Inventor · disambiguated record
Ing-Shin Chen
Also filed as: CHEN ING-SHIN · CHEN ING-SHIN BARRY
14 granted patents·8 pending applications·1,617 citations·filing 1998–2015
95Inventor score
Top patents by PatentIndex Score
22 records- 0198US7475588B2Apparatus and process for sensing fluoro species in semiconductor processing systemsADVANCED TECH MATERIALS·Filed 2005·Granted Jan 13, 2009·474 cites·64 claims
- 0298US7296460B2Apparatus and process for sensing fluoro species in semiconductor processing systemsADVANCED TECH MATERIALS·Filed 2005·Granted Nov 20, 2007·481 cites·23 claims
- 0398US7080545B2Apparatus and process for sensing fluoro species in semiconductor processing systemsADVANCED TECH MATERIALS·Filed 2002·Granted Jul 25, 2006·495 cites·81 claims
- 0484US6900498B2Barrier structures for integration of high K oxides with Cu and Al electrodesADVANCED TECH MATERIALS·Filed 2001·Granted May 31, 2005·36 cites·39 claims
- 0582US7296458B2Nickel-coated free-standing silicon carbide structure for sensing fluoro or halogen species in semiconductor processing systems, and processes of making and using sameADVANCED TECH MATERIALS·Filed 2004·Granted Nov 20, 2007·21 cites·38 claims
- 0682US7228724B2Apparatus and process for sensing target gas species in semiconductor processing systemsADVANCED TECH MATERIALS·Filed 2004·Granted Jun 12, 2007·19 cites·41 claims
- 0780US7370511B1Gas sensor with attenuated drift characteristicMST TECHNOLOGY GMBH·Filed 2004·Granted May 13, 2008·18 cites·50 claims
- 0878US8109130B2Apparatus and process for sensing fluoro species in semiconductor processing systemsDIMEO JR FRANK·Filed 2009·Granted Feb 7, 2012·8 cites·22 claims
- 0978US7655887B2Feedback control system and method for maintaining constant resistance operation of electrically heated elementsADVANCED TECH MATERIALS·Filed 2006·Granted Feb 2, 2010·6 cites·19 claims
- 1078US7193187B2Feedback control system and method for maintaining constant resistance operation of electrically heated elementsADVANCED TECH MATERIALS·Filed 2004·Granted Mar 20, 2007·23 cites·22 claims
- 1177US6692569B2A-site-and/or b-site-modified pbzrtio3 materials and (pb, sr, ca, ba, mg) (zr, ti,nb, ta)o3 films having utility in ferroelectric random access memories and high performance thin film microactuatorsADVANCED TECH MATERIALS·Filed 2001·Granted Feb 17, 2004·11 cites·15 claims
- 1274US6312816B1A-site- and/or B-site-modified PbZrTiO3 materials and (Pb, Sr, Ca, Ba, Mg) (Zr, Ti, Nb, Ta)O3 films having utility in ferroelectric random access memories and high performance thin film microactuatorsADVANCED TECH MATERIALS·Filed 1998·Granted Nov 6, 2001·23 cites·25 claims
- 1370US9134146B2Fluid monitoring apparatusBAUM THOMAS H·Filed 2010·Granted Sep 15, 2015·2 cites·16 claims
- 1457US10288456B2Fluid monitoring apparatusENTEGRIS INC·Filed 2015·Granted May 14, 2019·0 cites·18 claims
- 1554US2008142039A1Removal of nitride depositsADVANCED TECH MATERIALS·Filed 2007·Application pending·0 cites
- 1650US2010139369A1Feedback control system and method for maintaining constant resistance operation of electrically heated elementsADVANCED TECH MATERIALS·Filed 2010·Application pending·0 cites
- 1749US2008134757A1Method And Apparatus For Monitoring Plasma Conditions In An Etching Plasma Processing FacilityADVANCED TECH MATERIALS·Filed 2006·Application pending·0 cites
- 1846US2006211253A1Method and apparatus for monitoring plasma conditions in an etching plasma processing facilityCHEN ING-SHIN·Filed 2005·Application pending·0 cites
- 1945US2004223884A1Chemical sensor responsive to change in volume of material exposed to target particleFiled 2003·Application pending·0 cites
- 2044US2008251104A1Systems and Methods for Determination of Endpoint of Chamber Cleaning ProcessesADVANCED TECH MATERIALS·Filed 2006·Application pending·0 cites
- 2140US2004163445A1Apparatus and process for sensing fluoro species in semiconductor processing systemsFiled 2004·Application pending·0 cites
- 2234US2014134823A1High-k perovskite materials and methods of making and using the sameHENDRIX BRYAN C·Filed 2012·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →