Inventor · disambiguated record
Jianhua Zhou
Also filed as: ZHOU JIANHUA
110 granted patents·34 pending applications·1,170 citations·filing 1997–2025
99Inventor score
Files withAPPLIED MATERIALS INC69HUAWEI TECH CO LTD18ZHOU JIANHUA6SHANGHAI ASTRONOMICAL OBSERVATORY CHINESE ACAD OF SCIENCES4SHENZHEN SKYWORTH RGB ELECTRONICS CO LTD4
Top patents by PatentIndex Score
144 records- 0198US10950477B2Ceramic heater and esc with enhanced wafer edge performanceAPPLIED MATERIALS INC·Filed 2016·Granted Mar 16, 2021·280 cites·9 claims
- 0298US8911553B2Quartz showerhead for nanocure UV chamberBALUJA SANJEEV·Filed 2011·Granted Dec 16, 2014·479 cites·9 claims
- 0397US9157730B2PECVD processAPPLIED MATERIALS INC·Filed 2013·Granted Oct 13, 2015·49 cites·18 claims
- 0496US11880602B2Data writing method and storage deviceHUAWEI TECH CO LTD·Filed 2021·Granted Jan 23, 2024·2 cites·24 claims
- 0596US9458537B2PECVD processAPPLIED MATERIALS INC·Filed 2015·Granted Oct 4, 2016·12 cites·20 claims
- 0696US8772682B2Methods and apparatus for controlling temperature of a multi-zone heater in a process chamberAPPLIED MATERIALS INC·Filed 2013·Granted Jul 8, 2014·46 cites·15 claims
- 0795US10480074B2Apparatus for radical-based deposition of dielectric filmsAPPLIED MATERIALS INC·Filed 2017·Granted Nov 19, 2019·15 cites·20 claims
- 0895US9816187B2PECVD processAPPLIED MATERIALS INC·Filed 2016·Granted Nov 14, 2017·8 cites·20 claims
- 0994US10403535B2Method and apparatus of processing wafers with compressive or tensile stress at elevated temperatures in a plasma enhanced chemical vapor deposition systemAPPLIED MATERIALS INC·Filed 2015·Granted Sep 3, 2019·11 cites·17 claims
- 1094US8197636B2Systems for plasma enhanced chemical vapor deposition and bevel edge etchingSHAH ASHISH·Filed 2008·Granted Jun 12, 2012·30 cites·11 claims
- 1193US11613812B2PECVD processAPPLIED MATERIALS INC·Filed 2020·Granted Mar 28, 2023·2 cites·20 claims
- 1292US9725806B2Multi-zone pedestal for plasma processingAPPLIED MATERIALS INC·Filed 2015·Granted Aug 8, 2017·7 cites·17 claims
- 1392US8552346B2Methods and apparatus for controlling temperature of a multi-zone heater in an process chamberAMBAL HARI KISHORE·Filed 2011·Granted Oct 8, 2013·27 cites·19 claims
- 1490US10793954B2PECVD processAPPLIED MATERIALS INC·Filed 2018·Granted Oct 6, 2020·3 cites·13 claims
- 1590US10060032B2PECVD processAPPLIED MATERIALS INC·Filed 2017·Granted Aug 28, 2018·3 cites·20 claims
- 1690US9840777B2Apparatus for radical-based deposition of dielectric filmsAPPLIED MATERIALS INC·Filed 2014·Granted Dec 12, 2017·4 cites·20 claims
- 1790US9556507B2Yttria-based material coated chemical vapor deposition chamber heaterAPPLIED MATERIALS INC·Filed 2014·Granted Jan 31, 2017·4 cites·16 claims
- 1890US7904732B2Encrypting and decrypting database recordsROCKET SOFTWARE INC·Filed 2006·Granted Mar 8, 2011·35 cites·36 claims
- 1989US10697062B2Gas flow guide design for uniform flow distribution and efficient purgeAPPLIED MATERIALS INC·Filed 2018·Granted Jun 30, 2020·3 cites·19 claims
- 2088US11031262B2Loadlock integrated bevel etcher systemAPPLIED MATERIALS INC·Filed 2020·Granted Jun 8, 2021·2 cites·20 claims
- 2187US10450653B2High impedance RF filter for heater with impedance tuning deviceAPPLIED MATERIALS INC·Filed 2018·Granted Oct 22, 2019·1 cites·17 claims
- 2286US11122670B1Flying vehicle automatic lighting control system and methodHONEYWELL INT INC·Filed 2020·Granted Sep 14, 2021·5 cites·20 claims
- 2385US11898249B2PECVD processAPPLIED MATERIALS INC·Filed 2023·Granted Feb 13, 2024·0 cites·17 claims
- 2485US10879041B2Method and apparatus of achieving high input impedance without using ferrite materials for RF filter applications in plasma chambersAPPLIED MATERIALS INC·Filed 2016·Granted Dec 29, 2020·4 cites·19 claims
- 2585US9384950B2Chamber coatingsAPPLIED MATERIALS INC·Filed 2015·Granted Jul 5, 2016·4 cites·17 claims
- 2685US8274017B2Multifunctional heater/chiller pedestal for wide range wafer temperature controlYAP LIPYEOW·Filed 2009·Granted Sep 25, 2012·12 cites·20 claims
- 2784US11299805B2Plasma corrision resistive heater for high temperature processingAPPLIED MATERIALS INC·Filed 2019·Granted Apr 12, 2022·3 cites·19 claims
- 2884US10125422B2High impedance RF filter for heater with impedance tuning deviceAPPLIED MATERIALS INC·Filed 2014·Granted Nov 13, 2018·4 cites·15 claims
- 2984US8282734B2Methods to improve the in-film defectivity of PECVD amorphous carbon filmsPADHI DEENESH·Filed 2008·Granted Oct 9, 2012·6 cites·8 claims
- 3083US12443371B2Data writing method and storage deviceHUAWEI TECH CO LTD·Filed 2023·Granted Oct 14, 2025·0 cites·22 claims
- 3183US11200160B2Data processing method and apparatus, and flash deviceHUAWEI TECH CO LTD·Filed 2019·Granted Dec 14, 2021·2 cites·20 claims
- 3280US10266943B2Plasma corrosion resistive heater for high temperature processingAPPLIED MATERIALS INC·Filed 2014·Granted Apr 23, 2019·4 cites·10 claims
- 3379US10692703B2Ceramic heater with enhanced RF power deliveryAPPLIED MATERIALS INC·Filed 2017·Granted Jun 23, 2020·2 cites·15 claims
- 3479US10480077B2PEALD apparatus to enable rapid cyclingAPPLIED MATERIALS INC·Filed 2014·Granted Nov 19, 2019·1 cites·21 claims
- 3579US10153185B2Substrate temperature measurement in multi-zone heaterAPPLIED MATERIALS INC·Filed 2014·Granted Dec 11, 2018·3 cites·14 claims
- 3679US8884524B2Apparatus and methods for improving reliability of RF groundingZHOU JIANHUA·Filed 2011·Granted Nov 11, 2014·4 cites·19 claims
- 3779US7514125B2Methods to improve the in-film defectivity of PECVD amorphous carbon filmsAPPLIED MATERIALS INC·Filed 2007·Granted Apr 7, 2009·2 cites·7 claims
- 3878US8097082B2Nonplanar faceplate for a plasma processing chamberZHOU JIANHUA·Filed 2008·Granted Jan 17, 2012·4 cites·16 claims
- 3978US2025349522A1Impedance control of local areas of a substrate during plasma deposition thereon in a large pecvd chamberAPPLIED MATERIALS INC·Filed 2025·Application pending·0 cites
- 4077US10883174B2Gas diffuser mounting plate for reduced particle generationAPPLIED MATERIALS INC·Filed 2018·Granted Jan 5, 2021·2 cites·20 claims
- 4176US10310930B2Solid state disk using method and apparatusHUAWEI TECH CO LTD·Filed 2016·Granted Jun 4, 2019·2 cites·12 claims
- 4276US8778813B2Confined process volume PECVD chamberSANKARAKRISHNAN RAMPRAKASH·Filed 2011·Granted Jul 15, 2014·4 cites·17 claims
- 4375US11544001B2Method and apparatus for transmitting data processing requestHUAWEI TECH CO LTD·Filed 2020·Granted Jan 3, 2023·1 cites·16 claims
- 4475US10090187B2Multi-zone pedestal for plasma processingAPPLIED MATERIALS INC·Filed 2017·Granted Oct 2, 2018·1 cites·20 claims
- 4574US11308871B2OLED drive power supply and OLED televisionSHENZHEN SKYWORTH RGB ELECTRONICS CO LTD·Filed 2019·Granted Apr 19, 2022·2 cites·15 claims
- 4674US10636684B2Loadlock integrated bevel etcher systemAPPLIED MATERIALS INC·Filed 2019·Granted Apr 28, 2020·1 cites·20 claims
- 4773US11303842B2Mini LED television control system and methodSHENZHEN SKYWORTH RGB ELECTRONICS CO LTD·Filed 2019·Granted Apr 12, 2022·3 cites·16 claims
- 4873US10128118B2Bottom and side plasma tuning having closed loop controlAPPLIED MATERIALS INC·Filed 2013·Granted Nov 13, 2018·2 cites·18 claims
- 4973US10030306B2PECVD apparatus and processAPPLIED MATERIALS INC·Filed 2013·Granted Jul 24, 2018·1 cites·16 claims
- 5072US12394595B2Multi-antenna unit for large area inductively coupled plasma processing apparatusAPPLIED MATERIALS INC·Filed 2022·Granted Aug 19, 2025·0 cites·20 claims
Showing the top 50 of 144 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →