Inventor · disambiguated record
Jens Kramer
Also filed as: KRAMER JENS
8 granted patents·2 pending applications·58 citations·filing 2002–2021
83Inventor score
Files withADVANCED MICRO DEVICES INC3GLOBALFOUNDRIES INC3GEA MECHANICAL EQUIPMENT GMBH1KRAMER JENS1SCHAEFFLER TECHNOLOGIES AG1
Top patents by PatentIndex Score
10 records- 0179US6719655B2Electrodynamic drive systemZAHNRADFABRIK FRIEDRICHSHAFEN·Filed 2002·Granted Apr 13, 2004·34 cites·8 claims
- 0268US7150675B2Method and system for controlling the chemical mechanical polishing by using a sensor signal of a pad conditionerADVANCED MICRO DEVICES INC·Filed 2003·Granted Dec 19, 2006·15 cites·13 claims
- 0367US9685342B2Wafer processing apparatuses and methods of operating the sameGLOBALFOUNDRIES INC·Filed 2014·Granted Jun 20, 2017·3 cites·17 claims
- 0460US12055187B2Wet multi-plate clutchSCHAEFFLER TECHNOLOGIES AG·Filed 2021·Granted Aug 6, 2024·0 cites·13 claims
- 0554US9312142B2Chemical mechanical polishing method and apparatusGLOBALFOUNDRIES INC·Filed 2014·Granted Apr 12, 2016·0 cites·8 claims
- 0651US10322493B2Chemical mechanical polishing apparatusGLOBALFOUNDRIES INC·Filed 2016·Granted Jun 18, 2019·0 cites·16 claims
- 0743US2015152518A1Method for Reprocessing an Emulsion Formed During Hydrometallurgical Recovery of a MetalGEA MECHANICAL EQUIPMENT GMBH·Filed 2013·Application pending·0 cites
- 0841US6957997B2Method and system for controlling the chemical mechanical polishing by using a sensor signal of a pad conditionerADVANCED MICRO DEVICES INC·Filed 2004·Granted Oct 25, 2005·2 cites·15 claims
- 0940US7198542B2Method and system for controlling the chemical mechanical polishing by using a seismic signal of a seismic sensorADVANCED MICRO DEVICES INC·Filed 2004·Granted Apr 3, 2007·4 cites·13 claims
- 1035US2004123951A1Retaining ring having reduced wear and contamination rate for a polishing head of a CMP toolKRAMER JENS·Filed 2003·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →