Inventor · disambiguated record
Hironobu Taoka
Also filed as: TAOKA HIRONOBU
14 granted patents·3 pending applications·223 citations·filing 1995–2013
92Inventor score
Top patents by PatentIndex Score
17 records- 0189US6343370B1Apparatus and process for pattern distortion detection for semiconductor process and semiconductor device manufactured by use of the apparatus or processMITSUBISHI ELECTRIC CORP·Filed 1998·Granted Jan 29, 2002·84 cites·20 claims
- 0277US8103977B2Semiconductor device and its manufacturing method, semiconductor manufacturing mask, and optical proximity processing methodTAOKA HIRONOBU·Filed 2006·Granted Jan 24, 2012·15 cites·24 claims
- 0376US6760892B2Apparatus for evaluating lithography process margin simulating layout pattern of semiconductor deviceRENESAS TECH CORP·Filed 2002·Granted Jul 6, 2004·18 cites·6 claims
- 0470US8458627B2Semiconductor device including logic circuit having areas of different optical proximity accuracyTAOKA HIRONOBU·Filed 2011·Granted Jun 4, 2013·3 cites·23 claims
- 0569US5812412ACharged beam pattern data generating method and a charged beam pattern data generating apparatusMITSUBISHI ELECTRIC CORP·Filed 1995·Granted Sep 22, 1998·24 cites·27 claims
- 0665US6271852B1boundary processing of oblique overlapping graphics to achieve dimensionally accurate electron beam irradiationMITSUBISHI ELECTRIC CORP·Filed 1997·Granted Aug 7, 2001·19 cites·10 claims
- 0760US8930857B2Mask data verification apparatus, design layout verification apparatus, method thereof, and computer program thereofTAOKA HIRONOBU·Filed 2012·Granted Jan 6, 2015·1 cites·12 claims
- 0860US8719740B2Semiconductor device which is subjected to optical proximity correctionRENESAS ELECTRONICS CORP·Filed 2013·Granted May 6, 2014·1 cites·20 claims
- 0960US6350977B2Pattern distortion detecting method and apparatus and recording medium for pattern distortion detectionMITSUBISHI ELECTRIC CORP·Filed 1999·Granted Feb 26, 2002·19 cites·11 claims
- 1059US6088520AMethod of producing highly precise charged beam drawing data divided into plurality of drawing fieldsMITSUBISHI ELECTRIC CORP·Filed 1997·Granted Jul 11, 2000·25 cites·22 claims
- 1145US9582617B2Simulation device and simulation program for simulating process using first and second masksRENESAS ELECTRONICS CORP·Filed 2012·Granted Feb 28, 2017·0 cites·14 claims
- 1245US2009061362A1Semiconductor device manufacturing method using double patterning and maskRENESAS TECH CORP·Filed 2008·Application pending·0 cites
- 1344US8464192B2Lithography verification apparatus and lithography simulation programTAOKA HIRONOBU·Filed 2012·Granted Jun 11, 2013·0 cites·7 claims
- 1441US2004225993A1Apparatus for evaluating lithography process margin simulating layout pattern of semiconductor deviceTAOKA HIRONOBU·Filed 2004·Application pending·0 cites
- 1534US2001049811A1Pattern distortion correction device, pattern distortion correction method, and recording medium recording a pattern distortion correction programMITSUBISHI ELECTRIC CORP·Filed 2000·Application pending·0 cites
- 1633US6427225B1Method and apparatus for verification of a circuit layoutMITSUBISHI ELECTRIC CORP·Filed 1999·Granted Jul 30, 2002·11 cites·12 claims
- 1730US5796408ACharged particle beam drawing data production apparatus and charged particle beam drawing systemMITSUBISHI ELECTRIC CORP·Filed 1995·Granted Aug 18, 1998·3 cites·12 claims
Join the waitlist — get patent alerts
Get an alert when Hironobu Taoka files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →