Inventor · disambiguated record
Hyeong Soo Kim
Also filed as: KIM HYEONG S · KIM HYEONG SOO
24 granted patents·8 pending applications·829 citations·filing 1994–2024
96Inventor score
Files withHYUNDAI ELECTRONICS IND14HYNIX SEMICONDUCTOR INC9SK HYNIX INC5KIM HYEONG SOO1KYUNGSUNG UNIV INDUSTRY COOPERATION FOUNDATION1
Top patents by PatentIndex Score
32 records- 0198US6368773B1Photoresist cross-linker and photoresist composition comprising the sameHYUNDAI ELECTRONICS IND·Filed 1999·Granted Apr 9, 2002·473 cites·10 claims
- 0292US6627384B1Photoresist composition for resist flow process and process for forming a contact hole using the sameHYUNDAI ELECTRONICS IND·Filed 2000·Granted Sep 30, 2003·45 cites·13 claims
- 0388US5593813AMethod for forming submicroscopic patternsHYUNDAI ELECTRONICS IND·Filed 1995·Granted Jan 14, 1997·150 cites·7 claims
- 0481US6492441B2Anti reflective coating polymers and the preparation method thereofHYUNDAI ELECTRONICS IND·Filed 2001·Granted Dec 10, 2002·15 cites·11 claims
- 0577US6312868B1Photoresist cross-linker and photoresist composition comprising the sameHYUNDAI ELECTRONICS IND·Filed 2000·Granted Nov 6, 2001·14 cites·19 claims
- 0671US6455226B1Photoresist polymers and photoresist composition containing the sameHYUNDAI ELECTRONICS IND·Filed 2000·Granted Sep 24, 2002·9 cites·20 claims
- 0771US2023150843A1Device and method for selectively removing perfluorinated compoundSK HYNIX INC·Filed 2022·Application pending·0 cites
- 0867US6537724B1Photoresist composition for resist flow process, and process for forming contact hole using the sameHYUNDAI ELECTRONICS IND·Filed 2000·Granted Mar 25, 2003·9 cites·18 claims
- 0966US6984482B2Top-coating composition for photoresist and process for forming fine pattern using the sameHYNIX SEMICONDUCTOR INC·Filed 2002·Granted Jan 10, 2006·6 cites·8 claims
- 1066US6482565B1Photoresist cross-linker and photoresist composition comprising the sameHYUNDAI ELECTRONICS IND·Filed 1999·Granted Nov 19, 2002·11 cites·16 claims
- 1166US6350818B1Anti reflective coating polymers and the preparation method thereofHYUNDAI ELECTRONICS IND·Filed 1999·Granted Feb 26, 2002·16 cites·9 claims
- 1262US11776614B2Memory system, data processing system and method of operating the sameSK HYNIX INC·Filed 2022·Granted Oct 3, 2023·0 cites·7 claims
- 1360US12386554B2Memory system and method of operating the sameSK HYNIX INC·Filed 2023·Granted Aug 12, 2025·0 cites·14 claims
- 1459US11514972B2Memory system, data processing system and method of operating the sameSK HYNIX INC·Filed 2019·Granted Nov 29, 2022·0 cites·14 claims
- 1559US6797451B2Reflection-inhibiting resin used in process for forming photoresist patternHYNIX SEMICONDUCTOR INC·Filed 2002·Granted Sep 28, 2004·5 cites·9 claims
- 1657US2025086063A1Data storage device, data storage system and computing systemSK HYNIX INC·Filed 2024·Application pending·0 cites
- 1756US7339211B2Semiconductor device and method for fabricating the sameHYNIX SEMICONDUCTOR INC·Filed 2003·Granted Mar 4, 2008·6 cites·21 claims
- 1856US5922495AMask for use in stitching exposure processHYUNDAI ELECTRONICS IND·Filed 1997·Granted Jul 13, 1999·20 cites·2 claims
- 1955US6699644B1Process for forming a photoresist pattern comprising alkaline treatmentHYUNDAI ELECTRONICS IND·Filed 2000·Granted Mar 2, 2004·4 cites·16 claims
- 2051US2024139151A1Composition including decursinol as active ingredient for preventing or treating smooth muscle cell proliferative diseasesKYUNGSUNG UNIV INDUSTRY COOPERATION FOUNDATION·Filed 2022·Application pending·0 cites
- 2150US5821034AMethod for forming micro patterns of semiconductor devicesHYUNDAI ELECTRONICS IND·Filed 1996·Granted Oct 13, 1998·19 cites·4 claims
- 2249US8057965B2Mask and method of fabricating the sameKIM HYEONG SOO·Filed 2008·Granted Nov 15, 2011·0 cites·5 claims
- 2349US6864590B2Alignment mark for aligning wafer of semiconductor deviceHYNIX SEMICONDUCTOR INC·Filed 2003·Granted Mar 8, 2005·3 cites·7 claims
- 2448US7329477B2Process for forming a fine pattern using a top-coating composition for a photoresist and product formed by sameHYNIX SEMICONDUCTOR INC·Filed 2004·Granted Feb 12, 2008·1 cites·7 claims
- 2548US6359153B1Photoresist monomers and preparation thereofHYUNDAI ELECTRONICS IND·Filed 1999·Granted Mar 19, 2002·3 cites·8 claims
- 2646US2010099046A1Method for manufacturing semiconductor deviceHYNIX SEMICONDUCTOR INC·Filed 2009·Application pending·0 cites
- 2746US2007085128A1Semiconductor device and method for fabricating the sameHYNIX SEMICONDUCTOR INC·Filed 2006·Application pending·0 cites
- 2843US5491047AMethod of removing a silylated or germanium implanted photoresistFiled 1994·Granted Feb 13, 1996·20 cites·6 claims
- 2941US2008176047A1Liquid Composition for Immersion Lithography and Lithography Method Using the SameHYNIX SEMICONDUCTOR INC·Filed 2007·Application pending·0 cites
- 3040US6399792B2Photoresist cross-linker and photoresist composition comprising the sameHYUNDAI ELECTRONICS IND·Filed 2001·Granted Jun 4, 2002·0 cites·2 claims
- 3137US2002018960A1Novel photoresist polymers, and photoresist compositions containing the sameFiled 2001·Application pending·0 cites
- 3236US2005260528A1Liquid composition for immersion lithography and lithography method using the sameHYNIX SEMICONDUCTOR INC·Filed 2004·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →