Inventor · disambiguated record
Jeffrey P. Chamberlain
Also filed as: CHAMBERLAIN JEFFREY P
9 granted patents·3 pending applications·460 citations·filing 1998–2006
92Inventor score
Top patents by PatentIndex Score
12 records- 0197US6776810B1Anionic abrasive particles treated with positively charged polyelectrolytes for CMPCABOT MICROELECTRONICS CORP·Filed 2002·Granted Aug 17, 2004·112 cites·34 claims
- 0292US6936543B2CMP method utilizing amphiphilic nonionic surfactantsCABOT MICROELECTRONICS CORP·Filed 2002·Granted Aug 30, 2005·82 cites·30 claims
- 0390US6821897B2Method for copper CMP using polymeric complexing agentsCABOT MICROELECTRONICS CORP·Filed 2002·Granted Nov 23, 2004·60 cites·30 claims
- 0489US6431953B1CMP process involving frequency analysis-based monitoringCABOT MICROELECTRONICS CORP·Filed 2001·Granted Aug 13, 2002·57 cites·23 claims
- 0586US7306637B2Anionic abrasive particles treated with positively charged polyelectrolytes for CMPCABOT MICROELECTRONICS CORP·Filed 2004·Granted Dec 11, 2007·27 cites·18 claims
- 0684US6974777B2CMP compositions for low-k dielectric materialsCABOT MICROELECTRONICS CORP·Filed 2002·Granted Dec 13, 2005·35 cites·32 claims
- 0784US6726534B1Preequilibrium polishing method and systemCABOT MICROELECTRONICS CORP·Filed 2002·Granted Apr 27, 2004·39 cites·45 claims
- 0876US6612911B2Alkali metal-containing polishing system and methodCABOT MICROELECTRONICS CORP·Filed 2002·Granted Sep 2, 2003·11 cites·48 claims
- 0971US6053032ASystem and method for determining a deposition rate in a process stream indicative of a mass build-up and for controlling feed of a product in the process stream to combat sameNALCO CHEMICAL CO·Filed 1998·Granted Apr 25, 2000·37 cites·8 claims
- 1041US2008220610A1Silicon oxide polishing method utilizing colloidal silicaCABOT MICROELECTRONICS CORP·Filed 2006·Application pending·0 cites
- 1141US2008020680A1Rate-enhanced CMP compositions for dielectric filmsCABOT MICROELECTRONICS CORP·Filed 2006·Application pending·0 cites
- 1232US2001037821A1Integrated chemical-mechanical polishingFiled 2001·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →