Inventor · disambiguated record
Isahiro Hasegawa
Also filed as: HASEGAWA ISAHIRO
32 granted patents·1,396 citations·filing 1988–2020
98Inventor score
Top patents by PatentIndex Score
32 records- 0197US5444207APlasma generating device and surface processing device and method for processing wafers in a uniform magnetic fieldTOSHIBA KK·Filed 1993·Granted Aug 22, 1995·132 cites·24 claims
- 0292US9922991B2Semiconductor memory device and method for manufacturing sameTOSHIBA MEMORY CORP·Filed 2016·Granted Mar 20, 2018·8 cites·13 claims
- 0390US5356515ADry etching methodTOKYO ELECTRON LTD·Filed 1992·Granted Oct 18, 1994·139 cites·10 claims
- 0489US5667622AIn-situ wafer temperature control apparatus for single wafer toolsSIEMENS AG·Filed 1995·Granted Sep 16, 1997·121 cites·20 claims
- 0589US5660671AMagnetron plasma processing apparatus and processing methodTOKYO ELECTRON LTD·Filed 1994·Granted Aug 26, 1997·49 cites·5 claims
- 0689US5660744APlasma generating apparatus and surface processing apparatusTOSHIBA KK·Filed 1995·Granted Aug 26, 1997·65 cites·23 claims
- 0789US5290381APlasma etching apparatusTOKYO ELECTRON LTD·Filed 1991·Granted Mar 1, 1994·116 cites·16 claims
- 0888US11788777B2Temperature control system and integrated temperature control systemCKD CORP·Filed 2020·Granted Oct 17, 2023·2 cites·19 claims
- 0986US5539179AElectrostatic chuck having a multilayer structure for attracting an objectTOKYO ELECTRON LTD·Filed 1991·Granted Jul 23, 1996·96 cites·4 claims
- 1082US5255153AElectrostatic chuck and plasma apparatus equipped therewithTOKYO ELECTRON LTD·Filed 1991·Granted Oct 19, 1993·78 cites·16 claims
- 1181US5270266AMethod of adjusting the temperature of a semiconductor waferTOKYO ELECTRON LTD·Filed 1992·Granted Dec 14, 1993·75 cites·10 claims
- 1280US5271788APlasma processing apparatusTOKYO ELECTRON LTD·Filed 1992·Granted Dec 21, 1993·38 cites·19 claims
- 1380US5223113AApparatus for forming reduced pressure and for processing objectTOKYO ELECTRON LTD·Filed 1991·Granted Jun 29, 1993·74 cites·13 claims
- 1477US5221403ASupport table for plate-like body and processing apparatus using the tableTOKYO ELECTRON LTD·Filed 1991·Granted Jun 22, 1993·60 cites·20 claims
- 1575US5698070AMethod of etching film formed on semiconductor waferTOKYO ELECTRON LTD·Filed 1993·Granted Dec 16, 1997·56 cites·47 claims
- 1675US5161201AMethod of and apparatus for measuring pattern profileTOSHIBA KK·Filed 1991·Granted Nov 3, 1992·37 cites·3 claims
- 1774US5310454ADry etching methodTOSHIBA KK·Filed 1993·Granted May 10, 1994·54 cites·9 claims
- 1873US5100508AMethod of forming fine patternsTOSHIBA KK·Filed 1990·Granted Mar 31, 1992·36 cites·5 claims
- 1972US5302236AMethod of etching object to be processed including oxide or nitride portionTOKYO ELECTRON LTD·Filed 1991·Granted Apr 12, 1994·50 cites·11 claims
- 2065US5376211AMagnetron plasma processing apparatus and processing methodTOKYO ELECTRON LTD·Filed 1991·Granted Dec 27, 1994·14 cites·5 claims
- 2162US5387893APermanent magnet magnetic circuit and magnetron plasma processing apparatusTOKYO ELECTRON LTD·Filed 1993·Granted Feb 7, 1995·16 cites·7 claims
- 2254US5203945APlasma processing apparatus having driving control sectionTOKYO ELECTRON LTD·Filed 1991·Granted Apr 20, 1993·24 cites·15 claims
- 2353US11656016B2Cooling system that comprises multiple cooling apparatus and reduces power consumptionCKD CORP·Filed 2020·Granted May 23, 2023·0 cites·9 claims
- 2453US6261428B1Magnetron plasma process apparatusTOKYO ELECTRON LTD·Filed 1994·Granted Jul 17, 2001·10 cites·3 claims
- 2550US5474643APlasma processing apparatusTOKYO ELECTRON LTD·Filed 1993·Granted Dec 12, 1995·10 cites·6 claims
- 2649US5236556APlasma apparatusTOKYO ELECTRON LTD·Filed 1991·Granted Aug 17, 1993·9 cites·11 claims
- 2747US11796247B2Temperature control systemCKD CORP·Filed 2020·Granted Oct 24, 2023·0 cites·18 claims
- 2845US11703284B2Temperature control system and integrated temperature control systemCKD CORP·Filed 2020·Granted Jul 18, 2023·0 cites·16 claims
- 2943US5091050ADry etching methodTOSHIBA KK·Filed 1988·Granted Feb 25, 1992·11 cites·12 claims
- 3040US5195866AConveying apparatusTOKYO ELECTRON LTD·Filed 1991·Granted Mar 23, 1993·11 cites·17 claims
- 3134US5289152APermanent magnet magnetic circuitTDK CORP·Filed 1993·Granted Feb 22, 1994·5 cites·6 claims
- 3231US5888338AMagnetron plasma processing apparatus and processing methodTOKYO ELECTRON LTD·Filed 1997·Granted Mar 30, 1999·0 cites·6 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →