Inventor · disambiguated record
Hitoshi Tsuji
Also filed as: TSUJI HITOSHI
40 granted patents·6 pending applications·824 citations·filing 1986–2023
98Inventor score
Top patents by PatentIndex Score
46 records- 0194US5564682AWafer stage apparatus for attaching and holding semiconductor waferTOSHIBA KK·Filed 1994·Granted Oct 15, 1996·168 cites·6 claims
- 0293US9148090B2Power supply device for high frequency power amplification circuit and high frequency power amplification deviceMURATA MANUFACTURING CO·Filed 2013·Granted Sep 29, 2015·15 cites·21 claims
- 0392US7438627B2Polishing state monitoring methodEBARA CORP·Filed 2007·Granted Oct 21, 2008·17 cites·6 claims
- 0491US9350299B2Power supply device for high frequency power amplifying circuit and high frequency power amplifying apparatusMURATA MANUFACTURING CO·Filed 2014·Granted May 24, 2016·15 cites·20 claims
- 0591US7645181B2Polishing state monitoring apparatus and polishing apparatusEBARA CORP·Filed 2008·Granted Jan 12, 2010·13 cites·13 claims
- 0691US7252575B2Polishing state monitoring apparatus and polishing apparatus and methodSHIMADZU CORP·Filed 2003·Granted Aug 7, 2007·44 cites·18 claims
- 0789US5707051AWafer stage apparatus for attracting and holding semiconductor waferTOSHIBA KK·Filed 1996·Granted Jan 13, 1998·92 cites·8 claims
- 0886US6758723B2Substrate polishing apparatusEBARA CORP·Filed 2002·Granted Jul 6, 2004·20 cites·8 claims
- 0978US8284010B2Inductor and DC-DC converterTSUJI HITOSHI·Filed 2010·Granted Oct 9, 2012·10 cites·9 claims
- 1078US7585204B2Substrate polishing apparatusEBARA CORP·Filed 2009·Granted Sep 8, 2009·4 cites·7 claims
- 1178US6942543B2Substrate polishing apparatusSHIMADZU CORP·Filed 2004·Granted Sep 13, 2005·12 cites·10 claims
- 1277US7241202B2Substrate polishing apparatusSHIMADZU CORP·Filed 2005·Granted Jul 10, 2007·4 cites·10 claims
- 1375US8342907B2Polishing state monitoring methodEBARA CORP·Filed 2009·Granted Jan 1, 2013·3 cites·9 claims
- 1475US6459594B1Switching power supply apparatus and methodMURATA MANUFACTURING CO·Filed 2000·Granted Oct 1, 2002·32 cites·13 claims
- 1575US6414861B1DC-DC converterMURATA MANUFACTURING CO·Filed 2000·Granted Jul 2, 2002·25 cites·9 claims
- 1673US6108894AMethod of making striker for automotive door latch apparatusMITSUI MINING & SMELTING CO·Filed 1996·Granted Aug 29, 2000·34 cites·16 claims
- 1770US9419542B2Inverter deviceMURATA MANUFACTURING CO·Filed 2015·Granted Aug 16, 2016·2 cites·11 claims
- 1868US6574081B1DC-DC converterMURATA MANUFACTURING CO·Filed 2000·Granted Jun 3, 2003·22 cites·14 claims
- 1963US4985374AMaking a semiconductor device with ammonia treatment of photoresistTOSHIBA KK·Filed 1990·Granted Jan 15, 1991·36 cites·16 claims
- 2063US4792534AMethod of manufacturing a semiconductor device involving sidewall spacer formationTOSHIBA KK·Filed 1986·Granted Dec 20, 1988·31 cites·5 claims
- 2161US7071609B2Red phosphor for low-voltage electron beamNORITAKE CO LTD·Filed 2004·Granted Jul 4, 2006·4 cites·11 claims
- 2261US5157003AMethod of etching isolation and alignment mark regions using a single resist maskTOSHIBA KK·Filed 1991·Granted Oct 20, 1992·32 cites·4 claims
- 2360US5127989AMethod of forming a thin film pattern with a trapezoidal cross sectionTOSHIBA KK·Filed 1991·Granted Jul 7, 1992·33 cites·13 claims
- 2458US7042739B2Switching electric source deviceMURATA MANUFACTURING CO·Filed 2004·Granted May 9, 2006·13 cites·20 claims
- 2558US5892665AOvercurrent protection circuitMURATA MANUFACTURING CO·Filed 1998·Granted Apr 6, 1999·25 cites·17 claims
- 2657US6314005B1DC-DC converter which compensates for load variationsMURATA MANUFACTURING CO·Filed 1999·Granted Nov 6, 2001·24 cites·18 claims
- 2755US5320932AMethod of forming contact holesTOSHIBA KK·Filed 1991·Granted Jun 14, 1994·25 cites·7 claims
- 2853US7510460B2Substrate polishing apparatusEBARA CORP·Filed 2007·Granted Mar 31, 2009·0 cites·4 claims
- 2952US10655209B2Electromagnetic shieldNORITAKE CO LTD·Filed 2014·Granted May 19, 2020·0 cites·3 claims
- 3052US5798203AMethod of making a negative photoresist imageTOSHIBA KK·Filed 1996·Granted Aug 25, 1998·13 cites·15 claims
- 3151US4988609AMethod of forming micro patternsTOSHIBA KK·Filed 1988·Granted Jan 29, 1991·10 cites·6 claims
- 3249US5958562APrinted circuit boardsMURATA MANUFACTURING CO·Filed 1996·Granted Sep 28, 1999·14 cites·26 claims
- 3347US2006237690A1Phosphor for low-voltage electron beam, method of producing the same, and vacuum fluorescent displayNORITAKE CO LTD·Filed 2006·Application pending·0 cites
- 3446US10374434B2Energy management systemMURATA MANUFACTURING CO·Filed 2017·Granted Aug 6, 2019·0 cites·8 claims
- 3545US2024151291A1Magneto rheological fluid deviceKURIMOTO LTD·Filed 2022·Application pending·0 cites
- 3644US2006269750A1Phosphor for low-voltage electron beam, method of producing the same, and vacuum fluorescent displayTSUJI HITOSHI·Filed 2006·Application pending·0 cites
- 3743US5385851AMethod of manufacturing HEMT device using novolak-based positive-type resistTOSHIBA KK·Filed 1993·Granted Jan 31, 1995·12 cites·1 claims
- 3841US10509522B2Capacitive touch switchNORITAKE CO LTD·Filed 2016·Granted Dec 17, 2019·0 cites·4 claims
- 3940US2025217103A1Input/output apparatusKURIMOTO LTD·Filed 2023·Application pending·0 cites
- 4037US5432125AMethod of manufacturing semiconductor deviceTOSHIBA KK·Filed 1994·Granted Jul 11, 1995·8 cites·4 claims
- 4137US2011220970A1Solid state imaging deviceTOSHIBA KK·Filed 2010·Application pending·0 cites
- 4236US2012080776A1Semiconductor device and method of manufacturing the sameKOMATSU AKIRA·Filed 2011·Application pending·0 cites
- 4335US10890977B2Haptic feedback device and program for virtual objectsKURIMOTO LTD·Filed 2019·Granted Jan 12, 2021·0 cites·8 claims
- 4434US5933333ASwitching power supply apparatusMURATA MANUFACTURING CO·Filed 1997·Granted Aug 3, 1999·5 cites·12 claims
- 4534US5514625AMethod of forming a wiring layerTOSHIBA KK·Filed 1995·Granted May 7, 1996·4 cites·14 claims
- 4631US5212117AMethod of manufacturing a semiconductor device contact structure using liftTOSHIBA KK·Filed 1992·Granted May 18, 1993·3 cites·16 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →