Inventor · disambiguated record
Hidetoshi Morokuma
Also filed as: MOROKUMA HIDETOSHI
73 granted patents·5 pending applications·719 citations·filing 2001–2015
99Inventor score
Files withHITACHI HIGH TECH CORP40HITACHI LTD10MIYAMOTO ATSUSHI5HITACHI SCIENCE SYSTEMS LTD3SUTANI TAKUMICHI3
Top patents by PatentIndex Score
78 records- 0197US7559047B2Method and apparatus for creating imaging recipeHITACHI HIGH TECH CORP·Filed 2006·Granted Jul 7, 2009·36 cites·15 claims
- 0295US7365322B2Method and apparatus for arranging recipe of scanning electron microscope and apparatus for evaluating shape of semiconductor device patternHITACHI LTD·Filed 2006·Granted Apr 29, 2008·28 cites·29 claims
- 0394US7923703B2Sample dimension inspecting/measuring method and sample dimension inspecting/measuring apparatusHITACHI HIGH TECH CORP·Filed 2007·Granted Apr 12, 2011·18 cites·13 claims
- 0492US7705300B2Charged particle beam adjusting method and charged particle beam apparatusHITACHI HIGH TECH CORP·Filed 2005·Granted Apr 27, 2010·15 cites·11 claims
- 0592US7518110B2Pattern measuring method and pattern measuring deviceHITACHI HIGH TECH CORP·Filed 2006·Granted Apr 14, 2009·13 cites·9 claims
- 0692US7187345B2Image forming method and charged particle beam apparatusHITACHI HIGH TECH CORP·Filed 2005·Granted Mar 6, 2007·14 cites·6 claims
- 0792US6627888B2Scanning electron microscopeHITACHI LTD·Filed 2001·Granted Sep 30, 2003·30 cites·9 claims
- 0891US7732792B2Pattern measurement apparatusHITACHI HIGH TECH CORP·Filed 2008·Granted Jun 8, 2010·23 cites·5 claims
- 0991US6909930B2Method and system for monitoring a semiconductor device manufacturing processHITACHI LTD·Filed 2002·Granted Jun 21, 2005·52 cites·37 claims
- 1090US8680464B2Mass spectrometerHASHIMOTO YUICHIRO·Filed 2011·Granted Mar 25, 2014·10 cites·12 claims
- 1190US8368013B2Analyzer, ionization apparatus and analyzing methodHITACHI HIGH TECH CORP·Filed 2011·Granted Feb 5, 2013·12 cites·26 claims
- 1290US7816062B2Method and apparatus for semiconductor device production process monitoring and method and apparatus for estimating cross sectional shape of a patternHITACHI HIGH TECH CORP·Filed 2006·Granted Oct 19, 2010·17 cites·27 claims
- 1390US7164128B2Method and apparatus for observing a specimenHITACHI HIGH TECH CORP·Filed 2004·Granted Jan 16, 2007·26 cites·22 claims
- 1489USD748813SSample preparation containerHITACHI HIGH TECH CORP·Filed 2013·Granted Feb 2, 2016·44 cites·1 claims
- 1589US8019161B2Method, device and computer program of length measurementHITACHI HIGH TECH CORP·Filed 2007·Granted Sep 13, 2011·14 cites·18 claims
- 1689US7817105B2Image forming method and charged particle beam apparatusHITACHI HIGH TECH CORP·Filed 2007·Granted Oct 19, 2010·9 cites·19 claims
- 1789US7679055B2Pattern displacement measuring method and pattern measuring deviceHITACHI HIGH TECH CORP·Filed 2007·Granted Mar 16, 2010·16 cites·4 claims
- 1889US7681159B2System and method for detecting defects in a semiconductor during manufacturing thereofHITACHI HIGH TECH CORP·Filed 2007·Granted Mar 16, 2010·15 cites·10 claims
- 1988US8669518B2Mass spectrometerISHIGURO KOUJI·Filed 2011·Granted Mar 11, 2014·16 cites·5 claims
- 2088US7935927B2Method and apparatus for observing a specimenHITACHI HIGH TECH CORP·Filed 2008·Granted May 3, 2011·7 cites·23 claims
- 2188US6713761B2Scanning electron microscopeHITACHI LTD·Filed 2001·Granted Mar 30, 2004·24 cites·8 claims
- 2287US8866070B2Mass spectrometerMOROKUMA HIDETOSHI·Filed 2011·Granted Oct 21, 2014·8 cites·15 claims
- 2387US8853630B2Scanning electron microscope and a method for imaging a specimen using the sameHITACHI HIGH TECH CORP·Filed 2014·Granted Oct 7, 2014·5 cites·10 claims
- 2487US7009178B2Scanning electron microscopeHITACHI SCIENCE SYSTEMS LTD·Filed 2005·Granted Mar 7, 2006·8 cites·3 claims
- 2586US7230243B2Method and apparatus for measuring three-dimensional shape of specimen by using SEMHITACHI HIGH TECH CORP·Filed 2005·Granted Jun 12, 2007·9 cites·15 claims
- 2685US9006679B2Mass spectrometerHITACHI HIGH TECH CORP·Filed 2013·Granted Apr 14, 2015·6 cites·7 claims
- 2785US7365325B2Method and apparatus for observing a specimenHITACHI HIGH TECH CORP·Filed 2007·Granted Apr 29, 2008·11 cites·12 claims
- 2885US6913861B2Method of observing exposure condition for exposing semiconductor device and its apparatus and method of manufacturing semiconductor deviceHITACHI HIGH TECH CORP·Filed 2003·Granted Jul 5, 2005·24 cites·18 claims
- 2984US8445871B2Pattern measurement apparatusMATSUOKA RYOICHI·Filed 2010·Granted May 21, 2013·6 cites·16 claims
- 3084US7889908B2Method and apparatus for measuring shape of a specimenHITACHI HIGH TECH CORP·Filed 2006·Granted Feb 15, 2011·7 cites·9 claims
- 3184US6929892B2Method of monitoring an exposure processHITACHI HIGH TECH CORP·Filed 2004·Granted Aug 16, 2005·25 cites·15 claims
- 3282US8803084B2Mass spectrometer and mass spectrometryHITACHI HIGH TECH CORP·Filed 2012·Granted Aug 12, 2014·5 cites·15 claims
- 3382US8158938B2Scanning electron microscope and a method for imaging a specimen using the sameMIYAMOTO ATSUSHI·Filed 2007·Granted Apr 17, 2012·5 cites·18 claims
- 3481US9543135B2Mass spectrometer and mass analyzing method for efficiently ionizing a sample with less carry-overKUMANO SHUN·Filed 2012·Granted Jan 10, 2017·6 cites·11 claims
- 3581US8338804B2Sample dimension inspecting/measuring method and sample dimension inspecting/measuring apparatusMOROKUMA HIDETOSHI·Filed 2011·Granted Dec 25, 2012·6 cites·15 claims
- 3681US8173962B2Pattern displacement measuring method and pattern measuring deviceSUTANI TAKUMICHI·Filed 2010·Granted May 8, 2012·6 cites·4 claims
- 3781US6897445B2Scanning electron microscopeHITACHI SCIENCE SYSTEMS LTD·Filed 2003·Granted May 24, 2005·13 cites·7 claims
- 3879US9184037B2Mass spectrometer and mass analyzing methodKUMANO SHUN·Filed 2012·Granted Nov 10, 2015·5 cites·19 claims
- 3979US8710430B2Mass spectrometry methodSUGIYAMA MASUYUKI·Filed 2012·Granted Apr 29, 2014·4 cites·8 claims
- 4078US8319194B2Drug detection equipmentHASHIMOTO MAKOTO·Filed 2011·Granted Nov 27, 2012·4 cites·19 claims
- 4178US7685560B2Method and apparatus for monitoring exposure processHITACHI HIGH TECH CORP·Filed 2004·Granted Mar 23, 2010·16 cites·14 claims
- 4277US7439505B2Scanning electron microscopeHITACHI LTD·Filed 2005·Granted Oct 21, 2008·2 cites·7 claims
- 4376US7381951B2Charged particle beam adjustment method and apparatusHITACHI HIGH TECH CORP·Filed 2005·Granted Jun 3, 2008·4 cites·9 claims
- 4476US7173268B2Method of measuring pattern dimension and method of controlling semiconductor device processHITACHI HIGH TECH CORP·Filed 2004·Granted Feb 6, 2007·9 cites·13 claims
- 4575US8642957B2Scanning electron microscope and a method for imaging a specimen using the sameMIYAMOTO ATSUSHI·Filed 2012·Granted Feb 4, 2014·2 cites·7 claims
- 4674US8507856B2Pattern measuring method and pattern measuring deviceSUTANI TAKUMICHI·Filed 2012·Granted Aug 13, 2013·2 cites·8 claims
- 4773USRE45224EMethod and apparatus for creating imaging recipeMIYAMOTO ATSUSHI·Filed 2009·Granted Oct 28, 2014·2 cites·29 claims
- 4873US7889909B2Pattern matching method and pattern matching programHITACHI HIGH TECH CORP·Filed 2007·Granted Feb 15, 2011·6 cites·8 claims
- 4973US7459712B2Method and apparatus of measuring pattern dimension and controlling semiconductor device process having an error revising unitHITACHI HIGH TECH CORP·Filed 2007·Granted Dec 2, 2008·2 cites·22 claims
- 5071US6791082B2Process conditions change monitoring systems that use electron beams, and related monitoring methodsHITACHI LTD·Filed 2003·Granted Sep 14, 2004·11 cites·4 claims
Showing the top 50 of 78 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →