Inventor · disambiguated record
Hitoshi Higurashi
Also filed as: HIGURASHI HITOSHI
17 granted patents·3 pending applications·304 citations·filing 1995–2016
94Inventor score
Top patents by PatentIndex Score
20 records- 0194US7592611B2Creation method and conversion method of charged particle beam writing data, and writing method of charged particle beamNUFLARE TECHNOLOGY INC·Filed 2006·Granted Sep 22, 2009·28 cites·12 claims
- 0289US6047116AMethod for generating exposure data for lithographic apparatusTOSHIBA KK·Filed 1998·Granted Apr 4, 2000·62 cites·11 claims
- 0388US8207514B2Charged particle beam drawing apparatus and proximity effect correction method thereofHARA SHIGEHIRO·Filed 2010·Granted Jun 26, 2012·15 cites·10 claims
- 0488US7750324B2Charged particle beam lithography apparatus and charged particle beam lithography methodNUFLARE TECHNOLOGY INC·Filed 2008·Granted Jul 6, 2010·12 cites·10 claims
- 0588US7698682B2Writing error verification method of pattern writing apparatus and generation apparatus of writing error verification data for pattern writing apparatusNUFLARE TECHNOLOGY INC·Filed 2007·Granted Apr 13, 2010·12 cites·11 claims
- 0686US6313476B1Charged beam lithography systemTOSHIBA KK·Filed 1999·Granted Nov 6, 2001·56 cites·12 claims
- 0784US7949966B2Data verification method, charged particle beam writing apparatus, and computer-readable storage medium with programNUFLARE TECHNOLOGY INC·Filed 2008·Granted May 24, 2011·8 cites·15 claims
- 0879US7504645B2Method of forming pattern writing data by using charged particle beamNUFLARE TECHNOLOGY INC·Filed 2007·Granted Mar 17, 2009·17 cites·16 claims
- 0974US8188449B2Charged particle beam drawing method and apparatusSHIBATA HAYATO·Filed 2010·Granted May 29, 2012·4 cites·10 claims
- 1073US8280632B2Apparatus and method for inspecting overlapping figure, and charged particle beam writing apparatusSAKAMOTO SHINJI·Filed 2009·Granted Oct 2, 2012·4 cites·9 claims
- 1172US7786453B2Charged-particle beam pattern writing method and apparatus with a pipeline process to transfer dataNUFLARE TECHNOLOGY INC·Filed 2007·Granted Aug 31, 2010·4 cites·10 claims
- 1265US6248508B1Manufacturing a circuit elementTOSHIBA KK·Filed 1998·Granted Jun 19, 2001·24 cites·28 claims
- 1353US2013032707A1Charged particle beam drawing apparatus and electrical charging effect correction method thereofNAKAYAMADA NORIAKI·Filed 2012·Application pending·0 cites
- 1452US6566662B1Charged beam exposure systemTOSHIBA KK·Filed 1999·Granted May 20, 2003·21 cites·9 claims
- 1551US6319642B1Electron beam exposure apparatusTOSHIBA KK·Filed 1999·Granted Nov 20, 2001·13 cites·6 claims
- 1651US5679961ACorrelation tunnel deviceTOSHIBA KK·Filed 1995·Granted Oct 21, 1997·14 cites·13 claims
- 1750US2011121208A1Charged particle beam drawing apparatus and electrical charging effect correction method thereofNUFLARE TECHNOLOGY INC·Filed 2010·Application pending·0 cites
- 1842US5646559ASingle-electron tunnelling logic deviceTOSHIBA KK·Filed 1995·Granted Jul 8, 1997·10 cites·7 claims
- 1937US2012286174A1Charged particle beam writing apparatus and charged particle beam writing methodGOMI SAORI·Filed 2012·Application pending·0 cites
- 2031US9734981B2Charged particle beam writing apparatus and charged particle beam writing methodNUFLARE TECHNOLOGY INC·Filed 2016·Granted Aug 15, 2017·0 cites·10 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →