Inventor · disambiguated record
Itsuko Sakai
Also filed as: SAKAI ITSUKO
20 granted patents·10 pending applications·502 citations·filing 1992–2017
95Inventor score
Top patents by PatentIndex Score
30 records- 0196US6642149B2Plasma processing methodTOKYO ELECTRON LTD·Filed 2002·Granted Nov 4, 2003·92 cites·18 claims
- 0295US5312519AMethod of cleaning a charged beam apparatusTOSHIBA KK·Filed 1992·Granted May 17, 1994·104 cites·9 claims
- 0391US5466942ACharged beam irradiating apparatus having a cleaning means and a method of cleaning a charged beam irradiating apparatusTOSHIBA KK·Filed 1993·Granted Nov 14, 1995·62 cites·16 claims
- 0488US5539211ACharged beam apparatus having cleaning function and method of cleaning charged beam apparatusTOSHIBA KK·Filed 1994·Granted Jul 23, 1996·56 cites·30 claims
- 0586US6782907B2Gas recirculation flow control method and apparatus for use in vacuum systemEBARA CORP·Filed 2002·Granted Aug 31, 2004·36 cites·16 claims
- 0683US6780278B2Plasma processing apparatus with reduced parasitic capacity and loss in RF powerTOSHIBA KK·Filed 2001·Granted Aug 24, 2004·16 cites·16 claims
- 0780US7628931B2Processing method for conservation of processing gasesTOKYO ELECTRON LTD·Filed 2005·Granted Dec 8, 2009·7 cites·6 claims
- 0880US5717294APlasma process apparatusTOSHIBA KK·Filed 1995·Granted Feb 10, 1998·65 cites·10 claims
- 0976US7767055B2Capacitive coupling plasma processing apparatusTOKYO ELECTRON LTD·Filed 2005·Granted Aug 3, 2010·5 cites·17 claims
- 1073US7186315B2Plasma treatment apparatusTOSHIBA KK·Filed 2003·Granted Mar 6, 2007·10 cites·6 claims
- 1172US7022616B2High speed silicon etching methodTOSHIBA KK·Filed 2001·Granted Apr 4, 2006·15 cites·18 claims
- 1269US6938638B2Gas circulating-processing apparatusTOSHIBA KK·Filed 2001·Granted Sep 6, 2005·13 cites·20 claims
- 1362US6689699B2Method for manufacturing a semiconductor device using recirculation of a process gasTOSHIBA KK·Filed 2001·Granted Feb 10, 2004·8 cites·20 claims
- 1460US8339615B2Edge detection method for transparent substrate by detecting non-light-emitting region of transparent substrateDOHI MASAYUKI·Filed 2009·Granted Dec 25, 2012·3 cites·13 claims
- 1557US7368876B2Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2004·Granted May 6, 2008·3 cites·11 claims
- 1652US8580652B2Semiconductor device and manufacturing method thereofKAWASAKI ATSUKO·Filed 2010·Granted Nov 12, 2013·1 cites·10 claims
- 1749US7182879B2Plasma processing methodTOSHIBA KK·Filed 2004·Granted Feb 27, 2007·0 cites·15 claims
- 1845US2001051232A1Plasma processing methodTOSHIBA KK·Filed 2001·Application pending·0 cites
- 1945US2007227033A1Substrate transferring apparatus, substrate processing apparatus, and substrate processing methodTOSHIBA KK·Filed 2007·Application pending·0 cites
- 2045US2004238126A1Plasma processing apparatus with reduced parasitic capacity and loss in RF powerTOSHIBA KK·Filed 2004·Application pending·0 cites
- 2140US10672615B2Plasma processing apparatus and plasma processing methodTOSHIBA MEMORY CORP·Filed 2017·Granted Jun 2, 2020·0 cites·15 claims
- 2240US10026622B2Method for manufacturing semiconductor deviceTOSHIBA MEMORY CORP·Filed 2016·Granted Jul 17, 2018·0 cites·21 claims
- 2339US2004244688A1Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2004·Application pending·0 cites
- 2438US2006137988A1Semiconductor manufacturing apparatus and manufacturing method of semiconductor deviceTOSHIBA KK·Filed 2005·Application pending·0 cites
- 2536US6038461APlastically deformable high temperature superconductive material and method of manufacturing formed body thereofFiled 1998·Granted Mar 14, 2000·6 cites·5 claims
- 2635US2001015133A1Gas recovery system and gas recovery methodFiled 2000·Application pending·0 cites
- 2734US2006128093A1Method of manufacturing semiconductor deviceTAKENAKA KEIICHI·Filed 2005·Application pending·0 cites
- 2834US2012315758A1Semiconductor device manufacturing methodSAKURAI NORIKO·Filed 2012·Application pending·0 cites
- 2933US2006231877A1Semiconductor deviceTAKENAKA KEIICHI·Filed 2005·Application pending·0 cites
- 3032US2004188739A1Semiconductor device including trench capacitor and manufacturing method of the sameFiled 2004·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →