Inventor · disambiguated record
Hiroichi Inada
Also filed as: INADA HIROICHI
31 granted patents·2 pending applications·789 citations·filing 1994–2023
97Inventor score
Top patents by PatentIndex Score
33 records- 0195US11273464B2Substrate processing apparatusTOKYO ELECTRON LTD·Filed 2020·Granted Mar 15, 2022·10 cites·12 claims
- 0295US6419408B1Developing process and developing unitTOKYO ELECTRON LTD·Filed 1999·Granted Jul 16, 2002·35 cites·15 claims
- 0394US5658615AMethod of forming coating film and apparatus thereforTOKYO ELECTRON LTD·Filed 1994·Granted Aug 19, 1997·187 cites·23 claims
- 0492US8256370B2Coating apparatus and methodKITANO TAKAHIRO·Filed 2009·Granted Sep 4, 2012·21 cites·19 claims
- 0592US6752872B2Coating unit and coating methodTOKYO ELECTRON LTD·Filed 2001·Granted Jun 22, 2004·50 cites·9 claims
- 0690US7802536B2Apparatus and method of forming an applied filmTOKYO ELECTRON LTD·Filed 2006·Granted Sep 28, 2010·15 cites·16 claims
- 0790US6063190AMethod of forming coating film and apparatus thereforTOKYO ELECTRON LTD·Filed 1999·Granted May 16, 2000·94 cites·7 claims
- 0890US5942035ASolvent and resist spin coating apparatusTOKYO ELECTRON LTD·Filed 1996·Granted Aug 24, 1999·103 cites·13 claims
- 0989US8808798B2Coating methodKITANO TAKAHIRO·Filed 2012·Granted Aug 19, 2014·9 cites·17 claims
- 1087US10168618B2Liquid processing method and storage mediumTOKYO ELECTRON LTD·Filed 2015·Granted Jan 1, 2019·5 cites·5 claims
- 1187US8287954B2Apparatus and method of forming an applied filmYOSHIHARA KOUSUKE·Filed 2010·Granted Oct 16, 2012·7 cites·6 claims
- 1286US10643872B2Liquid processing apparatus, liquid processing method, and storage mediumTOKYO ELECTRON LTD·Filed 2017·Granted May 5, 2020·5 cites·10 claims
- 1383US6616762B2Treatment solution supply apparatus and treatment solution supply methodTOKYO ELECTRON LTD·Filed 2001·Granted Sep 9, 2003·29 cites·14 claims
- 1483US6541376B2Film forming method and film forming apparatusTOKYO ELECTRON LTD·Filed 2001·Granted Apr 1, 2003·24 cites·11 claims
- 1582US8225737B2Coating apparatus and methodKITANO TAKAHIRO·Filed 2009·Granted Jul 24, 2012·7 cites·17 claims
- 1682US5625433AApparatus and method for developing resist coated on a substrateTOKYO ELECTRON LTD·Filed 1995·Granted Apr 29, 1997·61 cites·23 claims
- 1780US9195138B2Liquid processing apparatus, liquid processing method and storage mediumSASAGAWA NORIHIKO·Filed 2011·Granted Nov 24, 2015·7 cites·13 claims
- 1880US6309116B1Substrate processing systemTOKYO ELECTRON LTD·Filed 2000·Granted Oct 30, 2001·26 cites·16 claims
- 1979US6730599B2Film forming method and film forming apparatusTOKYO ELECTRON LTD·Filed 2003·Granted May 4, 2004·18 cites·7 claims
- 2077US6919913B1Processing systemTOKYO ELECTRON LTD·Filed 2000·Granted Jul 19, 2005·21 cites·7 claims
- 2176US10074548B2Chemical liquid discharge mechanism, liquid processing apparatus, chemical liquid discharge method, and storage mediumTOKYO ELECTRON LTD·Filed 2015·Granted Sep 11, 2018·2 cites·17 claims
- 2276US8186298B2Coating film forming apparatus, use of coating film forming apparatus, and recording mediumOGATA NOBUHIRO·Filed 2008·Granted May 29, 2012·4 cites·12 claims
- 2375US6982102B2Coating unit and coating methodTOKYO ELECTRON LTD·Filed 2004·Granted Jan 3, 2006·15 cites·5 claims
- 2472US10755952B2Chemical liquid discharge mechanism, liquid processing apparatus, chemical liquid discharge method, and storage mediumTOKYO ELECTRON LTD·Filed 2018·Granted Aug 25, 2020·1 cites·6 claims
- 2571US8551563B2Coating methodKITANO TAKAHIRO·Filed 2012·Granted Oct 8, 2013·2 cites·5 claims
- 2669US2024085813A1Solution treatment apparatus and cleaning methodTOKYO ELECTRON LTD·Filed 2023·Application pending·0 cites
- 2763US11868057B2Solution treatment apparatus and cleaning methodTOKYO ELECTRON LTD·Filed 2021·Granted Jan 9, 2024·0 cites·19 claims
- 2861US6238107B1Developing apparatusTOKYO ELECTRON LTD·Filed 1999·Granted May 29, 2001·25 cites·25 claims
- 2957US7344600B2Substrate treatment apparatusTOKYO ELECTRON LTD·Filed 2002·Granted Mar 18, 2008·6 cites·18 claims
- 3051US12257611B2Cleaning jig, coating apparatus, and cleaning methodTOKYO ELECTRON LTD·Filed 2021·Granted Mar 25, 2025·0 cites·10 claims
- 3151US2024219839A1ContainerTOKYO ELECTRON LTD·Filed 2022·Application pending·0 cites
- 3250US11862485B2Nozzle standby device, liquid processing apparatus and operation method of liquid processing apparatusTOKYO ELECTRON LTD·Filed 2021·Granted Jan 2, 2024·0 cites·15 claims
- 3350US8758855B2Coating film forming apparatus, use of coating film forming apparatus, and recording mediumOGATA NOBUHIRO·Filed 2012·Granted Jun 24, 2014·0 cites·8 claims
Join the waitlist — get patent alerts
Get an alert when Hiroichi Inada files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →