Inventor · disambiguated record
Jin-Ho Jeon
Also filed as: JEON JIN-HO
19 granted patents·9 pending applications·405 citations·filing 1998–2022
94Inventor score
Files withSAMSUNG ELECTRONICS CO LTD13APPLIED MATERIALS INC4SK PLANET CO LTD3AURA CO LTD1LEE MIN-WOO1
Top patents by PatentIndex Score
28 records- 0195US7910491B2Gapfill improvement with low etch rate dielectric linersAPPLIED MATERIALS INC·Filed 2009·Granted Mar 22, 2011·90 cites·24 claims
- 0294US7183214B2High-density plasma (HDP) chemical vapor deposition (CVD) methods and methods of fabricating semiconductor devices employing the sameSAMSUNG ELECTRONICS CO LGD·Filed 2005·Granted Feb 27, 2007·237 cites·10 claims
- 0391US7745350B2Impurity control in HDP-CVD DEP/ETCH/DEP processesAPPLIED MATERIALS INC·Filed 2008·Granted Jun 29, 2010·13 cites·12 claims
- 0480US7867921B2Reduction of etch-rate drift in HDP processesAPPLIED MATERIALS INC·Filed 2008·Granted Jan 11, 2011·7 cites·19 claims
- 0577US10694340B2Apparatus for producing radio map and method of operating sameSK PLANET CO LTD·Filed 2019·Granted Jun 23, 2020·2 cites·8 claims
- 0663US7446367B2Reliable gap-filling process and apparatus for performing the process in the manufacturing of semiconductor devicesSAMSUNG ELECTRONICS CO LTD·Filed 2006·Granted Nov 4, 2008·2 cites·8 claims
- 0763US6305390B1Method for cleaning inside of chamber using RF plasmaSAMSUNG ELECTRONICS CO LTD·Filed 1998·Granted Oct 23, 2001·28 cites·6 claims
- 0859US7964473B2Method of filling an opening in the manufacturing of a semiconductor deviceSAMSUNG ELECTRONICS CO LTD·Filed 2008·Granted Jun 21, 2011·1 cites·3 claims
- 0953US12205146B2Advertisement service device and method for operating sameSK PLANET CO LTD·Filed 2021·Granted Jan 21, 2025·0 cites·6 claims
- 1053US6451694B1Control of abnormal growth in dichloro silane (DCS) based CVD polycide WSix filmsSAMSUNG ELECTRONICS CO LTD·Filed 2001·Granted Sep 17, 2002·5 cites·25 claims
- 1150US6838645B2Heater assembly for manufacturing a semiconductor deviceSAMSUNG ELECTRONICS CO LTD·Filed 2002·Granted Jan 4, 2005·3 cites·14 claims
- 1249US2016260347A1Method for providing psychological inspection serviceAURA CO LTD·Filed 2016·Application pending·0 cites
- 1349US2023081962A1Method for forming graphene barrier layer for semiconductor device and contact structure formed by the sameWONIK IPS CO LTD·Filed 2022·Application pending·0 cites
- 1448US6858062B2Residual gas removing device and method thereofSAMSUNG ELECTRONICS CO LTD·Filed 2002·Granted Feb 22, 2005·3 cites·1 claims
- 1548US6569782B2Insulating layer, semiconductor device and methods for fabricating the sameSAMSUNG ELECTRONICS CO LTD·Filed 2001·Granted May 27, 2003·2 cites·13 claims
- 1646US6730619B2Method of manufacturing insulating layer and semiconductor device including insulating layerSAMSUNG ELECTRONICS CO LTD·Filed 2002·Granted May 4, 2004·2 cites·28 claims
- 1745US2008299775A1Gapfill extension of hdp-cvd integrated process modulation sio2 processAPPLIED MATERIALS INC·Filed 2007·Application pending·0 cites
- 1845US2005160982A1Plasma enhanced semicondutor deposition apparatusFiled 2004·Application pending·0 cites
- 1944US6387776B1Method for forming trench isolation regionsSAMSUNG ELECTRONICS CO LTD·Filed 2000·Granted May 14, 2002·2 cites·17 claims
- 2044US2007197014A1Method of fabricating semiconductor deviceSAMSUNG ELECTRONICS CO LTD·Filed 2007·Application pending·0 cites
- 2143US2006060143A1Method and apparatus for forming a thin layerLEE MIN-WOO·Filed 2005·Application pending·0 cites
- 2242US11183184B2Method of configuring laundry course based on speech recognition using artificial intelligence and device of implementing thereofLG ELECTRONICS INC·Filed 2018·Granted Nov 23, 2021·0 cites·20 claims
- 2342US6124202AMethods of fabricating silicide layers and silicide contact structures in microelectronic devicesSAMSUNG ELECTRONICS CO LTD·Filed 1998·Granted Sep 26, 2000·8 cites·11 claims
- 2440US7180129B2Semiconductor device including insulating layerSAMSUNG ELECTRONICS CO LTD·Filed 2003·Granted Feb 20, 2007·0 cites·7 claims
- 2540US2014264089A1Apparatus and method for generating extreme ultra violet radiationSAMSUNG ELECTRONICS CO LTD·Filed 2013·Application pending·0 cites
- 2639US9924307B2Terminal for performing position measurement and operating method thereofSK PLANET CO LTD·Filed 2016·Granted Mar 20, 2018·0 cites·4 claims
- 2739US2003199146A1Insulating layer, semiconductor device and methods for fabricating the sameFiled 2003·Application pending·0 cites
- 2832US2002068467A1Method of fabricating PE-SiON filmFiled 2001·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →