Inventor · disambiguated record
Hideki Nasuno
Also filed as: NASUNO HIDEKI
12 granted patents·283 citations·filing 1995–2016
93Inventor score
Top patents by PatentIndex Score
12 records- 0191US6646275B2Charged particle beam exposure system and methodFUJITSU LTD·Filed 2002·Granted Nov 11, 2003·43 cites·7 claims
- 0284US6242751B1Charged-particle-beam exposure device and charged-particle-beam exposure methodFUJITSU LTD·Filed 1999·Granted Jun 5, 2001·33 cites·62 claims
- 0383US5528048ACharged particle beam exposure system and methodFUJITSU LTD·Filed 1995·Granted Jun 18, 1996·47 cites·21 claims
- 0479US5757015ACharged-particle-beam exposure device and charged-particle-beam exposure methodFUJITSU LTD·Filed 1996·Granted May 26, 1998·25 cites·22 claims
- 0579US5614725ACharged particle beam exposure system and methodFUJITSU LTD·Filed 1996·Granted Mar 25, 1997·36 cites·12 claims
- 0676US6118129AMethod and system for exposing an exposure pattern on an object by a charged particle beam which is shaped into a plurality of beam elementsFUJITSU LTD·Filed 1999·Granted Sep 12, 2000·30 cites·15 claims
- 0775US5969365ACharged-particle-beam exposure device and charged-particle-beam exposure methodFUJITSU LTD·Filed 1997·Granted Oct 19, 1999·20 cites·18 claims
- 0874US5977548ACharged particle beam exposure system and methodFUJITSU LTD·Filed 1996·Granted Nov 2, 1999·28 cites·11 claims
- 0967US5920077ACharged particle beam exposure systemFUJITSU LTD·Filed 1998·Granted Jul 6, 1999·21 cites·17 claims
- 1050US8779378B2Electron beam detector, electron beam processing apparatus, and method of manufacturing electron beam detectorADVANTEST CORP·Filed 2013·Granted Jul 15, 2014·0 cites·13 claims
- 1147US9859099B2Exposure apparatus and exposure methodADVANTEST CORP·Filed 2016·Granted Jan 2, 2018·0 cites·10 claims
- 1241US6784426B2Electron beam irradiation apparatus, electron beam exposure apparatus, and defect detection methodADVANTEST CORP·Filed 2003·Granted Aug 31, 2004·0 cites·17 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →