Inventor · disambiguated record
Irwan Dani Setija
Also filed as: SETIJA IRWAN D · SETIJA IRWAN DANI
20 granted patents·6 pending applications·129 citations·filing 2001–2024
94Inventor score
Files withASML NETHERLANDS BV19PISARENCO MAXIM2COENE WILLEM MARIE JULIA MARCEL1DEN BOEF ARIE JEFFREY1DIRKS REMCO1
Top patents by PatentIndex Score
26 records- 0193US7643666B2Method and apparatus for angular-resolved spectroscopic lithography characterizationASML NETHERLANDS BV·Filed 2006·Granted Jan 5, 2010·18 cites·16 claims
- 0292US8189195B2Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing methodDEN BOEF ARIE JEFFREY·Filed 2007·Granted May 29, 2012·15 cites·33 claims
- 0390US9939250B2Methods and apparatus for calculating electromagnetic scattering properties of a structure and for estimation of geometrical and material parameters thereofASML NETHERLANDS BV·Filed 2014·Granted Apr 10, 2018·7 cites·14 claims
- 0487US10788765B2Method and apparatus for measuring a structure on a substrateASML NETHERLANDS BV·Filed 2018·Granted Sep 29, 2020·4 cites·20 claims
- 0587US8645109B2Methods and apparatus for determining electromagnetic scattering properties and structural parameters of periodic structuresDIRKS REMCO·Filed 2010·Granted Feb 4, 2014·9 cites·17 claims
- 0687US7440079B2Lithographic apparatus, alignment system, and device manufacturing methodASML NETHERLANDS BV·Filed 2005·Granted Oct 21, 2008·10 cites·50 claims
- 0787US6995831B2Lithographic apparatus with alignment subsystem, device manufacturing method, using alignment, and alignment structureASML NETHERLANDS BV·Filed 2005·Granted Feb 7, 2006·8 cites·8 claims
- 0884US6704089B2Lithographic projection apparatus, a method for determining a position of a substrate alignment mark, a device manufacturing method and device manufactured therebyASML NETHERLANDS BV·Filed 2001·Granted Mar 9, 2004·20 cites·17 claims
- 0983US8706455B2Methods and apparatus for calculating electromagnetic scattering properties of a structure using a normal-vector field and for reconstruction of approximate structuresVAN BEURDEN MARTIJN CONSTANT·Filed 2010·Granted Apr 22, 2014·5 cites·29 claims
- 1081US12393046B2Metrology systems, coherence scrambler illumination sources and methods thereofASML NETHERLANDS BV·Filed 2020·Granted Aug 19, 2025·1 cites·15 claims
- 1179US11042096B2Alignment measurement systemASML NETHERLANDS BV·Filed 2018·Granted Jun 22, 2021·2 cites·21 claims
- 1279US7002667B2Lithographic apparatus with alignment subsystem, device manufacturing method, and device manufactured therebyASML NETHERLANDS BV·Filed 2003·Granted Feb 21, 2006·15 cites·48 claims
- 1378US8724109B2Method and apparatus for angular-resolved spectroscopic lithography characterizationSETIJA IRWAN DANI·Filed 2009·Granted May 13, 2014·6 cites·16 claims
- 1474US8520212B2Scatterometry method and measurement system for lithographyCOENE WILLEM MARIE JULIA MARCEL·Filed 2009·Granted Aug 27, 2013·4 cites·20 claims
- 1570US9772562B2Method and apparatus for measuring a structure on a substrate, models for error correction, computer program products for implementing such methods and apparatusASML NETHERLANDS BV·Filed 2014·Granted Sep 26, 2017·3 cites·19 claims
- 1665US2024241454A1Metrology method and system and lithographic systemASML NETHERLANDS BV·Filed 2024·Application pending·0 cites
- 1762US8875078B2Reference library generation method for methods of inspection, inspection apparatus and lithographic apparatusPISARENCO MAXIM·Filed 2012·Granted Oct 28, 2014·1 cites·15 claims
- 1861US2025341781A1Passive integrated optical systems and methods for reduction of spatial optical coherenceASML NETHERLANDS BV·Filed 2023·Application pending·0 cites
- 1960US2024184222A1Metrology method and apparatusASML NETHERLANDS BV·Filed 2024·Application pending·0 cites
- 2055US2024094643A1Metrology method and system and lithographic systemASML NETHERLANDS BV·Filed 2021·Application pending·0 cites
- 2155US2025305882A1Method and apparatuses for fourier transform spectrometryASML NETHERLANDS BV·Filed 2023·Application pending·0 cites
- 2252US10942461B2Alignment measurement systemASML NETHERLANDS BV·Filed 2018·Granted Mar 9, 2021·0 cites·18 claims
- 2348US6987556B2Lithographic projection apparatus, a method for determining a position of a substrate alignment mark, a device manufacturing method and device manufactured therebyASML NETHERLANDS BV·Filed 2003·Granted Jan 17, 2006·1 cites·8 claims
- 2440US2006061743A1Lithographic apparatus, alignment system, and device manufacturing methodASML NETHERLANDS BV·Filed 2004·Application pending·0 cites
- 2538US10408753B2Method and apparatus for calculating electromagnetic scattering properties of finite periodic structuresPISARENCO MAXIM·Filed 2012·Granted Sep 10, 2019·0 cites·17 claims
- 2636US10948409B2Method and apparatus for calculating electromagnetic scattering properties of finite periodic structuresASML NETHERLANDS BV·Filed 2017·Granted Mar 16, 2021·0 cites·10 claims
Join the waitlist — get patent alerts
Get an alert when Irwan Dani Setija files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →