Inventor · disambiguated record
Hisashi Kawano
Also filed as: KAWANO HISASHI
17 granted patents·7 pending applications·38 citations·filing 2007–2022
90Inventor score
Top patents by PatentIndex Score
24 records- 0191US10272478B2Substrate processing system, substrate cleaning method, and recording mediumTOKYO ELECTRON LTD·Filed 2015·Granted Apr 30, 2019·7 cites·24 claims
- 0287US9953840B2Substrate processing method and substrate processing systemTOKYO ELECTRON LTD·Filed 2016·Granted Apr 24, 2018·5 cites·11 claims
- 0386US9378940B2Substrate processing apparatus and substrate processing methodTOKYO ELECTRON LTD·Filed 2013·Granted Jun 28, 2016·9 cites·17 claims
- 0483US9818598B2Substrate cleaning method and recording mediumTOKYO ELECTRON LTD·Filed 2015·Granted Nov 14, 2017·4 cites·10 claims
- 0582US10923368B2Substrate processing apparatus, substrate processing method, and storage mediumTOKYO ELECTRON LTD·Filed 2018·Granted Feb 16, 2021·3 cites·13 claims
- 0680US11087992B2Substrate processing method and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2020·Granted Aug 10, 2021·1 cites·13 claims
- 0778US10121646B2Substrate processing apparatus and substrate processing methodTOKYO ELECTRON LTD·Filed 2017·Granted Nov 6, 2018·2 cites·7 claims
- 0873US10792711B2Substrate processing system, substrate cleaning method, and recording mediumTOKYO ELECTRON LTD·Filed 2018·Granted Oct 6, 2020·1 cites·12 claims
- 0971US10651061B2Substrate processing apparatus, substrate processing method and recording mediumTOKYO ELECTRON LTD·Filed 2018·Granted May 12, 2020·1 cites·14 claims
- 1070US11075096B2Substrate processing apparatusTOKYO ELECTRON LTD·Filed 2019·Granted Jul 27, 2021·1 cites·6 claims
- 1169US9870914B2Substrate processing apparatus and substrate processing methodTOKYO ELECTRON LTD·Filed 2016·Granted Jan 16, 2018·1 cites·7 claims
- 1268US7924396B2Coating/developing apparatus and pattern forming methodTOKYO ELECTRON LTD·Filed 2007·Granted Apr 12, 2011·3 cites·20 claims
- 1353US9805957B2Substrate processing apparatus, substrate processing method and computer-readable storage medium recording therein substrate processing programTOKYO ELECTRON LTD·Filed 2014·Granted Oct 31, 2017·0 cites·11 claims
- 1451US10192758B2Substrate processing apparatusTOKYO ELECTRON LTD·Filed 2017·Granted Jan 29, 2019·0 cites·9 claims
- 1551US2025054783A1Substrate processing apparatus and substrate processing methodTOKYO ELECTRON LTD·Filed 2022·Application pending·0 cites
- 1645US10062586B2Chemical fluid processing apparatus and chemical fluid processing methodTOKYO ELECTRON LTD·Filed 2014·Granted Aug 28, 2018·0 cites·13 claims
- 1741US2019096710A1Substrate processing apparatus, substrate processing method and recording mediumTOKYO ELECTRON LTD·Filed 2018·Application pending·0 cites
- 1840US2013284213A1Substrate processing apparatus and substrate processing methodTOKYO ELECTRON LTD·Filed 2013·Application pending·0 cites
- 1940US2014377463A1Liquid processing method, liquid processing apparatus and storage mediumTOKYO ELECTRON LTD·Filed 2014·Application pending·0 cites
- 2039US11424141B2Substrate processing apparatus, substrate processing method and recording mediumTOKYO ELECTRON LTD·Filed 2018·Granted Aug 23, 2022·0 cites·5 claims
- 2139US2012328273A1Heat treatment apparatus and heat treatment methodKAWANO HISASHI·Filed 2012·Application pending·0 cites
- 2238US2019096711A1Substrate processing apparatus and substrate processing methodTOKYO ELECTRON LTD·Filed 2018·Application pending·0 cites
- 2336US2017011907A1Substrate processing method, substrate processing apparatus, and storage mediumTOKYO ELECTRON LTD·Filed 2016·Application pending·0 cites
- 2430US9922849B2Substrate liquid processing apparatus having nozzle with multiple flow paths and substrate liquid processing method thereofTOKYO ELECTRON LTD·Filed 2015·Granted Mar 20, 2018·0 cites·14 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →