Inventor · disambiguated record
Hidefumi Yabara
Also filed as: YABARA HIDEFUMI
13 granted patents·1 pending application·253 citations·filing 1991–2010
93Inventor score
Top patents by PatentIndex Score
14 records- 0184US6242751B1Charged-particle-beam exposure device and charged-particle-beam exposure methodFUJITSU LTD·Filed 1999·Granted Jun 5, 2001·33 cites·62 claims
- 0283US5719402AMethod of and system for charged particle beam exposureFUJITSU LTD·Filed 1996·Granted Feb 17, 1998·32 cites·11 claims
- 0379US5757015ACharged-particle-beam exposure device and charged-particle-beam exposure methodFUJITSU LTD·Filed 1996·Granted May 26, 1998·25 cites·22 claims
- 0476US5546319AMethod of and system for charged particle beam exposureFUJITSU LTD·Filed 1995·Granted Aug 13, 1996·21 cites·34 claims
- 0575US5969365ACharged-particle-beam exposure device and charged-particle-beam exposure methodFUJITSU LTD·Filed 1997·Granted Oct 19, 1999·20 cites·18 claims
- 0669US5721432AMethod of and system for charged particle beam exposureFUJITSU LTD·Filed 1996·Granted Feb 24, 1998·16 cites·5 claims
- 0768US6399954B1Charged-particle beam lithography apparatus and system capable of readily detecting abnormality in controlling on-off operationADVANTEST CORP·Filed 1999·Granted Jun 4, 2002·21 cites·12 claims
- 0865US5965895AMethod of providing changed particle beam exposure in which representative aligning marks on an object are detected to calculate an actual position to perform exposureFUJITSU LTD·Filed 1997·Granted Oct 12, 1999·13 cites·9 claims
- 0964US6072185ACharged-particle-beam exposure device and method capable of high-speed data readingFUJITSU LTD·Filed 1997·Granted Jun 6, 2000·29 cites·20 claims
- 1064US5910658AMethod and system for changed particle beam exposureFUJITSU LTD·Filed 1998·Granted Jun 8, 1999·18 cites·15 claims
- 1160US5134398ADigital-to-analog converter having a circuit for compensating for variation in output dependent on temperature changeFUJITSU LTD·Filed 1991·Granted Jul 28, 1992·22 cites·20 claims
- 1242US2008049204A1Multi-column type electron beam exposure apparatusYABARA HIDEFUMI·Filed 2007·Application pending·0 cites
- 1333US5808313ACharged particle beam exposure method and charged particle beam exposure apparatusFUJITSU LTD·Filed 1997·Granted Sep 15, 1998·3 cites·7 claims
- 1425US8223045B2D/A converter and electron beam exposure apparatusYABARA HIDEFUMI·Filed 2010·Granted Jul 17, 2012·0 cites·16 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →