Inventor · disambiguated record
Issei Imahashi
Also filed as: IMAHASHI ISSEI
24 granted patents·2,299 citations·filing 1976–2000
97Inventor score
Top patents by PatentIndex Score
24 records- 0198US5338362AApparatus for processing semiconductor wafer comprising continuously rotating wafer table and plural chamber compartmentsTOKYO ELECTRON LTD·Filed 1993·Granted Aug 16, 1994·598 cites·18 claims
- 0297US5695564ASemiconductor processing systemTOKYO ELECTRON LTD·Filed 1995·Granted Dec 9, 1997·445 cites·14 claims
- 0397US4525659APositioning stage having a vibration suppressorTELMEC CO LTD·Filed 1982·Granted Jun 25, 1985·102 cites·1 claims
- 0496US5554223APlasma processing apparatus with a rotating electromagnetic fieldTOKYO ELECTRON LTD·Filed 1994·Granted Sep 10, 1996·144 cites·11 claims
- 0595US5413958AMethod for manufacturing a liquid crystal display substrateTOKYO ELECTRON LTD·Filed 1993·Granted May 9, 1995·208 cites·10 claims
- 0693US5372836AMethod of forming polycrystalling silicon film in process of manufacturing LCDTOKYO ELECTRON LTD·Filed 1993·Granted Dec 13, 1994·163 cites·15 claims
- 0792US5529630AApparatus for manufacturing a liquid crystal display substrate, and apparatus for evaluating semiconductor crystalsTOKYO ELECTRON LTD·Filed 1995·Granted Jun 25, 1996·122 cites·1 claims
- 0890US5537004ALow frequency electron cyclotron resonance plasma processorTOKYO ELECTRON LTD·Filed 1994·Granted Jul 16, 1996·63 cites·15 claims
- 0990US5414244ASemiconductor wafer heat treatment apparatusTOKYO ELECTRON LTD·Filed 1994·Granted May 9, 1995·70 cites·14 claims
- 1088US5342472APlasma processing apparatusTOKYO ELECTRON LTD·Filed 1992·Granted Aug 30, 1994·118 cites·15 claims
- 1186US4377028AMethod for registering a mask pattern in a photo-etching apparatus for semiconductor devicesTELMEC CO LTD·Filed 1980·Granted Mar 22, 1983·40 cites·6 claims
- 1282US6284668B1Plasma polishing methodTOKYO ELECTRON LTD·Filed 2000·Granted Sep 4, 2001·28 cites·22 claims
- 1380US5173641APlasma generating apparatusTOKYO ELECTRON LTD·Filed 1991·Granted Dec 22, 1992·35 cites·15 claims
- 1478US5374327APlasma processing methodTOKYO ELECTRON LTD·Filed 1993·Granted Dec 20, 1994·48 cites·18 claims
- 1568US6431114B1Method and apparatus for plasma processingTOKYO ELECTRON LTD·Filed 2000·Granted Aug 13, 2002·8 cites·6 claims
- 1660USRE36371EMethod of forming polycrystalline silicon film in process of manufacturing LCDTOKYO ELECTRON LTD·Filed 1996·Granted Nov 2, 1999·22 cites·17 claims
- 1756US5198755AProbe apparatusTOKYO ELECTRON LTD·Filed 1991·Granted Mar 30, 1993·17 cites·10 claims
- 1855US4397078AMethod and apparatus for measuring a gap distance between a mask and a wafer to be used in fabrication of semiconductor integrated circuitsTELMEC CO LTD·Filed 1981·Granted Aug 9, 1983·18 cites·6 claims
- 1951US4441250AApparatus for registering a mask pattern in a photo-etching apparatus for semiconductor devicesTELMEC CO LTD·Filed 1983·Granted Apr 10, 1984·11 cites·5 claims
- 2045US4080892AApparatus for driving dotting hammers of a matrix printerIMAHASHI ISSEI·Filed 1976·Granted Mar 28, 1978·6 cites·5 claims
- 2142US5004924AWafer transport apparatus for ion implantation apparatusTOKYO ELECTRON LTD·Filed 1989·Granted Apr 2, 1991·11 cites·6 claims
- 2242US4347452AMicro-displacement deviceTELMEC CO LTD·Filed 1980·Granted Aug 31, 1982·8 cites·2 claims
- 2339US4390827ALinear motorTELMEC CO LTD·Filed 1981·Granted Jun 28, 1983·7 cites·6 claims
- 2435US4873447AWafer transport apparatus for ion implantation apparatusTOKYO ELECTRON LTD·Filed 1988·Granted Oct 10, 1989·7 cites·13 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →