Inventor · disambiguated record
Hideaki Sakurai
Also filed as: SAKURAI HIDEAKI
106 granted patents·66 pending applications·428 citations·filing 1979–2025
99Inventor score
Files withMITSUBISHI MATERIALS CORP72MITSUBISHI HEAVY IND LTD23TOSHIBA KK23KIOXIA CORP15TOSHIBA MEMORY CORP11
Top patents by PatentIndex Score
172 records- 0194US10407331B2Scale detection device and method for concentrating device, and water reclamation processing treatment systemMITSUBISHI HEAVY IND LTD·Filed 2014·Granted Sep 10, 2019·16 cites·24 claims
- 0293US6550990B2Substrate processing apparatus and processing method by use of the apparatusTOSHIBA KK·Filed 2001·Granted Apr 22, 2003·75 cites·23 claims
- 0390US4269043ACoupling for resiliently connecting two shafts for transmission of torqueTOYOTA MOTOR CO LTD·Filed 1979·Granted May 26, 1981·53 cites·7 claims
- 0487US9969629B2Water treatment process and water treatment systemMITSUBISHI HEAVY IND LTD·Filed 2015·Granted May 15, 2018·2 cites·28 claims
- 0587US8025732B2Apparatus for processing a substrateTOSHIBA KK·Filed 2008·Granted Sep 27, 2011·10 cites·7 claims
- 0687US7390365B2Developing method, substrate treating method, and substrate treating apparatusTOSHIBA KK·Filed 2004·Granted Jun 24, 2008·27 cites·15 claims
- 0784US6929903B2Developing method, substrate treating method, and substrate treating apparatusTOSHIBA KK·Filed 2003·Granted Aug 16, 2005·21 cites·10 claims
- 0883US11286576B2Electrodeposition solution and method for producing conductor with insulating film using sameMITSUBISHI MATERIALS CORP·Filed 2018·Granted Mar 29, 2022·1 cites·12 claims
- 0983US10160671B2Water treatment process and water treatment systemMITSUBISHI HEAVY IND LTD·Filed 2015·Granted Dec 25, 2018·2 cites·38 claims
- 1083US8956689B2Method for producing ferroelectric thin filmWATANABE TOSHIAKI·Filed 2012·Granted Feb 17, 2015·5 cites·10 claims
- 1182US6333493B1Heat treating method and heat treating apparatusTOSHIBA KK·Filed 2000·Granted Dec 25, 2001·20 cites·3 claims
- 1279US10532386B2Continuous-cast slab, method and apparatus of manufacturing the same, and method and apparatus of manufacturing thick steel plateNIPPON STEEL & SUMITOMO METAL CORP·Filed 2016·Granted Jan 14, 2020·1 cites·17 claims
- 1378US9914653B2Water treatment process and water treatment systemMITSUBISHI HEAVY IND LTD·Filed 2015·Granted Mar 13, 2018·1 cites·34 claims
- 1477US9289720B2System and method for treating mercury in flue gasKAGAWA SEIJI·Filed 2012·Granted Mar 22, 2016·3 cites·2 claims
- 1577US7094522B2Developing method, substrate treating method, and substrate treating apparatusTOSHIBA KK·Filed 2004·Granted Aug 22, 2006·14 cites·4 claims
- 1677US2025013146A1Template and manufacturing method thereofKIOXIA CORP·Filed 2024·Application pending·0 cites
- 1776US11230788B2Electrodeposition liquid and electrodeposition-coated articleMITSUBISHI MATERIALS CORP·Filed 2017·Granted Jan 25, 2022·1 cites·6 claims
- 1876US10195827B2Ferroelectric film and method of producing sameMITSUBISHI MATERIALS CORP·Filed 2016·Granted Feb 5, 2019·1 cites·8 claims
- 1976US2023260780A1Method for cleaning substrate and cleaning deviceKIOXIA CORP·Filed 2023·Application pending·0 cites
- 2073US9018118B2Dielectric thin film-forming composition, method of forming dielectric thin film and dielectric thin film formed by the methodMITSUBISHI MATERIALS CORP·Filed 2012·Granted Apr 28, 2015·2 cites·19 claims
- 2173US2025144677A1Method for cleaning substrate and cleaning deviceKIOXIA CORP·Filed 2025·Application pending·0 cites
- 2272US10112872B2Composition for forming Mn and Nb co-doped PZT-based piezoelectric filmMITSUBISHI MATERIALS CORP·Filed 2015·Granted Oct 30, 2018·1 cites·2 claims
- 2370US11651953B2Method for cleaning substrate and cleaning deviceKIOXIA CORP·Filed 2020·Granted May 16, 2023·0 cites·13 claims
- 2470US7001086B2Developing method, substrate treating method, and substrate treating apparatusTOSHIBA KK·Filed 2004·Granted Feb 21, 2006·9 cites·10 claims
- 2569US7138350B2MgO vapor deposition material and method for preparation thereofMITSUBISHI MATERIALS CORP·Filed 2002·Granted Nov 21, 2006·9 cites·26 claims
- 2669US6995104B2Polycrystalline MgO deposition material having adjusted Si concentrationMITSUBISHI MATERIALS CORP·Filed 2003·Granted Feb 7, 2006·9 cites·3 claims
- 2769US6821616B1Protective thin film for FPDS, method for producing said thin film and FPDS using said thin filmMITSUBISHI MATERIALS CORP·Filed 1999·Granted Nov 23, 2004·26 cites·5 claims
- 2868US9412485B2LaNiO3 thin film-forming composition and method of forming LaNiO3 thin film using the sameMITSUBISHI MATERIALS CORP·Filed 2014·Granted Aug 9, 2016·1 cites·6 claims
- 2968US2025216774A1Template and manufacturing method of semiconductor deviceKIOXIA CORP·Filed 2025·Application pending·0 cites
- 3067US2022291581A1Template and manufacturing method thereofKIOXIA CORP·Filed 2021·Application pending·0 cites
- 3166US8951698B2Method for forming pattern and method for producing original lithography maskTOSHIBA KK·Filed 2013·Granted Feb 10, 2015·1 cites·21 claims
- 3265US9251955B2PZT-based ferroelectric thin film and method of forming the sameMITSUBISHI MATERIALS CORP·Filed 2014·Granted Feb 2, 2016·1 cites·20 claims
- 3365US8951603B2Method for producing ferroelectric thin filmWATANABE TOSHIAKI·Filed 2012·Granted Feb 10, 2015·1 cites·10 claims
- 3463US11682566B2Processing apparatus for processing substrates of different typesKIOXIA CORP·Filed 2021·Granted Jun 20, 2023·0 cites·15 claims
- 3563US9666331B2Ferroelectric thin film-forming sol-gel solutionMITSUBISHI MATERIALS CORP·Filed 2014·Granted May 30, 2017·0 cites·4 claims
- 3663US2023296979A1Template and manufacturing method of semiconductor deviceKIOXIA CORP·Filed 2022·Application pending·0 cites
- 3762US11430585B2Insulated conductor and insulated conductor manufacturing methodMITSUBISHI MATERIALS CORP·Filed 2018·Granted Aug 30, 2022·0 cites·11 claims
- 3862US8501560B2Method for manufacturing thin film capacitor and thin film capacitor obtained by the sameSAKURAI HIDEAKI·Filed 2011·Granted Aug 6, 2013·1 cites·6 claims
- 3962US8017287B2Development method, method of manufacturing photomask, and method of manufacturing semiconductor deviceTOSHIBA KK·Filed 2009·Granted Sep 13, 2011·1 cites·19 claims
- 4062US6265126B1Hydrophobic metal oxide powder and application thereofMITSUBISHI MATERIALS CORP·Filed 1999·Granted Jul 24, 2001·16 cites·22 claims
- 4161US10882082B2Freeze cleaning apparatusTOSHIBA MEMORY CORP·Filed 2020·Granted Jan 5, 2021·0 cites·4 claims
- 4261US9093198B2Method of producing ferroelectric thin film-forming composition and application of the sameMITSUBISHI MATERIALS CORP·Filed 2014·Granted Jul 28, 2015·0 cites·8 claims
- 4361US9059405B2Ferroelectric thin film-forming sol-gel solutionMITSUBISHI MATERIALS CORP·Filed 2013·Granted Jun 16, 2015·0 cites·6 claims
- 4461US6483083B2Heat treatment method and a heat treatment apparatus for controlling the temperature of a substrate surfaceTOSHIBA KK·Filed 2001·Granted Nov 19, 2002·7 cites·11 claims
- 4561US5816661AVehicle seat structureTOYOTA MOTOR CO LTD·Filed 1996·Granted Oct 6, 1998·36 cites·21 claims
- 4660US11493846B2Pattern forming method and template manufacturing methodKIOXIA CORP·Filed 2020·Granted Nov 8, 2022·0 cites·14 claims
- 4760US10029929B2Water treatment process and water treatment systemMITSUBISHI HEAVY IND LTD·Filed 2015·Granted Jul 24, 2018·0 cites·24 claims
- 4860US9950936B2Water treatment process and water treatment systemMITSUBISHI HEAVY IND LTD·Filed 2015·Granted Apr 24, 2018·0 cites·18 claims
- 4960US9914652B2Water treatment process and water treatment systemMITSUBISHI HEAVY IND LTD·Filed 2015·Granted Mar 13, 2018·0 cites·34 claims
- 5060US9502636B2Composition for ferroelectric thin film formation, method for forming ferroelectric thin film, and ferroelectric thin film formed by the method thereofMITSUBISHI MATERIALS CORP·Filed 2014·Granted Nov 22, 2016·0 cites·7 claims
Showing the top 50 of 172 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →