Inventor · disambiguated record
Hiroho Kitada
Also filed as: KITADA HIROHO
5 granted patents·11 pending applications·17 citations·filing 2004–2020
72Inventor score
Top patents by PatentIndex Score
16 records- 0183US8897906B2Wafer processing based on sensor detection and system learningOHASHI TOMOHIRO·Filed 2011·Granted Nov 25, 2014·8 cites·8 claims
- 0272US8569177B2Plasma processing apparatus and plasma processing methodOHASHI TOMOHIRO·Filed 2012·Granted Oct 29, 2013·3 cites·4 claims
- 0371US8828257B2Plasma processing apparatus and operation method thereofKITADA HIROHO·Filed 2009·Granted Sep 9, 2014·6 cites·8 claims
- 0453US11482435B2Plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2019·Granted Oct 25, 2022·0 cites·6 claims
- 0552US2008314321A1Plasma processing apparatusFURUSE MUNEO·Filed 2008·Application pending·0 cites
- 0649US11955360B2Electrostatic chuck and processing apparatusTOCALO CO LTD·Filed 2020·Granted Apr 9, 2024·0 cites·8 claims
- 0749US2015214083A1Plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2014·Application pending·0 cites
- 0845US2009321017A1Plasma Processing Apparatus and Plasma Processing MethodTSUBONE TSUNEHIKO·Filed 2008·Application pending·0 cites
- 0945US2009178764A1Plasma processing apparatus including electrostatic chuck with built-in heaterHITACHI HIGH TECH CORP·Filed 2008·Application pending·0 cites
- 1042US2006157198A1Member for plasma processing apparatus and plasma processing apparatusFURUSE MUNEO·Filed 2005·Application pending·0 cites
- 1140US2005193951A1Plasma processing apparatusFiled 2004·Application pending·0 cites
- 1239US2008023139A1Plasma processing apparatus and plasma processing methodYASUI NAOKI·Filed 2006·Application pending·0 cites
- 1338US2006291132A1Electrostatic chuck, wafer processing apparatus and plasma processing methodKANNO SEIICHIRO·Filed 2006·Application pending·0 cites
- 1436US2007267145A1Sample table and plasma processing apparatus provided with the sameKITADA HIROHO·Filed 2006·Application pending·0 cites
- 1533US2007044916A1Vacuum processing systemISOZAKI MASAKAZU·Filed 2005·Application pending·0 cites
- 1628US2016027618A1Plasma processing apparatus and plasma processing methodHITACHI HIGH TECH CORP·Filed 2015·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →