Inventor · disambiguated record
Hiroyuki Kitsunai
Also filed as: KITSUNAI HIROYUKI
31 granted patents·13 pending applications·437 citations·filing 1986–2016
97Inventor score
Top patents by PatentIndex Score
44 records- 0194US7158848B2Process monitoring device for sample processing apparatus and control method of sample processing apparatusHITACHI LTD·Filed 2006·Granted Jan 2, 2007·19 cites·2 claims
- 0294US6590179B2Plasma processing apparatus and methodHITACHI LTD·Filed 2001·Granted Jul 8, 2003·66 cites·29 claims
- 0393US7376479B2Process monitoring device for sample processing apparatus and control method of sample processing apparatusHITACHI LTD·Filed 2006·Granted May 20, 2008·15 cites·2 claims
- 0492US6616759B2Method of monitoring and/or controlling a semiconductor manufacturing apparatus and a system thereforHITACHI LTD·Filed 2001·Granted Sep 9, 2003·58 cites·9 claims
- 0588US7601240B2Disturbance-free, recipe-controlled plasma processing system and methodHITACHI LTD·Filed 2006·Granted Oct 13, 2009·9 cites·2 claims
- 0686US6879867B2Process monitoring device for sample processing apparatus and control method of sample processing apparatusHITACHI LTD·Filed 2001·Granted Apr 12, 2005·25 cites·19 claims
- 0784US8232522B2Semiconductor inspecting apparatusMIYA GO·Filed 2009·Granted Jul 31, 2012·8 cites·14 claims
- 0882US6733618B2Disturbance-free, recipe-controlled plasma processing system and methodHITACHI LTD·Filed 2001·Granted May 11, 2004·18 cites·9 claims
- 0981US5258047AHolder device and semiconductor producing apparatus having sameHITACHI LTD·Filed 1991·Granted Nov 2, 1993·73 cites·23 claims
- 1080US8519332B2Semiconductor inspecting apparatusMIYA GO·Filed 2012·Granted Aug 27, 2013·4 cites·15 claims
- 1180US7058467B2Process monitoring device for sample processing apparatus and control method of sample processing apparatusHITACHI LTD·Filed 2004·Granted Jun 6, 2006·16 cites·2 claims
- 1279US7567422B2Plasma processing apparatus and plasma processing methodHITACHI HIGH TECH CORP·Filed 2005·Granted Jul 28, 2009·6 cites·7 claims
- 1379US7343217B2System for monitoring and controlling a semiconductor manufacturing apparatus using prediction model equationHITACHI LTD·Filed 2006·Granted Mar 11, 2008·4 cites·5 claims
- 1477US6706543B2Method of monitoring and/or controlling a semiconductor manufacturing apparatus and a thereforHITACHI LTD·Filed 2002·Granted Mar 16, 2004·13 cites·7 claims
- 1576US6881352B2Disturbance-free, recipe-controlled plasma processing methodHITACHI LTD·Filed 2003·Granted Apr 19, 2005·12 cites·3 claims
- 1675US8680466B2Electron microscope, and specimen holding methodKANNO SEIICHIRO·Filed 2009·Granted Mar 25, 2014·5 cites·10 claims
- 1775US7058470B2Method of monitoring and/or controlling a semiconductor manufacturing apparatus and a system thereforHITACHI LTD·Filed 2004·Granted Jun 6, 2006·11 cites·9 claims
- 1873US6828165B2Semiconductor plasma processing apparatus with first and second processing state monitoring unitsHITACHI LTD·Filed 2003·Granted Dec 7, 2004·10 cites·3 claims
- 1968US8653455B2Charged particle beam device and evaluation method using the charged particle beam deviceKITSUNAI HIROYUKI·Filed 2010·Granted Feb 18, 2014·3 cites·11 claims
- 2066US6747239B2Plasma processing apparatus and methodHITACHI LTD·Filed 2003·Granted Jun 8, 2004·8 cites·15 claims
- 2164US6939435B1Plasma processing apparatus and processing methodHITACHI HIGH TECH CORP·Filed 2004·Granted Sep 6, 2005·7 cites·16 claims
- 2259US6186153B1Plasma treatment method and manufacturing method of semiconductor deviceHITACHI LTD·Filed 1998·Granted Feb 13, 2001·25 cites·16 claims
- 2357US2009120580A1Disturbance-Free, Recipe-Controlled Plasma Processing System And MethodKAGOSHIMA AKIRA·Filed 2009·Application pending·0 cites
- 2456US6743733B2Process for producing a semiconductor device including etching using a multi-step etching treatment having different gas compositions in each stepHITACHI LTD·Filed 2001·Granted Jun 1, 2004·4 cites·20 claims
- 2554US8921781B2Measurement or inspecting apparatusHITACHI HIGH TECHNOLOGIES·Filed 2013·Granted Dec 30, 2014·0 cites·8 claims
- 2653US2007193687A1Disturbance-free, recipe-controlled plasma processing system and methodKAGOSHIMA AKIRA·Filed 2007·Application pending·0 cites
- 2752US2008257863A1Plasma processing apparatus and method for stabilizing inner wall of processing chamberKITSUNAI HIROYUKI·Filed 2007·Application pending·0 cites
- 2850US7122096B2Method and apparatus for processing semiconductorHITACHI HIGH TECH CORP·Filed 2003·Granted Oct 17, 2006·2 cites·8 claims
- 2950US4708350AMagnetic liquid seal with magnetized deformable magnetHITACHI LTD·Filed 1986·Granted Nov 24, 1987·14 cites·18 claims
- 3048US7473332B2Method for processing semiconductorHITACHI HIGH TECH CORP·Filed 2005·Granted Jan 6, 2009·0 cites·10 claims
- 3148US7147747B2Plasma processing apparatus and plasma processing methodHITACHI HIGH TECH CORP·Filed 2003·Granted Dec 12, 2006·1 cites·18 claims
- 3248US7147748B2Plasma processing methodHITACHI HIGH TECH CORP·Filed 2004·Granted Dec 12, 2006·1 cites·12 claims
- 3348US2005284574A1Plasma processing apparatus and processing methodTANAKA JUNICHI·Filed 2005·Application pending·0 cites
- 3446US2005087297A1Plasma processing apparatus and method for stabilizing inner wall of processing chamberFiled 2004·Application pending·0 cites
- 3545US2005022932A1Disturbance-free, recipe-controlled plasma processing system and methodFiled 2004·Application pending·0 cites
- 3644US2005199183A1Plasma processing apparatusFiled 2004·Application pending·0 cites
- 3743US2007051470A1Plasma processing apparatus and methodIWAKOSHI TAKEHISA·Filed 2006·Application pending·0 cites
- 3843US2004194887A1Process for producing semiconductor deviceFiled 2004·Application pending·0 cites
- 3942US2014042338A1Stage apparatus and charged particle beam apparatusHITACHI HIGH TECH CORP·Filed 2013·Application pending·0 cites
- 4039US2006151429A1Plasma processing methodKITSUNAI HIROYUKI·Filed 2005·Application pending·0 cites
- 4139US2005072444A1Method for processing plasma processing apparatusFiled 2004·Application pending·0 cites
- 4238US2004147131A1Plasma processing apparatus and plasma processing methodFiled 2003·Application pending·0 cites
- 4336US10153128B2Charged particle beam apparatus and sample elevating apparatusHITACHI HIGH TECH CORP·Filed 2016·Granted Dec 11, 2018·0 cites·15 claims
- 4436US8653459B2Scanning electron microscopeKANNO SEIICHIRO·Filed 2010·Granted Feb 18, 2014·0 cites·20 claims
Join the waitlist — get patent alerts
Get an alert when Hiroyuki Kitsunai files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →