Inventor · disambiguated record
James Grootegoed
Also filed as: GROOTEGOED JAMES · GROOTEGOED JAMES A
11 granted patents·5 pending applications·114 citations·filing 1997–2024
88Inventor score
Top patents by PatentIndex Score
16 records- 0193US9718082B2Inline dispense capacitorTOKYO ELECTRON LTD·Filed 2015·Granted Aug 1, 2017·12 cites·19 claims
- 0292US6592434B1Wafer carrier and method of material removal from a semiconductor waferMOTOROLA INC·Filed 2000·Granted Jul 15, 2003·57 cites·23 claims
- 0380US10403501B2High-purity dispense systemTOKYO ELECTRON LTD·Filed 2017·Granted Sep 3, 2019·3 cites·18 claims
- 0480US9987655B2Inline dispense capacitor systemTOKYO ELECTRON LTD·Filed 2016·Granted Jun 5, 2018·3 cites·15 claims
- 0574US6406555B1Point of use dilution tool and methodMOTOROLA INC·Filed 2000·Granted Jun 18, 2002·14 cites·14 claims
- 0673US12506019B2Wafer chuck designs and methods for retaining a processing liquid on a surface of a semiconductor waferTOKYO ELECTRON LTD·Filed 2024·Granted Dec 23, 2025·0 cites·22 claims
- 0772US2025285884A1Wet Processing Systems Having Novel Wafer Chuck Designs For Retaining A Processing Liquid On A Surface Of A Semiconductor SubstrateTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 0867US10712663B2High-purity dispense unitTOKYO ELECTRON LTD·Filed 2017·Granted Jul 14, 2020·1 cites·6 claims
- 0965US8048226B2Method and system for improving deposition uniformity in a vapor deposition systemTOKYO ELECTRON LTD·Filed 2007·Granted Nov 1, 2011·2 cites·20 claims
- 1061US6070600APoint of use dilution tool and methodMOTOROLA INC·Filed 1997·Granted Jun 6, 2000·22 cites·7 claims
- 1158US11383211B2Point-of-use dynamic concentration delivery system with high flow and high uniformityTOKYO ELECTRON LTD·Filed 2019·Granted Jul 12, 2022·0 cites·20 claims
- 1258US2025357099A1Wafer cleaning method and systemTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 1357US2025264430A1Apparatus and method for plasma measurementTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 1457US2025308950A1Wafer processing method and system using heated functional plateTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 1555US2009242383A1Apparatus and method for rf grounding of ipvd tableTOKYO ELECTRON LTD·Filed 2008·Application pending·0 cites
- 1638US10354872B2High-precision dispense system with meniscus controlTOKYO ELECTRON LTD·Filed 2017·Granted Jul 16, 2019·0 cites·18 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →