Method for cleaning substrate and cleaning device

Abstract

According to one embodiment, a method including supplying a liquid onto a substrate, solidifying the liquid on the substrate to form a solidified body, and melting the solidified body of the liquid on the substrate is provided. When solidifying the liquid, an internal pressure of the liquid on the substrate is varied.

What is claimed is: 
     
         1 . A method for cleaning a substrate, comprising:
 dispensing a liquid onto the substrate mounted on a stage;   cooling the liquid on the substrate to a supercooled state;   varying an internal pressure of the liquid when a temperature of the liquid reaches a setpoint temperature to form a solidified body on the substrate; and   melting the solidified body on the substrate.   
     
     
         2 . The method according to  claim 1 , wherein the substrate is a nanoimprint template. 
     
     
         3 . The method according to  claim 1 , wherein the rotatable stage is disposed in a cleaning cup. 
     
     
         4 . The method according to  claim 1 , further comprising:
 measuring the temperature of the liquid on the substrate during the cooling of the liquid on the substrate.   
     
     
         5 . The method according to  claim 1 , wherein varying the internal pressure of the liquid includes dispensing an additional liquid onto the liquid on the substrate. 
     
     
         6 . The method according to  claim 1 , wherein varying the internal pressure of the liquid includes applying an acoustic wave to the liquid on the substrate. 
     
     
         7 . The method according to  claim 1 , wherein varying the internal pressure of the liquid includes vibrating the substrate. 
     
     
         8 . The method according to  claim 1 , wherein varying the internal pressure of the liquid includes vibrating the liquid on the substrate. 
     
     
         9 . The method according to  claim 1 , wherein
 the stage is inside a chamber, and   varying the internal pressure of the liquid includes changing the pressure inside the chamber.   
     
     
         10 . The method according to  claim 1 , further comprising:
 rinsing the liquid from the substrate after melting of the solidified body; and   drying the substrate after the rinsing of the liquid from the substrate.   
     
     
         11 . The method according to  claim 1 , further comprising:
 cooling the solidified body on the substrate to a temperature below a freezing point of the liquid.   
     
     
         12 . The method according to  claim 1 , wherein the liquid is deionized water. 
     
     
         13 . The method according to  claim 1 , wherein the cooling of the liquid on the substrate is performed by supplying cooling gas from a backside direction of the substrate through a pipe in a shaft for rotating the stage.