Filed 2010·Application pending·0 cites
- 2140US2003054730A1Systems for reducing photo-assisted corrosion in wafers during cleaning processesLAM RES CORP·Filed 2002·Application pending·0 cites
- 2240US2007010072A1Uniform batch film deposition process and films so producedAVIZA TECH INC·Filed 2006·Application pending·0 cites
- 2339US2012186572A1Silicon wafer sawing fluid and process for use thereofTREICHEL HELMUTH·Filed 2010·Application pending·0 cites
- 2437US2006159847A1Method and apparatus for low temperature dielectric deposition using monomolecular precursorsPORTER COLE·Filed 2005·Application pending·0 cites
- 2536US2012111361A1Method for substrate surface cleaningTREICHEL HELMUTH·Filed 2011·Application pending·0 cites
- 2636US2012111360A1Method and Apparatus for Cleaning a SubstrateTREICHEL HELMUTH·Filed 2010·Application pending·0 cites
- 2731US2011186088A1Substrate nest with drip removerMILLER KENNETH C·Filed 2010·Application pending·0 cites
- 2829US2002061718A1Method and system for reducing photo-assisted corrosion in wafers during cleaning processesTREICHEL·Filed 1999·Application pending·0 cites
- 2927US2001047810A1High rpm megasonic cleaningFiled 1999·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →