Inventor · disambiguated record
Ichirota Nagahama
Also filed as: NAGAHAMA ICHIROTA
30 granted patents·2 pending applications·596 citations·filing 2000–2014
97Inventor score
Top patents by PatentIndex Score
32 records- 0198US9368314B2Inspection system by charged particle beam and method of manufacturing devices using the systemEBARA CORP·Filed 2014·Granted Jun 14, 2016·38 cites·10 claims
- 0298US8035082B2Projection electron beam apparatus and defect inspection system using the apparatusTOSHIBA KK·Filed 2009·Granted Oct 11, 2011·46 cites·2 claims
- 0398US6992290B2Electron beam inspection system and inspection method and method of manufacturing devices using the systemTOSHIBA KK·Filed 2001·Granted Jan 31, 2006·97 cites·5 claims
- 0497US7351969B2Electron beam inspection system and inspection method and method of manufacturing devices using the systemEBARA CORP·Filed 2005·Granted Apr 1, 2008·37 cites·5 claims
- 0597US6909092B2Electron beam apparatus and device manufacturing method using sameTOSHIBA KK·Filed 2003·Granted Jun 21, 2005·77 cites·17 claims
- 0696US7569838B2Electron beam inspection system and inspection method and method of manufacturing devices using the systemEBARA CORP·Filed 2008·Granted Aug 4, 2009·23 cites·5 claims
- 0795US7411191B2Inspection system by charged particle beam and method of manufacturing devices using the systemEBARA CORP·Filed 2007·Granted Aug 12, 2008·20 cites·4 claims
- 0894US7241993B2Inspection system by charged particle beam and method of manufacturing devices using the systemTOSHIBA KK·Filed 2001·Granted Jul 10, 2007·54 cites·12 claims
- 0994US6563114B1Substrate inspecting system using electron beam and substrate inspecting method using electron beamTOSHIBA KK·Filed 2000·Granted May 13, 2003·103 cites·21 claims
- 1091US8053726B2Inspection system by charged particle beam and method of manufacturing devices using the systemEBARA CORP·Filed 2008·Granted Nov 8, 2011·11 cites·11 claims
- 1190US8803103B2Inspection system by charged particle beam and method of manufacturing devices using the systemEBARA CORP·Filed 2013·Granted Aug 12, 2014·6 cites·7 claims
- 1284US7098457B2Electron beam apparatus and device manufacturing method using sameTOSHIBA KK·Filed 2005·Granted Aug 29, 2006·6 cites·16 claims
- 1383US8368031B2Inspection system by charged particle beam and method of manufacturing devices using the systemEBARA CORP·Filed 2011·Granted Feb 5, 2013·3 cites·7 claims
- 1483US8067732B2Electron beam apparatusNAKASUJI MAMORU·Filed 2006·Granted Nov 29, 2011·8 cites·4 claims
- 1582US7863580B2Electron beam apparatus and an aberration correction optical apparatusEBARA CORP·Filed 2007·Granted Jan 4, 2011·7 cites·8 claims
- 1681US7462829B2Substrate inspection apparatus, substrate inspection method and method of manufacturing semiconductor deviceTOSHIBA KK·Filed 2007·Granted Dec 9, 2008·4 cites·10 claims
- 1775US7838831B2Substrate inspection apparatus, substrate inspection method and semiconductor device manufacturing methodTOSHIBA KK·Filed 2008·Granted Nov 23, 2010·3 cites·18 claims
- 1875US7212017B2Electron beam apparatus with detailed observation function and sample inspecting and observing method using electron beam apparatusTOSHIBA KK·Filed 2004·Granted May 1, 2007·15 cites·7 claims
- 1973US7148479B2Defect inspection apparatus, program, and manufacturing method of semiconductor deviceTOSHIBA KK·Filed 2005·Granted Dec 12, 2006·3 cites·5 claims
- 2072US7449691B2Detecting apparatus and device manufacturing methodEBARA CORP·Filed 2006·Granted Nov 11, 2008·3 cites·4 claims
- 2171US7075072B2Detecting apparatus and device manufacturing methodTOSHIBA KK·Filed 2002·Granted Jul 11, 2006·12 cites·28 claims
- 2270US7211796B2Substrate inspection apparatus, substrate inspection method and method of manufacturing semiconductor deviceTOSHIBA KK·Filed 2004·Granted May 1, 2007·6 cites·15 claims
- 2368US8611638B2Pattern inspection method and pattern inspection apparatusNAGAHAMA ICHIROTA·Filed 2011·Granted Dec 17, 2013·3 cites·6 claims
- 2468US7645988B2Substrate inspection method, method of manufacturing semiconductor device, and substrate inspection apparatusTOSHIBA KK·Filed 2005·Granted Jan 12, 2010·2 cites·17 claims
- 2567US7674570B2Mask pattern inspection method, exposure condition verification method, and manufacturing method of semiconductor deviceTOSHIBA KK·Filed 2006·Granted Mar 9, 2010·2 cites·12 claims
- 2665US7592586B2Mapping-projection-type electron beam apparatus for inspecting sample by using electrons reflected from the sampleEBARA CORP·Filed 2004·Granted Sep 22, 2009·5 cites·7 claims
- 2763US7847250B2Substrate inspection apparatus, substrate inspection method and method of manufacturing semiconductor deviceTOSHIBA KK·Filed 2008·Granted Dec 7, 2010·0 cites·2 claims
- 2860US8124933B2Mapping-projection-type electron beam apparatus for inspecting sample by using electrons emitted from the sampleWATANABE KENJI·Filed 2009·Granted Feb 28, 2012·0 cites·8 claims
- 2958US7352195B2Electron beam apparatus with detailed observation function and sample inspecting and observing method using electron beam apparatusEBARA CORP·Filed 2007·Granted Apr 1, 2008·2 cites·7 claims
- 3050US7608821B2Substrate inspection apparatus, substrate inspection method and semiconductor device manufacturing methodTOSHIBA KK·Filed 2007·Granted Oct 27, 2009·0 cites·16 claims
- 3148US2008013824A1Defect inspection method, defect inspection apparatus, and semiconductor device manufacturing methodYAMAGUCHI SHINJI·Filed 2007·Application pending·0 cites
- 3240US2010021046A1Pattern inspection apparatus, pattern inspection method and computer readable recording mediumNAGAHAMA ICHIROTA·Filed 2009·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →