Inventor · disambiguated record
James F. Vanell
Also filed as: VANELL JAMES · VANELL JAMES F
19 granted patents·686 citations·filing 1993–2002
96Inventor score
Top patents by PatentIndex Score
19 records- 0192US6592434B1Wafer carrier and method of material removal from a semiconductor waferMOTOROLA INC·Filed 2000·Granted Jul 15, 2003·57 cites·23 claims
- 0292US5750440AApparatus and method for dynamically mixing slurry for chemical mechanical polishingMOTOROLA INC·Filed 1995·Granted May 12, 1998·137 cites·23 claims
- 0389US5647911AGas diffuser plate assembly and RF electrodeSONY CORP·Filed 1993·Granted Jul 15, 1997·74 cites·16 claims
- 0487US6267641B1Method of manufacturing a semiconductor component and chemical-mechanical polishing system thereforMOTOROLA INC·Filed 2000·Granted Jul 31, 2001·42 cites·6 claims
- 0586US6149508AChemical mechanical planarization systemMOTOROLA INC·Filed 1999·Granted Nov 21, 2000·62 cites·20 claims
- 0685US5945346AChemical mechanical planarization system and method thereforMOTOROLA INC·Filed 1997·Granted Aug 31, 1999·60 cites·15 claims
- 0782US6592708B2Filter apparatus and method thereforMOTOROLA INC·Filed 2002·Granted Jul 15, 2003·23 cites·25 claims
- 0880US6263605B1Pad conditioner coupling and end effector for a chemical mechanical planarization system and method thereforMOTOROLA INC·Filed 1998·Granted Jul 24, 2001·41 cites·12 claims
- 0974US6406555B1Point of use dilution tool and methodMOTOROLA INC·Filed 2000·Granted Jun 18, 2002·14 cites·14 claims
- 1071US6514126B1Pad conditioner coupling and end effector for a chemical mechanical planarization system and method thereforMOTOROLA INC·Filed 2000·Granted Feb 4, 2003·12 cites·3 claims
- 1171US5743788APlaten coating structure for chemical mechanical polishing and methodMOTOROLA INC·Filed 1996·Granted Apr 28, 1998·32 cites·29 claims
- 1267US6572462B1Carrier assembly for chemical mechanical planarization systems and methodMOTOROLA INC·Filed 1998·Granted Jun 3, 2003·27 cites·23 claims
- 1366US5908508AGas diffuser plate assembly and RF electrodeTOKYO ELECTRON LTD·Filed 1995·Granted Jun 1, 1999·26 cites·5 claims
- 1462US6796885B2Pad conditioner coupling and end effector for a chemical mechanical planarization system and method therforFREESCALE SEMICONDUCTOR INC·Filed 2002·Granted Sep 28, 2004·8 cites·4 claims
- 1561US6423638B1Filter apparatus and method thereforMOTOROLA INC·Filed 1999·Granted Jul 23, 2002·20 cites·12 claims
- 1661US6070600APoint of use dilution tool and methodMOTOROLA INC·Filed 1997·Granted Jun 6, 2000·22 cites·7 claims
- 1753US6107203AChemical mechanical polishing system and method thereforMOTOROLA INC·Filed 1997·Granted Aug 22, 2000·16 cites·12 claims
- 1852US6482073B1Translation mechanism for a chemical mechanical planarization system and method thereforMOTOROLA INC·Filed 2000·Granted Nov 19, 2002·4 cites·2 claims
- 1945US6135855ATranslation mechanism for a chemical mechanical planarization system and method thereforMOTOROLA INC·Filed 1998·Granted Oct 24, 2000·9 cites·15 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →