Inventor · disambiguated record
Jan Horn
Also filed as: HORN JAN
27 granted patents·7 pending applications·71 citations·filing 2009–2025
94Inventor score
Files withZEISS CARL SMT GMBH22Scantinel Photonics GmbH3ZEISS CARL AG3CARL ZEISS MULTISEM GMBH2XALTER STEFAN2
Top patents by PatentIndex Score
34 records- 0196US9013684B2Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatusXALTER STEFAN·Filed 2012·Granted Apr 21, 2015·17 cites·18 claims
- 0294US10854423B2Multi-beam particle beam systemCARL ZEISS MULTISEM GMBH·Filed 2019·Granted Dec 1, 2020·31 cites·22 claims
- 0386US10678151B2Control deviceZEISS CARL SMT GMBH·Filed 2019·Granted Jun 9, 2020·4 cites·20 claims
- 0485US8339577B2Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatusXALTER STEFAN·Filed 2009·Granted Dec 25, 2012·9 cites·31 claims
- 0580US9897925B2Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2015·Granted Feb 20, 2018·1 cites·18 claims
- 0674US10139618B2Multi-mirror arrayZEISS CARL SMT GMBH·Filed 2017·Granted Nov 27, 2018·3 cites·20 claims
- 0774US9851555B2Optical componentZEISS CARL SMT GMBH·Filed 2016·Granted Dec 26, 2017·3 cites·20 claims
- 0873US9239229B2Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2015·Granted Jan 19, 2016·1 cites·13 claims
- 0967US11239054B2Multi-beam particle beam systemCARL ZEISS MULTISEM GMBH·Filed 2020·Granted Feb 1, 2022·0 cites·21 claims
- 1066US9001309B2Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2014·Granted Apr 7, 2015·0 cites·30 claims
- 1166US8345224B2Methods and devices for driving micromirrorsZEISS CARL SMT GMBH·Filed 2011·Granted Jan 1, 2013·1 cites·28 claims
- 1266US2025334683A1Test and/or measurement instrument and test system for testing an optoelectronic device under testROHDE & SCHWARZ·Filed 2024·Application pending·0 cites
- 1365US2018246415A1Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2018·Application pending·0 cites
- 1464US2024230853A1Device and method for scanning measurement of the distance to an objectScantinel Photonics GmbH·Filed 2024·Application pending·0 cites
- 1562US11402760B2Optical arrangement and lithography apparatusZEISS CARL SMT GMBH·Filed 2021·Granted Aug 2, 2022·0 cites·20 claims
- 1660US9019475B2Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2014·Granted Apr 28, 2015·0 cites·26 claims
- 1757US11747473B2Apparatus and method for ascertaining a distance to an objectZEISS CARL AG·Filed 2020·Granted Sep 5, 2023·0 cites·23 claims
- 1856US11504855B2System, method and marker for the determination of the position of a movable object in spaceZEISS CARL SMT GMBH·Filed 2019·Granted Nov 22, 2022·0 cites·23 claims
- 1956US2022099800A1Method and device for scanning distance and velocity determinationZEISS CARL AG·Filed 2021·Application pending·0 cites
- 2055US12345817B2Method for operating a LIDAR systemZEISS CARL AG·Filed 2020·Granted Jul 1, 2025·0 cites·21 claims
- 2155US9348232B2Illumination system for a microlithographic projection exposure apparatusHORN JAN·Filed 2010·Granted May 24, 2016·1 cites·26 claims
- 2255US2024230854A1Device and method for scanning measurement of the distance to an objectScantinel Photonics GmbH·Filed 2024·Application pending·0 cites
- 2354US11262660B2Image sensor, position sensor device, lithography system, and method for operating an image sensorZEISS CARL SMT GMBH·Filed 2020·Granted Mar 1, 2022·0 cites·20 claims
- 2453US2025251512A1Device and Method for Scanning Range MeasurementScantinel Photonics GmbH·Filed 2025·Application pending·0 cites
- 2552US10061202B2Methods and devices for driving micromirrorsZEISS CARL SMT GMBH·Filed 2012·Granted Aug 28, 2018·0 cites·23 claims
- 2651US12276917B2Mirror, in particular for microlithographyZEISS CARL SMT GMBH·Filed 2022·Granted Apr 15, 2025·0 cites·19 claims
- 2750US10459351B2Device for transmitting electrical signals, and lithography apparatusZEISS CARL SMT GMBH·Filed 2019·Granted Oct 29, 2019·0 cites·20 claims
- 2847US10514619B2Sensor arrangement for a lithography system, lithography system, and method for operating a lithography systemZEISS CARL SMT GMBH·Filed 2018·Granted Dec 24, 2019·0 cites·20 claims
- 2947US10444633B2Sensor assembly and method for determining respective positions of a number of mirrors of a lithography systemZEISS CARL SMT GMBH·Filed 2017·Granted Oct 15, 2019·0 cites·30 claims
- 3047US10437155B2Sensor assembly and method for determining respective positions of a number of mirrors of a lithography systemZEISS CARL SMT GMBH·Filed 2017·Granted Oct 8, 2019·0 cites·34 claims
- 3144US10018803B2Device and method for controlling positioning of multiple adjustable mirror elements in a multi-mirror arrangementZEISS CARL SMT GMBH·Filed 2016·Granted Jul 10, 2018·0 cites·20 claims
- 3242US10007195B2Device for determining a tilt angle of at least one mirror of a lithography system, and methodZEISS CARL SMT GMBH·Filed 2016·Granted Jun 26, 2018·0 cites·20 claims
- 3339US9599788B2Optical moduleZEISS CARL SMT GMBH·Filed 2015·Granted Mar 21, 2017·0 cites·31 claims
- 3433US2015185469A1Method for regulating the tilting of a mirror elementZEISS CARL SMT GMBH·Filed 2015·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →