Plasma antenna and apparatus for generating plasma having the same

Abstract

Provided are a plasma antenna and a plasma generating apparatus including the same. The plasma antenna includes a first antenna inducing electromagnetic fields by using an RF signal, a second antenna inducing electromagnetic fields by using the RF signal, and a capacitor connected between an input terminal of the first antenna and an input terminal of the second antenna.

What is claimed is: 
     
         1 . A plasma antenna comprising:
 a first antenna inducing electromagnetic fields by using an RF signal;   a second antenna inducing electromagnetic fields by using the RF signal; and   a capacitor connected between an input terminal of the first antenna and an input terminal of the second antenna.   
     
     
         2 . The plasma antenna of  claim 1 , wherein the first antenna comprises a first RF feed receiving the RF signal and having a pillar shape and a first coil connected to the first RF feed, and
 the second antenna comprises a second RF feed receiving the RF signal and having a hollow pillar shape surrounding the first RF feed and a second coil connected to the second RF feed.   
     
     
         3 . The plasma antenna of  claim 2 , wherein the capacitor is constituted by the first RF feed, the second RF feed, and a dielectric disposed between the first RF feed and the second RF feed. 
     
     
         4 . The plasma antenna of  claim 2 , wherein the first RF feed has a cylindrical shape, and
 the second RF feed has a hollow cylindrical shape surrounding the cylindrical shape.   
     
     
         5 . The plasma antenna of  claim 2 , wherein the first and second RF feeds are coaxially disposed with respect to each other. 
     
     
         6 . The plasma antenna of  claim 3 , wherein the dielectric comprises a polymer or metal oxide. 
     
     
         7 . The plasma antenna of  claim 6 , wherein the polymer comprises Teflon, ULTEM, or polyetheretherketone (PEEK). 
     
     
         8 . The plasma antenna of  claim 6 , wherein the metal oxide comprises ceramic. 
     
     
         9 . The plasma antenna of  claim 8 , wherein the ceramic comprises Al 2 O 3  or ZnO. 
     
     
         10 . The plasma antenna of  claim 2 , wherein the plasma antenna comprises a plurality of capacitors along a longitudinal axis of each of the first and second RF feeds. 
     
     
         11 . The plasma antenna of  claim 10 , wherein the plurality of capacitors are constituted by the first RF feed, the second RF feed, and a plurality of dielectrics disposed between the first and second RF feeds. 
     
     
         12 . The plasma antenna of  claim 11 , wherein the plurality of dielectrics are spaced a predetermined distance from each other along the longitudinal axis. 
     
     
         13 . The plasma antenna of  claim 11 , wherein the plurality of dielectrics are different in material. 
     
     
         14 . The plasma antenna of  claim 2 , wherein the capacitor comprises:
 a first conductor having a pillar shape, the first conductor being coaxially disposed with respect to the first RF feed;   a second conductor has a hollow pillar shape surrounding the first conductor, the second conductor being coaxially disposed with respect to the second RF feed.   
     
     
         15 . The plasma antenna of  claim 14 , wherein the capacitor is attachable to at least one of the first and second antennas. 
     
     
         16 . A plasma generating apparatus comprising:
 an RF power source providing an RF signal;   a plasma chamber in which a gas is injected to generate plasma; and   a plasma antenna disposed on the plasma chamber, the plasma receiving the RF signal to induce electromagnetic fields in the plasma chamber,   wherein the plasma antenna comprises:   a first antenna inducing electromagnetic fields by using the RF signal;   a second antenna inducing electromagnetic fields by using the RF signal; and   a capacitor connected between an input terminal of the first antenna and an input terminal of the second antenna.   
     
     
         17 . The plasma generating apparatus of  claim 16 , wherein the plasma antenna is disposed on an upper portion of the plasma chamber. 
     
     
         18 . The plasma generating apparatus of  claim 16 , wherein the first and second antennas are inductively coupled to each other. 
     
     
         19 . The plasma generating apparatus of  claim 16 , wherein the first and second antennas are connected to each other in parallel. 
     
     
         20 . The plasma generating apparatus of  claim 16 , wherein the first antenna comprises a first RF feed receiving the RF signal and having a pillar shape and a first coil connected to the first RF feed, and
 the second antenna comprises a second RF feed receiving the RF signal and having a hollow pillar shape surrounding the first RF feed and a second coil connected to the second RF feed.   
     
     
         21 . The plasma generating apparatus of  claim 20 , wherein the capacitor is constituted by the first RF feed, the second RF feed, and a dielectric disposed between the first RF feed and the second RF feed. 
     
     
         22 . The plasma generating apparatus of  claim 21 , wherein the dielectric comprises a polymer or metal oxide. 
     
     
         23 . The plasma generating apparatus of  claim 22 , wherein the polymer comprises Teflon, ULTEM, or polyetheretherketone (PEEK). 
     
     
         24 . The plasma generating apparatus of  claim 22 , wherein the metal oxide comprises ceramic. 
     
     
         25 . The plasma generating apparatus of  claim 24 , wherein the ceramic comprises Al 2 O 3  or ZnO. 
     
     
         26 . The plasma generating apparatus of  claim 20 , wherein the capacitor comprises:
 a first conductor having a pillar shape, the first conductor being coaxially disposed with respect to the first RF feed;   a second conductor has a hollow pillar shape surrounding the first conductor, the second conductor being coaxially disposed with respect to the second RF feed.   
     
     
         27 . The plasma generating apparatus of  claim 26 , wherein the capacitor is attachable to at least one of the first and second antennas.