Inventor · disambiguated record
Ian John Curtin
Also filed as: CURTIN IAN JOHN
5 granted patents·7 pending applications·0 citations·filing 2019–2024
60Inventor score
Files withLAM RES CORP12
Top patents by PatentIndex Score
12 records- 0172US2024347337A1Low-k ald gap-fill methods and materialLAM RES CORP·Filed 2024·Application pending·0 cites
- 0259US12020923B2Low-κ ALD gap-fill methods and materialLAM RES CORP·Filed 2019·Granted Jun 25, 2024·0 cites·18 claims
- 0357US12431349B2In-situ control of film properties during atomic layer depositionLAM RES CORP·Filed 2020·Granted Sep 30, 2025·0 cites·9 claims
- 0455US12417943B2Reducing intralevel capacitance in semiconductor devicesLAM RES CORP·Filed 2021·Granted Sep 16, 2025·0 cites·20 claims
- 0554US2025207246A1Reducing capacitance in semiconductor devicesLAM RES CORP·Filed 2023·Application pending·0 cites
- 0652US12157945B2Thermal atomic layer deposition of silicon-containing filmsLAM RES CORP·Filed 2020·Granted Dec 3, 2024·0 cites·21 claims
- 0751US12252782B2In-situ PECVD cap layerLAM RES CORP·Filed 2020·Granted Mar 18, 2025·0 cites·18 claims
- 0848US2025154644A1High pressure inert oxidation and in-situ annealing process to improve film seam quality and werLAM RES CORP·Filed 2023·Application pending·0 cites
- 0945US2023220544A1In-feature wet etch rate ratio reductionLAM RES CORP·Filed 2021·Application pending·0 cites
- 1045US2023175117A1Seam mitigation and integrated liner for gap fillLAM RES CORP·Filed 2021·Application pending·0 cites
- 1145US2023087976A1Non-plasma enhanced deposition for recess etch matchingLAM RES CORP·Filed 2021·Application pending·0 cites
- 1242US2021398780A1Method andd apparatus for atomic layer deposition or chemical vapor depositionLAM RES CORP·Filed 2019·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →