Inventor · disambiguated record
Jason Marion
Also filed as: MARION JASON · MARION JASON WAYNE
5 granted patents·6 pending applications·2 citations·filing 2015–2024
63Inventor score
Top patents by PatentIndex Score
11 records- 0169US10818502B2System and method of plasma discharge ignition to reduce surface particlesTOKYO ELECTRON LTD·Filed 2017·Granted Oct 27, 2020·1 cites·10 claims
- 0265US10651017B2Method for operation instability detection in a surface wave plasma sourceTOKYO ELECTRON LTD·Filed 2017·Granted May 12, 2020·1 cites·16 claims
- 0357US2025183046A1Plasma process for etching a multilayer stackTOKYO ELECTRON LTD·Filed 2023·Application pending·0 cites
- 0456US2025285911A1In situ etch rate differentiation through oxidationTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 0555US2025273466A1Vertical feature growth using fluorine-containing gasTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 0653US10818482B2Methods for stability monitoring and improvements to plasma sources for plasma processingTOKYO ELECTRON LTD·Filed 2019·Granted Oct 27, 2020·0 cites·20 claims
- 0753US10083820B2Dual-frequency surface wave plasma sourceTOKYO ELECTRON LTD·Filed 2017·Granted Sep 25, 2018·0 cites·21 claims
- 0853US2024234158A1Method for Etching Features in a Layer in a SubstrateTOKYO ELECTRON LTD·Filed 2023·Application pending·0 cites
- 0946US2024271178A1Method for detection of escherichia coli and antibiotic resistant bacteria in waterEASTERN KENTUCKY UNIV·Filed 2021·Application pending·0 cites
- 1041US9530626B2Method and apparatus for ESC charge control for wafer clampingTOKYO ELECTRON LTD·Filed 2015·Granted Dec 27, 2016·0 cites·20 claims
- 1138US2018323045A1Manufacturing methods to reduce surface particle impurities after a plasma processTOKYO ELECTRON LTD·Filed 2018·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →