Inventor · disambiguated record
Hong Lim
Also filed as: LIM HONG J · LIM HONG JOO
3 granted patents·11 pending applications·27 citations·filing 1997–2006
67Inventor score
Top patents by PatentIndex Score
14 records- 0170US6884297B2Thin film deposition reactorIPS LTD·Filed 2004·Granted Apr 26, 2005·19 cites·4 claims
- 0245US2006096534A1Apparatus for depositing thin film on waferLIM HONG J·Filed 2005·Application pending·0 cites
- 0343US2006201428A1Shower head and method of fabricating the samePARK YOUNG H·Filed 2006·Application pending·0 cites
- 0440US2005158469A1Reactor for thin film deposition and method for depositing thin film on wafer using the reactorFiled 2005·Application pending·0 cites
- 0539US7163719B2Method of depositing thin film using hafnium compoundIPS LTD·Filed 2003·Granted Jan 16, 2007·2 cites·17 claims
- 0637US2005003088A1Method of depositing thin film on waferFiled 2004·Application pending·0 cites
- 0735US2004222188A1Method of cleaning a deposition chamber and apparatus for depositing a metal on a substrateFiled 2004·Application pending·0 cites
- 0835US2004187779A1Thin film deposition reactorFiled 2004·Application pending·0 cites
- 0935US2004191413A1Reactor for thin film deposition and method for depositing thin film on wafer using the reactorFiled 2002·Application pending·0 cites
- 1032US5751017AThin film transistor having double gate insulating layerLG ELECTRONICS INC·Filed 1997·Granted May 12, 1998·6 cites·20 claims
- 1132US2004180553A1Method of depositing ALD thin films on waferFiled 2004·Application pending·0 cites
- 1232US2005223982A1Apparatus and method for depositing thin film on wafer using remote plasmaPARK YOUNG H·Filed 2003·Application pending·0 cites
- 1331US2004149212A1Reaction chamber for depositing thin filmFiled 2003·Application pending·0 cites
- 1427US2004101622A1Method of depositing thin film using aluminum oxideFiled 2003·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →