Inventor · disambiguated record
Holger Walter
Also filed as: WALTER HOLGER
17 granted patents·115 citations·filing 1994–2019
92Inventor score
Top patents by PatentIndex Score
17 records- 0194US8203696B2Projection exposure apparatus with optimized adjustment possibilityBITTNER BORIS·Filed 2011·Granted Jun 19, 2012·20 cites·6 claims
- 0293US9760019B2Projection exposure apparatus comprising a manipulator, and method for controlling a projection exposure apparatusZEISS CARL SMT GMBH·Filed 2016·Granted Sep 12, 2017·6 cites·23 claims
- 0391US9316929B2EUV exposure apparatus with reflective elements having reduced influence of temperature variationZEISS CARL SMT GMBH·Filed 2013·Granted Apr 19, 2016·10 cites·22 claims
- 0490US10031423B2EUV exposure apparatus with reflective elements having reduced influence of temperature variationZEISS CARL SMT GMBH·Filed 2017·Granted Jul 24, 2018·4 cites·20 claims
- 0590US5716590ACatalytic hydrodehalogenation of halogen-containing compounds of group IV elementsWACKER CHEMIE GMBH·Filed 1994·Granted Feb 10, 1998·62 cites·29 claims
- 0683US9207541B2Arrangement for mirror temperature measurement and/or thermal actuation of a mirror in a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2013·Granted Dec 8, 2015·6 cites·25 claims
- 0776US9164402B2Method of operating a microlithographic projection exposure apparatus and projection objective of such an apparatusZEISS CARL SMT GMBH·Filed 2014·Granted Oct 20, 2015·2 cites·20 claims
- 0871US9354524B2Projection exposure apparatus with optimized adjustment possibilityBITTNER BORIS·Filed 2012·Granted May 31, 2016·1 cites·66 claims
- 0968US10684551B2EUV exposure apparatus with reflective elements having reduced influence of temperature variationZEISS CARL SMT GMBH·Filed 2019·Granted Jun 16, 2020·0 cites·9 claims
- 1066US9081310B2Optical system of microlithographic projection exposure apparatus and method of correcting wavefront deformation in sameEXLER MATTHIAS·Filed 2012·Granted Jul 14, 2015·2 cites·28 claims
- 1163US10317802B2EUV exposure apparatus with reflective elements having reduced influence of temperature variationZEISS CARL SMT GMBH·Filed 2018·Granted Jun 11, 2019·0 cites·21 claims
- 1260US9052609B2Projection exposure apparatus with optimized adjustment possibilityZEISS CARL SMT GMBH·Filed 2014·Granted Jun 9, 2015·0 cites·30 claims
- 1359US7697211B2Symmetrical objective having four lens groups for microlithographyZEISS CARL SMT AG·Filed 2008·Granted Apr 13, 2010·2 cites·26 claims
- 1458US10054860B2Projection exposure apparatus with optimized adjustment possibilityZEISS CARL SMT GMBH·Filed 2016·Granted Aug 21, 2018·0 cites·28 claims
- 1558US9746778B2EUV exposure apparatus with reflective elements having reduced influence of temperature variationZEISS CARL SMT GMBH·Filed 2016·Granted Aug 29, 2017·0 cites·14 claims
- 1652US10859815B2Optical correction arrangement, projection objective having such an optical correction arrangement and microlithographic apparatus having such a projection objectiveZEISS CARL SMT GMBH·Filed 2018·Granted Dec 8, 2020·0 cites·20 claims
- 1738US9720336B2Microlithographic apparatus and method of varying a light irradiance distributionZEISS CARL SMT GMBH·Filed 2015·Granted Aug 1, 2017·0 cites·14 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →