Inventor · disambiguated record
Jen-Shiang Wang
Also filed as: WANG JEN-SHIANG
21 granted patents·9 pending applications·60 citations·filing 2004–2024
92Inventor score
Top patents by PatentIndex Score
30 records- 0196US9804504B2Method and apparatus for design of a metrology targetASML NETHERLANDS BV·Filed 2016·Granted Oct 31, 2017·13 cites·20 claims
- 0295US9355200B2Method and apparatus for design of a metrology targetASML NETHERLANDS BV·Filed 2014·Granted May 31, 2016·16 cites·20 claims
- 0394US9903823B2Metrology method and apparatusASML NETHERLANDS BV·Filed 2015·Granted Feb 27, 2018·10 cites·20 claims
- 0486US9494874B2Method and apparatus for design of a metrology targetASML NETHERLANDS BV·Filed 2014·Granted Nov 15, 2016·5 cites·18 claims
- 0579US10691029B2Substrate measurement recipe configuration to improve device matchingASML NETHERLANDS BV·Filed 2017·Granted Jun 23, 2020·2 cites·20 claims
- 0677US2025078244A1Utilize machine learning in selecting high quality averaged sem images from raw images automaticallyASML NETHERLANDS BV·Filed 2024·Application pending·0 cites
- 0776US11675274B2Etch bias characterization and method of using the sameASML NETHERLANDS BV·Filed 2018·Granted Jun 13, 2023·1 cites·20 claims
- 0876US11567413B2Method for determining stochastic variation of printed patternsASML NETHERLANDS BV·Filed 2020·Granted Jan 31, 2023·1 cites·20 claims
- 0975US12468232B2Etch bias characterization and method of using the sameASML NETHERLANDS BV·Filed 2023·Granted Nov 11, 2025·0 cites·20 claims
- 1074US10296681B2Process based metrology target designASML NETHERLANDS BV·Filed 2018·Granted May 21, 2019·1 cites·23 claims
- 1173US10007744B2Process based metrology target designASML NETHERLANDS BV·Filed 2015·Granted Jun 26, 2018·2 cites·20 claims
- 1270US11580274B2Method and apparatus for inspection and metrologyASML NETHERLANDS BV·Filed 2016·Granted Feb 14, 2023·1 cites·20 claims
- 1369US12204826B2Method and apparatus for inspection and metrologyASML NETHERLANDS BV·Filed 2023·Granted Jan 21, 2025·0 cites·20 claims
- 1468US11614690B2Methods of tuning process modelsASML NETHERLANDS BV·Filed 2018·Granted Mar 28, 2023·1 cites·20 claims
- 1567US10948831B2Methods of determining process models by machine learningASML NETHERLANDS BV·Filed 2018·Granted Mar 16, 2021·1 cites·22 claims
- 1663US2021271172A1Methods of determining process models by machine learningASML NETHERLANDS BV·Filed 2021·Application pending·0 cites
- 1759US12182983B2Utilize machine learning in selecting high quality averaged SEM images from raw images automaticallyASML NETHERLANDS BV·Filed 2019·Granted Dec 31, 2024·0 cites·20 claims
- 1858US12505524B2Method for training or using a process model for determining a pattern in a patterning processASML NETHERLANDS BV·Filed 2020·Granted Dec 23, 2025·0 cites·21 claims
- 1958US2024377343A1Method for converting metrology dataASML NETHERLANDS BV·Filed 2022·Application pending·0 cites
- 2057US7092138B2Elastomer spatial light modulators for extreme ultraviolet lithographyUNIV LELAND STANFORD JUNIOR·Filed 2004·Granted Aug 15, 2006·5 cites·22 claims
- 2156US9696635B2Method of controlling a lithographic apparatus, device manufacturing method, lithographic apparatus, computer program product and method of improving a mathematical model of a lithographic processENGELEN ADRIANUS FRANSISCUS PETRUS·Filed 2012·Granted Jul 4, 2017·1 cites·20 claims
- 2255US2025021015A1Determining an etch effect based on an etch bias directionASML NETHERLANDS BV·Filed 2022·Application pending·0 cites
- 2354US11977336B2Method for improving a process for a patterning processASML NETHERLANDS BV·Filed 2019·Granted May 7, 2024·0 cites·21 claims
- 2454US2023244152A1Systems, methods, and products for determining printing probability of assist feature and its applicationASML NETHERLANDS BV·Filed 2021·Application pending·0 cites
- 2552US11875101B2Method for patterning process modellingASML NETHERLANDS BV·Filed 2020·Granted Jan 16, 2024·0 cites·20 claims
- 2651US2024272543A1Determining rounded contours for lithography related patternsASML NETHERLANDS BV·Filed 2022·Application pending·0 cites
- 2745US2022299881A1Methods for improving process based contour information of structure in imageASML NETHERLANDS BV·Filed 2020·Application pending·0 cites
- 2844US2022284344A1Method for training machine learning model for improving patterning processASML NETHERLANDS BV·Filed 2020·Application pending·0 cites
- 2943US10983440B2Selection of substrate measurement recipesASML NETHERLANDS BV·Filed 2017·Granted Apr 20, 2021·0 cites·20 claims
- 3037US2021294218A1Modeling post-exposure processesASML NETHERLANDS BV·Filed 2017·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →