Inventor · disambiguated record
Hirotomo Kawahara
Also filed as: KAWAHARA HIROTOMO
18 granted patents·7 pending applications·6 citations·filing 2014–2025
88Inventor score
Top patents by PatentIndex Score
25 records- 0194US12216397B2Reflective mask blank for EUV lithography, mask blank for EUV lithography, and manufacturing methods thereofAGC INC·Filed 2023·Granted Feb 4, 2025·2 cites·20 claims
- 0293US11822229B2Reflective mask blank for EUV lithography, mask blank for EUV lithography, and manufacturing methods thereofAGC INC·Filed 2021·Granted Nov 21, 2023·2 cites·18 claims
- 0393US11698580B2Reflective mask blank for EUV lithographyAGC INC·Filed 2021·Granted Jul 11, 2023·2 cites·17 claims
- 0485US12235575B2Reflective mask blank for EUV lithography and substrate with conductive filmAGC INC·Filed 2024·Granted Feb 25, 2025·0 cites·28 claims
- 0584US12298660B2Reflective mask blank for EUV lithography, reflective mask for EUV lithography, and method for manufacturing sameAGC INC·Filed 2024·Granted May 13, 2025·0 cites·20 claims
- 0683US11934093B2Reflective mask blank for EUV lithography and substrate with conductive filmAGC INC·Filed 2023·Granted Mar 19, 2024·0 cites·18 claims
- 0781US11953822B2Reflective mask blank for EUV lithography, reflective mask for EUV lithography, and method for manufacturing sameAGC INC·Filed 2023·Granted Apr 9, 2024·0 cites·18 claims
- 0880US12038685B2Reflective mask blank for EUV lithographyAGC INC·Filed 2023·Granted Jul 16, 2024·0 cites·18 claims
- 0979US2025216765A1Reflective mask blank for euv lithography, reflective mask for euv lithography, and method for manufacturing sameAGC INC·Filed 2025·Application pending·0 cites
- 1076US2025147406A1Reflective mask blank for euv lithography and substrate with conductive filmAGC INC·Filed 2025·Application pending·0 cites
- 1169US2024201576A1Reflective mask blank for euv lithographyAGC INC·Filed 2024·Application pending·0 cites
- 1267US2015103399A1Method of producing glass substrate and glass substrateASAHI GLASS CO LTD·Filed 2014·Application pending·0 cites
- 1366US11982935B2Reflective mask blank for EUV lithographyAGC INC·Filed 2021·Granted May 14, 2024·0 cites·20 claims
- 1462US10239783B2Method of producing glass substrate and glass substrateASAHI GLASS CO LTD·Filed 2017·Granted Mar 26, 2019·0 cites·12 claims
- 1561US9922805B2Plasma source for a plasma CVD apparatus and a manufacturing method of an article using the plasma sourceASAHI GLASS CO LTD·Filed 2015·Granted Mar 20, 2018·0 cites·18 claims
- 1658US2022299862A1Reflective mask blank for euv lithography, reflective mask for euv lithography, and method for manufacturing mask blank and maskAGC INC·Filed 2022·Application pending·0 cites
- 1757US9988303B2Coating film-equipped glass substrate, and method for producing coating film-equipped glass substrateASAHI GLASS CO LTD·Filed 2016·Granted Jun 5, 2018·0 cites·14 claims
- 1856US10204767B2Plasma source for a plasma CVD apparatus and a manufacturing method of an article using the plasma sourceASAHI GLASS CO LTD·Filed 2018·Granted Feb 12, 2019·0 cites·20 claims
- 1956US2023288794A1Reflection-type mask blank for euv lithography, reflection-type mask for euv lithography, and manufacturing methods thereforAGC INC·Filed 2023·Application pending·0 cites
- 2053US10634887B2Protective film, reflective member, and method for producing protective filmAGC INC·Filed 2015·Granted Apr 28, 2020·0 cites·18 claims
- 2152US10654746B2Glass plate with antireflection filmAGC INC·Filed 2018·Granted May 19, 2020·0 cites·19 claims
- 2248US11036127B2Reflective mask blank and reflective maskAGC INC·Filed 2018·Granted Jun 15, 2021·0 cites·9 claims
- 2347US10576713B2Heat insulating glass unit for vehicle and manufacturing method thereofAGC INC·Filed 2017·Granted Mar 3, 2020·0 cites·20 claims
- 2444US10618838B2Heat insulating glass unit for vehicleAGC INC·Filed 2017·Granted Apr 14, 2020·0 cites·19 claims
- 2537US2017283952A1Plasma cvd apparatusASAHI GLASS CO LTD·Filed 2017·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →