Inventor · disambiguated record
Hirotoshi Ise
Also filed as: ISE HIROTOSHI
11 granted patents·3 pending applications·881 citations·filing 1990–2012
93Inventor score
Files withHITACHI LTD5RENESAS TECH CORP3MITSUBISHI ELECTRIC CORP2MITSUMORI TAKAHIRO2ASAHI GLASS CO LTD1
Top patents by PatentIndex Score
14 records- 0195US8967608B2Glass substrate-holding tool and method for producing an EUV mask blank by employing the sameMITSUMORI TAKAHIRO·Filed 2012·Granted Mar 3, 2015·521 cites·7 claims
- 0291US5140647AImage joining method and systemHITACHI LTD·Filed 1990·Granted Aug 18, 1992·120 cites·12 claims
- 0372US6768542B2Defect inspecting device for substrate to be processed and method of manufacturing semiconductor deviceRENESAS TECH CORP·Filed 2002·Granted Jul 27, 2004·18 cites·11 claims
- 0471US5563966AMethod and apparatus for processing coded image dataHITACHI LTD·Filed 1995·Granted Oct 8, 1996·57 cites·8 claims
- 0569US6218196B1Etching apparatus, etching method, manufacturing method of a semiconductor device, and semiconductor deviceMITSUBISHI ELECTRIC CORP·Filed 1998·Granted Apr 17, 2001·41 cites·9 claims
- 0664US7137352B2Plasma processing system in which wafer is retained by electrostatic chuckRENESAS TECH CORP·Filed 2001·Granted Nov 21, 2006·9 cites·8 claims
- 0760US5325483AImage information retrieval network systemHITACHI LTD·Filed 1990·Granted Jun 28, 1994·37 cites·8 claims
- 0858US6993854B2Centrifugal dryer, manufacturing method for semiconductor device and semiconductor manufacturing apparatusMITSUBISHI ELECTRIC ENG·Filed 2002·Granted Feb 7, 2006·8 cites·10 claims
- 0943US5887154ABusiness process simulation systemHITACHI LTD·Filed 1996·Granted Mar 23, 1999·47 cites·8 claims
- 1040US8837108B2Glass substrate-holding tool and method for producing an EUV mask blank by employing the sameMITSUMORI TAKAHIRO·Filed 2012·Granted Sep 16, 2014·0 cites·20 claims
- 1139US2011266140A1Process for producing reflective mask blank for euv lithographyASAHI GLASS CO LTD·Filed 2011·Application pending·0 cites
- 1237US2005024630A1Device for examining end partRENESAS TECH CORP·Filed 2004·Application pending·0 cites
- 1336US5999724ABusiness process simulation systemHITACHI LTD·Filed 1999·Granted Dec 7, 1999·23 cites·14 claims
- 1435US2002036001A1Cleaning equipment, cleaning method, semiconductor manufacturing device, and semiconductor deviceMITSUBISHI ELECTRIC CORP·Filed 2001·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →