Inventor · disambiguated record
James L'Heureux
Also filed as: L'HEUREUX JAMES · L'HEUREUX JAMES OMER
10 granted patents·10 pending applications·16 citations·filing 2010–2025
83Inventor score
Top patents by PatentIndex Score
20 records- 0190US10187966B2Method and apparatus for gas abatementAPPLIED MATERIALS INC·Filed 2016·Granted Jan 22, 2019·8 cites·17 claims
- 0280US11768984B2Parameter sensing and computer modeling for gas delivery health monitoringAPPLIED MATERIALS INC·Filed 2020·Granted Sep 26, 2023·1 cites·19 claims
- 0380US10889891B2Apparatus for gaseous byproduct abatement and foreline cleaningAPPLIED MATERIALS INC·Filed 2019·Granted Jan 12, 2021·3 cites·15 claims
- 0475US2025123186A1Method and system for detecting anomalies in a semiconductor processing systemAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 0573US10757797B2Method and apparatus for gas abatementAPPLIED MATERIALS INC·Filed 2018·Granted Aug 25, 2020·1 cites·18 claims
- 0673US2025320602A1System and method for controlling foreline pressureAPPLIED MATERIALS INC·Filed 2025·Application pending·0 cites
- 0770US2020032392A1Hyrodgen partial pressure control in a vacuum process chamberAPPLIED MATERIALS INC·Filed 2019·Application pending·0 cites
- 0868US12442074B2System and method for controlling foreline pressureAPPLIED MATERIALS INC·Filed 2022·Granted Oct 14, 2025·0 cites·17 claims
- 0968US10435787B2Hydrogen partial pressure control in a vacuum process chamberAPPLIED MATERIALS INC·Filed 2017·Granted Oct 8, 2019·0 cites·20 claims
- 1067US10861681B2Apparatus for collection and subsequent reaction of liquid and solid effluent into gaseous effluentAPPLIED MATERIALS INC·Filed 2018·Granted Dec 8, 2020·1 cites·22 claims
- 1167US9022715B2Load lock chamber designs for high-throughput processing systemAPPLIED MATERIALS INC·Filed 2013·Granted May 5, 2015·2 cites·12 claims
- 1265US2023100659A1Reduction of br2 and cl2 in semiconductor processesAPPLIED MATERIALS INC·Filed 2022·Application pending·0 cites
- 1361US12203828B2Method and system for detecting anomalies in a semiconductor processing systemAPPLIED MATERIALS INC·Filed 2021·Granted Jan 21, 2025·0 cites·14 claims
- 1461US11551917B2Reduction of Br2 and Cl2 in semiconductor processesAPPLIED MATERIALS INC·Filed 2020·Granted Jan 10, 2023·0 cites·20 claims
- 1561US2024347324A1Method for organic effluent abatementAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 1646US2022199380A1High efficiency trap for particle collection in a vacuum forelineAPPLIED MATERIALS INC·Filed 2020·Application pending·0 cites
- 1738US2013171757A1Advanced platform for passivating crystalline silicon solar cellsPONNEKANTI HARI K·Filed 2013·Application pending·0 cites
- 1837US2011274836A1Removal of trapped silicon with a cleaning gasAPPLIED MATERIALS INC·Filed 2010·Application pending·0 cites
- 1936US2018166306A1Quartz crystal microbalance utilization for foreline solids formation quantificationAPPLIED MATERIALS INC·Filed 2017·Application pending·0 cites
- 2035US2018221816A1Plasma abatement of nitrous oxide from semiconductor process effluentsAPPLIED MATERIALS INC·Filed 2018·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →