Inventor · disambiguated record
Hiromi Kanda
Also filed as: KANDA HIROMI
45 granted patents·3 pending applications·348 citations·filing 1997–2015
98Inventor score
Top patents by PatentIndex Score
48 records- 0198US7700260B2Pattern forming methodFUJIFILM CORP·Filed 2007·Granted Apr 20, 2010·58 cites·23 claims
- 0295US8080363B2Resin for hydrophobitizing resist surface, method for manufacturing the resin, and positive resist composition containing the resinKANDA HIROMI·Filed 2008·Granted Dec 20, 2011·26 cites·22 claims
- 0395US7531287B2Positive type resist composition for use in liquid immersion exposure and a method of forming the pattern using the sameFUJIFILM CORP·Filed 2005·Granted May 12, 2009·20 cites·12 claims
- 0494US8426109B2Positive type resist composition for use in liquid immersion exposure and a method of forming the pattern using the sameKANDA HIROMI·Filed 2011·Granted Apr 23, 2013·12 cites·14 claims
- 0594US7611820B2Positive resist composition and pattern-forming method using the sameFUJIFILM CORP·Filed 2006·Granted Nov 3, 2009·20 cites·12 claims
- 0694US7504194B2Positive resist composition and pattern making method using the sameFUJIFILM CORP·Filed 2006·Granted Mar 17, 2009·16 cites·20 claims
- 0793US7998654B2Positive resist composition and pattern-forming methodFUJIFILM CORP·Filed 2008·Granted Aug 16, 2011·16 cites·14 claims
- 0892US8039197B2Positive type resist composition for use in liquid immersion exposure and a method of forming the pattern using the sameFUJIFILM CORP·Filed 2008·Granted Oct 18, 2011·11 cites·12 claims
- 0992US8034537B2Positive resist composition and pattern forming methodFUJIFILM CORP·Filed 2008·Granted Oct 11, 2011·12 cites·14 claims
- 1092US7316886B2Protective film-forming composition for immersion exposure and pattern-forming method using the sameFUJIFILM CORP·Filed 2005·Granted Jan 8, 2008·14 cites·6 claims
- 1191US7790351B2Positive resist composition and pattern making method using the sameFUJIFILM CORP·Filed 2009·Granted Sep 7, 2010·11 cites·12 claims
- 1291US7368220B2Positive resist composition and pattern forming method using the sameFUJIFILM CORP·Filed 2006·Granted May 6, 2008·11 cites·8 claims
- 1390US7635554B2Positive resist composition and pattern forming methodFUJIFILM CORP·Filed 2008·Granted Dec 22, 2009·13 cites·16 claims
- 1488US7892722B2Pattern forming methodFUJIFILM CORP·Filed 2005·Granted Feb 22, 2011·9 cites·13 claims
- 1588US7273690B2Positive resist composition for immersion exposure and method of pattern formation with the sameFUJIFILM CORP·Filed 2005·Granted Sep 25, 2007·17 cites·20 claims
- 1687US8871421B2Positive resist composition and method of pattern formation with the sameKANDA HIROMI·Filed 2006·Granted Oct 28, 2014·10 cites·66 claims
- 1786US8389200B2Pattern forming methodKANNA SHINICHI·Filed 2009·Granted Mar 5, 2013·7 cites·22 claims
- 1884US7811740B2Positive resist composition and pattern-forming method using the sameFUJIFILM CORP·Filed 2005·Granted Oct 12, 2010·6 cites·16 claims
- 1983US8362140B2Pigment-dispersed composition, colored photosensitive composition, photocurable composition, color filter, liquid crystal display device, and solid-state image pickup deviceFUJIFILM CORP·Filed 2009·Granted Jan 29, 2013·6 cites·9 claims
- 2082US7803511B2Positive resist composition for immersion exposure and pattern-forming method using the sameFUJIFILM CORP·Filed 2006·Granted Sep 28, 2010·5 cites·11 claims
- 2179US7666574B2Positive resist composition and pattern forming methodFUJIFILM CORP·Filed 2008·Granted Feb 23, 2010·5 cites·10 claims
- 2277US8343708B2Positive resist composition and pattern forming methodFUJIFILM CORP·Filed 2011·Granted Jan 1, 2013·2 cites·19 claims
- 2377US7645557B2Positive resist composition for immersion exposure and pattern forming method using the sameFUJIFILM CORP·Filed 2006·Granted Jan 12, 2010·4 cites·14 claims
- 2476US9541831B2Positive resist composition and method of pattern formation with the sameFUJIFILM CORP·Filed 2015·Granted Jan 10, 2017·1 cites·17 claims
- 2576US8241833B2Positive resist composition and pattern-forming method using the sameKANDA HIROMI·Filed 2010·Granted Aug 14, 2012·2 cites·8 claims
- 2676US7785767B2Positive resist composition and pattern forming method using the sameFUJIFILM CORP·Filed 2008·Granted Aug 31, 2010·3 cites·19 claims
- 2775US9057952B2Positive resist composition and method of pattern formation with the sameKANDA HIROMI·Filed 2012·Granted Jun 16, 2015·1 cites·34 claims
- 2870US8697329B2Positive resist composition and pattern forming method using the sameKANDA HIROMI·Filed 2008·Granted Apr 15, 2014·2 cites·27 claims
- 2970US7482112B2Pattern forming methodFUJIFILM CORP·Filed 2007·Granted Jan 27, 2009·2 cites·12 claims
- 3068US7947421B2Positive resist composition for immersion exposure and pattern-forming method using the sameFUJIFILM CORP·Filed 2006·Granted May 24, 2011·2 cites·12 claims
- 3167US10678132B2Resin for hydrophobilizing resist surface, method for production thereof, and positive resist composition containing the resinKANDA HIROMI·Filed 2008·Granted Jun 9, 2020·2 cites·13 claims
- 3266US8741537B2Positive resist composition and pattern-forming method using the sameKANDA HIROMI·Filed 2006·Granted Jun 3, 2014·2 cites·10 claims
- 3364US7906268B2Positive resist composition for immersion exposure and pattern-forming method using the sameFUJIFILM CORP·Filed 2005·Granted Mar 15, 2011·1 cites·4 claims
- 3462US9081279B2Positive resist composition, resin used for the positive resist composition, compound used for synthesis of the resin and pattern forming method using the positive resist compositionFUJIFILM CORP·Filed 2014·Granted Jul 14, 2015·0 cites·70 claims
- 3561US7550250B2Positive resist composition and pattern forming method using the sameFUJIFILM CORP·Filed 2006·Granted Jun 23, 2009·5 cites·17 claims
- 3659US2008305433A1Positive resist composition and method of pattern formation with the sameFUJIFILM CORP·Filed 2008·Application pending·0 cites
- 3757US9709891B2Positive resist composition, resin used for the positive resist composition, compound used for synthesis of the resin and pattern forming method using the positive resist compositionFUJIFILM CORP·Filed 2015·Granted Jul 18, 2017·0 cites·24 claims
- 3855US8679724B2Positive resist composition, resin used for the positive resist composition, compound used for synthesis of the resin and pattern forming method using the positive resist compositionKANDA HIROMI·Filed 2006·Granted Mar 25, 2014·0 cites·33 claims
- 3954US7771912B2Positive resist composition and pattern forming method using the sameFUJIFILM CORP·Filed 2006·Granted Aug 10, 2010·4 cites·16 claims
- 4049US9442372B2Pigment dispersion composition, photocurable composition and color filterKANDA HIROMI·Filed 2008·Granted Sep 13, 2016·0 cites·14 claims
- 4149US7842452B2Pattern forming methodFUJIFILM CORP·Filed 2008·Granted Nov 30, 2010·2 cites·27 claims
- 4248US8426101B2Photosensitive composition, pattern-forming method using the photosensitve composition and compound in the photosensitive compositionWADA KENJI·Filed 2006·Granted Apr 23, 2013·0 cites·62 claims
- 4341US2006036005A1Protective film-forming composition for immersion exposure and pattern forming method using the sameFUJI PHOTO FILM CO LTD·Filed 2005·Application pending·0 cites
- 4441US2006008748A1Protective film-forming composition for immersion exposure and pattern-forming method using the sameFUJI PHOTO FILM CO LTD·Filed 2005·Application pending·0 cites
- 4540US9023576B2Positive resist composition for immersion exposure and pattern-forming method using the sameINABE HARUKI·Filed 2010·Granted May 5, 2015·0 cites·24 claims
- 4639US6020612ASemiconductor integrated circuit having efficient layout of wiring linesFUJITSU LTD·Filed 1997·Granted Feb 1, 2000·8 cites·10 claims
- 4733US8945810B2Positive resist composition and pattern-forming methodNISHIYAMA FUMIYUKI·Filed 2011·Granted Feb 3, 2015·0 cites·34 claims
- 4833US8808975B2Positive resist composition for immersion exposure and pattern-forming method using the sameINABE HARUKI·Filed 2010·Granted Aug 19, 2014·0 cites·7 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →