Inventor · disambiguated record
Hsiang An
Also filed as: AN HSIANG
2 granted patents·5 pending applications·2 citations·filing 2018–2025
37Inventor score
Files withAPPLIED MATERIALS INC7
Top patents by PatentIndex Score
7 records- 0178US2025349522A1Impedance control of local areas of a substrate during plasma deposition thereon in a large pecvd chamberAPPLIED MATERIALS INC·Filed 2025·Application pending·0 cites
- 0277US10883174B2Gas diffuser mounting plate for reduced particle generationAPPLIED MATERIALS INC·Filed 2018·Granted Jan 5, 2021·2 cites·20 claims
- 0375US2025354263A1Ground return for thin film formation using plasmaAPPLIED MATERIALS INC·Filed 2025·Application pending·0 cites
- 0467US12378669B2Ground return for thin film formation using plasmaAPPLIED MATERIALS INC·Filed 2022·Granted Aug 5, 2025·0 cites·17 claims
- 0560US2025072290A1Dual manufacturing process and calibration to achieve high accuracy thermal couple substratesAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 0659US2024420937A1Grounding device for thin film formation using plasmaAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 0728US2018218905A1Applying equalized plasma coupling design for mura free susceptorAPPLIED MATERIALS INC·Filed 2018·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →