Inventor · disambiguated record
Hiroyuki Nishinaka
Also filed as: NISHINAKA HIROYUKI
12 granted patents·11 pending applications·0 citations·filing 2014–2022
79Inventor score
Top patents by PatentIndex Score
23 records- 0162US2023203662A1Film formation apparatus and method of using the sameDENSO CORP·Filed 2022·Application pending·0 cites
- 0259US11142842B2Film formation apparatus and film formation methodDENSO CORP·Filed 2019·Granted Oct 12, 2021·0 cites·2 claims
- 0355US10507454B2Photocatalyst material and method for producing sameSHARP KK·Filed 2014·Granted Dec 17, 2019·0 cites·7 claims
- 0454US11515146B2Method of forming gallium oxide filmNAGAOKA TATSUJI·Filed 2019·Granted Nov 29, 2022·0 cites·7 claims
- 0554US11371161B2Method of forming oxide film, method of manufacturing semiconductor device, and film forming apparatus configured to form oxide filmDENSO CORP·Filed 2020·Granted Jun 28, 2022·0 cites·11 claims
- 0654US2020173054A1Film formation apparatusTOYOTA MOTOR CO LTD·Filed 2019·Application pending·0 cites
- 0753US11373864B2Method of forming oxide film, method of manufacturing semiconductor device, and apparatus configured to form oxide filmDENSO CORP·Filed 2020·Granted Jun 28, 2022·0 cites·16 claims
- 0853US2023059168A1Film formation apparatus and method for manufacturing semiconductor deviceDENSO CORP·Filed 2022·Application pending·0 cites
- 0952US11424322B2Semiconductor device and method of manufacturing the sameNAGAOKA TATSUJI·Filed 2020·Granted Aug 23, 2022·0 cites·5 claims
- 1051US10576459B2Photocatalyst materialSHARP KK·Filed 2014·Granted Mar 3, 2020·0 cites·7 claims
- 1151US2022157598A1Method for forming film and manufacturing semiconductor deviceDENSO CORP·Filed 2022·Application pending·0 cites
- 1250US11443944B2Method of growing semiconductor layers, method of manufacturing semiconductor device, and method of growing balk crystalNAGAOKA TATSUJI·Filed 2020·Granted Sep 13, 2022·0 cites·14 claims
- 1350US11270882B2Film formation apparatus configured to supply mist of a solution to surface of a substrate and method of manufacturing semiconductor device using the film formation apparatusNAGAOKA TATSUJI·Filed 2020·Granted Mar 8, 2022·0 cites·9 claims
- 1450US2022205135A1Method for producing product having oxide filmDENSO CORP·Filed 2021·Application pending·0 cites
- 1550US2020360958A1Mist generator and film formation apparatusNAGAOKA TATSUJI·Filed 2020·Application pending·0 cites
- 1648US11699600B2Wafer processing apparatus and method for processing waferDENSO CORP·Filed 2021·Granted Jul 11, 2023·0 cites·14 claims
- 1748US11280023B2Film formation apparatus and method of manufacturing semiconductor deviceNAGAOKA TATSUJI·Filed 2020·Granted Mar 22, 2022·0 cites·11 claims
- 1846US11534791B2Mist generator, film formation apparatus, and method of forming film using the film formation apparatusNAGAOKA TATSUJI·Filed 2020·Granted Dec 27, 2022·0 cites·7 claims
- 1944US2020363192A1Method of measuring film thicknessNAGAOKA TATSUJI·Filed 2020·Application pending·0 cites
- 2044US2020273954A1Switching element and method of manufacturing the sameNAGAOKA TATSUJI·Filed 2020·Application pending·0 cites
- 2142US2020027730A1Film forming method and method of manufacturing semiconductor deviceNAGAOKA TATSUJI·Filed 2019·Application pending·0 cites
- 2242US2020027731A1Film forming method and manufacturing method of semiconductor deviceNAGAOKA TATSUJI·Filed 2019·Application pending·0 cites
- 2339US2019259610A1Film forming method and method of manufacturing semiconductor deviceTOYOTA MOTOR CO LTD·Filed 2019·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →