Inventor · disambiguated record
Jeffrey Ludwig
Also filed as: LUDWIG JEFFREY · LUDWIG JEFFREY T
7 granted patents·3 pending applications·37 citations·filing 1997–2024
79Inventor score
Top patents by PatentIndex Score
10 records- 0193US11668602B2Spatial optical emission spectroscopy for etch uniformityAPPLIED MATERIALS INC·Filed 2021·Granted Jun 6, 2023·2 cites·18 claims
- 0280US12405164B2Spatial optical emission spectroscopy for etch uniformityAPPLIED MATERIALS INC·Filed 2023·Granted Sep 2, 2025·0 cites·20 claims
- 0380USD931240SSubstrate support pedestalAPPLIED MATERIALS INC·Filed 2019·Granted Sep 21, 2021·18 cites·1 claims
- 0456US2025323023A1Heated Lid Ring for Chamber Wall Temperature ControlAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 0555US5999954ALow-power digital filtering utilizing adaptive approximate filteringMASSACHUSETTS INST TECHNOLOGY·Filed 1997·Granted Dec 7, 1999·17 cites·22 claims
- 0653US11264252B2Chamber lid with integrated heaterAPPLIED MATERIALS INC·Filed 2019·Granted Mar 1, 2022·0 cites·20 claims
- 0746US12068135B2Fast gas exchange apparatus, system, and methodAPPLIED MATERIALS INC·Filed 2021·Granted Aug 20, 2024·0 cites·14 claims
- 0846US9355776B2Capacitor assemblies for coupling radio frequency (RF) and direct current (DC) energy to one or more common electrodesAPPLIED MATERIALS INC·Filed 2014·Granted May 31, 2016·0 cites·20 claims
- 0943US2021035851A1Low contact area substrate support for etching chamberAPPLIED MATERIALS INC·Filed 2019·Application pending·0 cites
- 1040US2018323042A1Method to modulate the wafer edge sheath in a plasma processing chamberAPPLIED MATERIALS INC·Filed 2018·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →