Inventor · disambiguated record
Hyo Seong Seong
Also filed as: SEONG HYO SEONG
4 granted patents·7 pending applications·1 citations·filing 2012–2024
56Inventor score
Files withSEMES CO LTD11
Top patents by PatentIndex Score
11 records- 0173US2024420936A1Apparatus for controlling impedance and system for treating substrate with the apparatusSEMES CO LTD·Filed 2024·Application pending·0 cites
- 0266US12278088B2Plasma antenna and apparatus for generating plasma having the sameSEMES CO LTD·Filed 2020·Granted Apr 15, 2025·0 cites·18 claims
- 0364US10563919B2Method, system, and apparatus for controlling a temperature of a substrate in a plasma processing chamberSEMES CO LTD·Filed 2017·Granted Feb 18, 2020·1 cites·17 claims
- 0461US2022139683A1Apparatus for controlling impedance and system for treating substrate with the apparatusSEMES CO LTD·Filed 2021·Application pending·0 cites
- 0553US2025085320A1Inspecting apparatus and semiconductor manufacturing equipment including the sameSEMES CO LTD·Filed 2024·Application pending·0 cites
- 0652US2014144584A1Plasma antenna and apparatus for generating plasma having the sameSEMES CO LTD·Filed 2013·Application pending·0 cites
- 0752US2017358427A1Plasma antenna and apparatus for generating plasma having the sameSEMES CO LTD·Filed 2017·Application pending·0 cites
- 0849US12276684B2Method and apparatus for determining cable length for plasma processing equipmentSEMES CO LTD·Filed 2022·Granted Apr 15, 2025·0 cites·10 claims
- 0939US12125678B2Filter unit, substrate treating apparatus including the same, and substrate treating methodSEMES CO LTD·Filed 2020·Granted Oct 22, 2024·0 cites·12 claims
- 1038US2020411298A1Apparatus and method for treating substrateSEMES CO LTD·Filed 2020·Application pending·0 cites
- 1134US2013105082A1Substrate processing device and impedance matching methodSEMES CO LTD·Filed 2012·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →