Inventor · disambiguated record
James E. Klekotka
Also filed as: KLEKOTKA JAMES · KLEKOTKA JAMES E · KLEKOTKA JAMES EDMUND
7 granted patents·9 pending applications·157 citations·filing 1987–2008
87Inventor score
Top patents by PatentIndex Score
16 records- 0194US7300730B1Creating an optically tunable anti-reflective coatingTOKYO ELECTRON LTD·Filed 2006·Granted Nov 27, 2007·26 cites·28 claims
- 0290US6898558B2Method and apparatus for monitoring a material processing systemTOKYO ELECTRON LTD·Filed 2002·Granted May 24, 2005·64 cites·81 claims
- 0377US7555395B2Methods and apparatus for using an optically tunable soft mask to create a profile libraryTOKYO ELECTRON LTD·Filed 2006·Granted Jun 30, 2009·5 cites·38 claims
- 0468US4856032AHigh speed programmable frequency divider and PLLMOTOROLA INC·Filed 1987·Granted Aug 8, 1989·22 cites·5 claims
- 0567US6491257B1Technique for satellite constellation growthMOTOROLA INC·Filed 1999·Granted Dec 10, 2002·28 cites·10 claims
- 0657US6985787B2Method and apparatus for monitoring parts in a material processing systemTOKYO ELECTRON LTD·Filed 2002·Granted Jan 10, 2006·6 cites·81 claims
- 0755US7437199B2Method for data pre-populationTOKYO ELECTRON LTD·Filed 2004·Granted Oct 14, 2008·6 cites·33 claims
- 0845US2008074678A1Accuracy of optical metrology measurementsTOKYO ELECTRON LTD·Filed 2006·Application pending·0 cites
- 0945US2008074677A1accuracy of optical metrology measurementsTOKYO ELECTRON LTD·Filed 2006·Application pending·0 cites
- 1045US2008076046A1accuracy of optical metrology measurementsTOKYO ELECTRON LTD·Filed 2006·Application pending·0 cites
- 1144US2009211604A1System and Method For Removing Edge-Bead MaterialTOKYO ELECTRON LTD·Filed 2008·Application pending·0 cites
- 1244US2009211603A1System and Method For Removing Post-Etch ResidueTOKYO ELECTRON LTD·Filed 2008·Application pending·0 cites
- 1342US2008077352A1Methods and apparatus for using an optically tunable soft mask profile libraryTOKYO ELECTRON LTD·Filed 2006·Application pending·0 cites
- 1436US2004126906A1Method and apparatus for monitoring a material processing systemTOKYO ELECTRON LTD·Filed 2002·Application pending·0 cites
- 1536US2004127030A1Method and apparatus for monitoring a material processing systemTOKYO ELECTRON LTD·Filed 2002·Application pending·0 cites
- 1636US2004127031A1Method and apparatus for monitoring a plasma in a material processing systemTOKYO ELECTRON LTD·Filed 2002·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →