Inventor · disambiguated record
Jae Chang Jung
Also filed as: JUNG JAE C · JUNG JAE CHANG
155 granted patents·21 pending applications·6,298 citations·filing 1997–2011
99Inventor score
Files withHYNIX SEMICONDUCTOR INC106HYUNDAI ELECTRONICS IND63JUNG JAE CHANG2DONGJIN SEMICHEM CO LTD1HYUNDAI ELECTRONICS CO LTD1
Top patents by PatentIndex Score
176 records- 0199US7361447B2Photoresist polymer and photoresist composition containing the sameHYNIX SEMICONDUCTOR INC·Filed 2004·Granted Apr 22, 2008·465 cites·22 claims
- 0299US6811960B2Partially crosslinked polymer for bilayer photoresistHYUNDAI ELECTRONICS IND·Filed 2003·Granted Nov 2, 2004·467 cites·16 claims
- 0399US6589707B2Partially crosslinked polymer for bilayer photoresistHYUNDAI ELECTRONICS IND·Filed 2001·Granted Jul 8, 2003·485 cites·23 claims
- 0499US6455225B1Photoresist monomers having stability to post exposure delay, polymers thereof and photoresist compositions containing the sameHYUNDAI ELECTRONICS IND·Filed 2000·Granted Sep 24, 2002·465 cites·22 claims
- 0599US6225020B1Polymer and a forming method of a micro pattern using the sameHYUNDAI ELECTRONICS IND·Filed 1999·Granted May 1, 2001·508 cites·20 claims
- 0698US6987155B2Polymers for photoresist and photoresist compositions using the sameHYUNDAI ELECTRONICS IND·Filed 2003·Granted Jan 17, 2006·463 cites·15 claims
- 0798US6924078B2Photoresist monomers, polymers and photoresist compositions for preventing acid diffusionDONGJIN SEMICHEM CO LTD·Filed 2002·Granted Aug 2, 2005·463 cites·17 claims
- 0898US6916594B2Overcoating composition for photoresist and method for forming photoresist pattern using the sameHYNIX SEMICONDUCTOR INC·Filed 2003·Granted Jul 12, 2005·128 cites·16 claims
- 0998US6569971B2Polymers for photoresist and photoresist compositions using the sameHYUNDAI ELECTRONICS IND·Filed 1999·Granted May 27, 2003·473 cites·5 claims
- 1098US6368773B1Photoresist cross-linker and photoresist composition comprising the sameHYUNDAI ELECTRONICS IND·Filed 1999·Granted Apr 9, 2002·473 cites·10 claims
- 1198US6316162B1Polymer and a forming method of a micro pattern using the sameHYUNDAI ELECTRONICS IND·Filed 1999·Granted Nov 13, 2001·482 cites·7 claims
- 1297US6866984B2ArF photoresist copolymersHYUNDAI ELECTRONICS IND·Filed 2003·Granted Mar 15, 2005·88 cites·10 claims
- 1396US7790357B2Method of forming fine pattern of semiconductor deviceHYNIX SEMICONDUCTOR INC·Filed 2007·Granted Sep 7, 2010·32 cites·20 claims
- 1495US7959818B2Method for forming a fine pattern of a semiconductor deviceHYNIX SEMICONDUCTOR INC·Filed 2007·Granted Jun 14, 2011·31 cites·20 claims
- 1595US7314810B2Method for forming fine pattern of semiconductor deviceHYNIX SEMICONDUCTOR INC·Filed 2006·Granted Jan 1, 2008·32 cites·20 claims
- 1694US6632903B2Polymer-containing photoresist, and process for manufacturing the sameHYUNDAI ELECTRONICS IND·Filed 2001·Granted Oct 14, 2003·31 cites·7 claims
- 1793US7754591B2Method for forming fine pattern of semiconductor deviceHYNIX SEMICONDUCTOR INC·Filed 2007·Granted Jul 13, 2010·24 cites·25 claims
- 1892US6627384B1Photoresist composition for resist flow process and process for forming a contact hole using the sameHYUNDAI ELECTRONICS IND·Filed 2000·Granted Sep 30, 2003·45 cites·13 claims
- 1991US6132926AArF photoresist copolymersHYUNDAI ELECTRONICS IND·Filed 1997·Granted Oct 17, 2000·79 cites·40 claims
- 2090US6395451B1Photoresist composition containing photo base generator with photo acid generatorHYUNDAI ELECTRONICS IND·Filed 2000·Granted May 28, 2002·48 cites·17 claims
- 2190US6235447B1Photoresist monomers, polymers thereof, and photoresist compositions containing the sameHYUNDAI ELECTRONICS IND·Filed 1999·Granted May 22, 2001·38 cites·35 claims
- 2289US8067146B2Method for forming a fine pattern in a semicondutor deviceJUNG JAE CHANG·Filed 2007·Granted Nov 29, 2011·14 cites·11 claims
- 2389US7033729B2Light absorbent agent polymer for organic anti-reflective coating and preparation method and organic anti-reflective coating composition comprising the sameHYNIX SEMICONDUCTOR INC·Filed 2004·Granted Apr 25, 2006·32 cites·14 claims
- 2487US7303858B2Photoacid generating polymer, its preparation method, top anti-reflective coating composition comprising the same, method of forming a pattern in a semiconductor device, and semiconductor deviceHYNIX SEMICONDUCTOR INC·Filed 2005·Granted Dec 4, 2007·9 cites·26 claims
- 2587US6489432B2Organic anti-reflective coating polymer and preparation thereofHYUNDAI ELECTRONICS IND·Filed 2000·Granted Dec 3, 2002·25 cites·21 claims
- 2686US6692891B2Photoresist composition containing photo radical generator with photoacid generatorHYNIX SEMICONDUCTOR INC·Filed 2001·Granted Feb 17, 2004·60 cites·13 claims
- 2786US6426171B1Photoresist monomer, polymer thereof and photoresist composition containing itHYUNDAI ELECTRONICS IND·Filed 2000·Granted Jul 30, 2002·16 cites·26 claims
- 2886US6312865B1Semiconductor device using polymer-containing photoresist, and process for manufacturing the sameHYUNDAI ELECTRONICS IND·Filed 1998·Granted Nov 6, 2001·24 cites·12 claims
- 2984US6150069AOxabicyclo compound, a polymer-containing said compound, and a photoresist micro pattern forming method using the sameHYUNDAI ELECTRONICS IND·Filed 1999·Granted Nov 21, 2000·50 cites·18 claims
- 3082US7737227B2Composition for an organic hard mask and method for forming a pattern on a semiconductor device using the sameHYNIX SEMICONDUCTOR INC·Filed 2005·Granted Jun 15, 2010·6 cites·6 claims
- 3182US6028153ACopolymer resin of maleimide and alicyclic olefin-based monomers, photoresist containing the copolymer resin and the preparation thereofHYUNDAI ELECTRONICS IND·Filed 1998·Granted Feb 22, 2000·38 cites·13 claims
- 3280US6403281B1Cross-linker monomer comprising double bond and photoresist copolymer containing the sameHYUNDAI ELECTRONICS IND·Filed 2000·Granted Jun 11, 2002·17 cites·21 claims
- 3379US7655568B2Method for manufacturing underlying pattern of semiconductor deviceHYNIX SEMICONDUCTOR INC·Filed 2006·Granted Feb 2, 2010·6 cites·8 claims
- 3479US6569599B2Partially crosslinked polymer for bilayer photoresistHYNIX SEMICONDUCTOR INC·Filed 2001·Granted May 27, 2003·17 cites·33 claims
- 3579US6265130B1Photoresist polymers of carboxyl-containing alicyclic compoundsHYUNDAI ELECTRONICS IND·Filed 1999·Granted Jul 24, 2001·16 cites·15 claims
- 3677US6322948B1Photoresist cross-linker and photoresist composition comprising the sameHYUNDAI ELECTRONICS IND·Filed 2000·Granted Nov 27, 2001·15 cites·10 claims
- 3777US6312868B1Photoresist cross-linker and photoresist composition comprising the sameHYUNDAI ELECTRONICS IND·Filed 2000·Granted Nov 6, 2001·14 cites·19 claims
- 3876US7326525B2Top anti-reflective coating polymer, its preparation method and top anti-reflective coating composition comprising the sameHYNIX SEMICONDUCTOR INC·Filed 2005·Granted Feb 5, 2008·3 cites·17 claims
- 3976US6835532B2Organic anti-reflective coating composition and method for forming photoresist patterns using the sameHYNIX SEMICONDUCTOR INC·Filed 2003·Granted Dec 28, 2004·13 cites·19 claims
- 4076US6764806B2Over-coating composition for photoresist, and processes for forming photoresist patterns using the sameHYUNDAI ELECTRONICS IND·Filed 2000·Granted Jul 20, 2004·17 cites·20 claims
- 4175US6291131B1Monomers for photoresist, polymers thereof, and photoresist compositions using the sameHYUNDAI ELECTRONICS IND·Filed 1999·Granted Sep 18, 2001·18 cites·32 claims
- 4275US6248847B1Copolymer resin, preparation thereof, and photoresist using the sameHYUNDAI ELECTRONICS IND·Filed 1998·Granted Jun 19, 2001·12 cites·6 claims
- 4375US6235448B1Photoresist monomers, polymers thereof, and photoresist compositions containing the sameHYUNDAI ELECTRONICS IND·Filed 1999·Granted May 22, 2001·32 cites·23 claims
- 4474US7824841B2Method for forming a fine pattern of a semiconductor deviceHYNIX SEMICONDUCTOR INC·Filed 2007·Granted Nov 2, 2010·3 cites·13 claims
- 4574US6368770B1Photoresist monomers, polymers thereof, and photoresist compositions containing the sameHYUNDAI ELECTRONICS IND·Filed 2000·Granted Apr 9, 2002·12 cites·31 claims
- 4674US6316565B1Amide- or imide-introduced copolymer, preparation thereof and a photoresist comprising the sameHYUNDAI ELECTRONICS IND·Filed 1997·Granted Nov 13, 2001·27 cites·4 claims
- 4773US7494935B2Method for forming fine pattern of semiconductor deviceHYNIX SEMICONDUCTOR INC·Filed 2007·Granted Feb 24, 2009·4 cites·20 claims
- 4873US7462439B2Top anti-reflective coating polymer, its preparation method and top anti-reflective coating composition comprising the sameHYNIX SEMICONDUCTOR INC·Filed 2005·Granted Dec 9, 2008·3 cites·22 claims
- 4973US7381519B2Top anti-reflective coating polymer, its preparation method and top anti-reflective coating composition comprising the sameHYNIX SEMICONDUCTOR INC·Filed 2005·Granted Jun 3, 2008·4 cites·22 claims
- 5073US6399272B1Phenylenediamine derivative-type additive useful for a chemically amplified photoresistHYUNDAI ELECTRONICS IND·Filed 2000·Granted Jun 4, 2002·11 cites·24 claims
Showing the top 50 of 176 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →