Inventor · disambiguated record
Hirotaka Shida
Also filed as: SHIDA HIROTAKA
10 granted patents·14 pending applications·67 citations·filing 2002–2013
88Inventor score
Top patents by PatentIndex Score
24 records- 0192US7560384B2Chemical mechanical polishing methodJSR CORP·Filed 2006·Granted Jul 14, 2009·20 cites·6 claims
- 0277US6726997B2Aqueous dispersion and coated productJSR CORP·Filed 2002·Granted Apr 27, 2004·16 cites·15 claims
- 0374US8492276B2Chemical mechanical polishing aqueous dispersion and chemical mechanical polishing methodABE TAICHI·Filed 2009·Granted Jul 23, 2013·8 cites·9 claims
- 0474US8480920B2Chemical mechanical polishing aqueous dispersion, method of preparing the same, chemical mechanical polishing aqueous dispersion preparation kit, and chemical mechanical polishing methodSHIDA HIROTAKA·Filed 2010·Granted Jul 9, 2013·4 cites·15 claims
- 0570US8574330B2Chemical mechanical polishing aqueous dispersion and chemical mechanical polishing method for semiconductor deviceNAMIE YUUJI·Filed 2007·Granted Nov 5, 2013·5 cites·14 claims
- 0670US8119517B2Chemical mechanical polishing method and method of manufacturing semiconductor deviceSHIDA HIROTAKA·Filed 2009·Granted Feb 21, 2012·3 cites·15 claims
- 0769US8506359B2Aqueous dispersion for chemical mechanical polishing and chemical mechanical polishing methodSHIDA HIROTAKA·Filed 2009·Granted Aug 13, 2013·5 cites·29 claims
- 0868US8470195B2Chemical mechanical polishing aqueous dispersion preparation set, method of preparing chemical mechanical polishing aqueous dispersion, chemical mechanical polishing aqueous dispersion, and chemical mechanical polishing methodKUNITANI EIICHIROU·Filed 2008·Granted Jun 25, 2013·4 cites·14 claims
- 0965US7378349B2Chemical mechanical polishing aqueous dispersion and chemical mechanical polishing methodJSR CORP·Filed 2005·Granted May 27, 2008·2 cites·8 claims
- 1054US2009181540A1Chemical mechanical polishing methodJSR CORP·Filed 2009·Application pending·0 cites
- 1153US2008274620A1Chemical mechanical polishing agent kit and chemical mechanical polishing method using the sameJSR CORP·Filed 2008·Application pending·0 cites
- 1249US2009124172A1Aqueous dispersion for chemical mechanical polishing, chemical mechanical polishing method, kit for chemical mechanical polishing, and kit for preparing aqueous dispersion for chemical mechanical polishingJSR CORP·Filed 2007·Application pending·0 cites
- 1349US2007128874A1Chemical mechanical polishing method and method of manufacturing semiconductor deviceTOSHIBA KK·Filed 2006·Application pending·0 cites
- 1448US2014011360A1Chemical mechanical polishing aqueous dispersion and chemical mechanical polishing method for semiconductor deviceJSR CORP·Filed 2013·Application pending·0 cites
- 1546US2011250756A1Aqueous dispersion for chemical mechanical polishing, chemical mechanical polishing method, kit for chemical mechanical polishing, and kit for preparing aqueous dispersion for chemical mechanical polishingTOSHIBA KK·Filed 2011·Application pending·0 cites
- 1643US2007049180A1Aqueous dispersion for chemical mechanical polishing, kit for preparing the aqueous dispersion, chemical mechanical polishing process, and process for producing semiconductor devicesTOSHIBA KK·Filed 2006·Application pending·0 cites
- 1743US2009302266A1Aqueous dispersion for chemical mechanical polishing, chemical mechanical polishing method, and kit for preparing aqueous dispersion for chemical mechanical polishingJSR CORP·Filed 2007·Application pending·0 cites
- 1843US2008045016A1Cleaning composition, cleaning method, and manufacturing method of semiconductor deviceJSR CORP·Filed 2007·Application pending·0 cites
- 1943US2004237413A1Chemical mechanical polishing agent kit and chemical mechanical polishing method using the sameJSR CORP·Filed 2004·Application pending·0 cites
- 2041US2011081780A1Aqueous dispersion for chemical mechanical polishing and chemical mechanical polishing methodJSR CORP·Filed 2009·Application pending·0 cites
- 2139US2010221918A1Aqueous dispersion for chemical mechanical polishing and method for preparing the same, kit for preparing aqueous dispersion for chemical mechanical polishing, and chemical mechanical polishing method for semiconductor deviceJSR CORP·Filed 2008·Application pending·0 cites
- 2234US2013316621A1Chemical mechanical polishing pad and chemical mechanical polishing method using sameMAEKAWA AYAKO·Filed 2011·Application pending·0 cites
- 2332US8257504B2Surface treatment composition, surface treatment method, and method for manufacturing semiconductor deviceMORI YASUMASA·Filed 2010·Granted Sep 4, 2012·0 cites·13 claims
- 2429US2012322348A1Pad for chemical mechanical polishing and method of chemical mechanical polishing using sameYOKOI KATSUTAKA·Filed 2010·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →