Inventor · disambiguated record
John A. Adamik
Also filed as: ADAMIK JOHN · ADAMIK JOHN A
10 granted patents·3,355 citations·filing 1986–2008
95Inventor score
Top patents by PatentIndex Score
10 records- 0199US5362526APlasma-enhanced CVD process using TEOS for depositing silicon oxideAPPLIED MATERIALS INC·Filed 1991·Granted Nov 8, 1994·484 cites·15 claims
- 0299US5000113AThermal CVD/PECVD reactor and use for thermal chemical vapor deposition of silicon dioxide and in-situ multi-step planarized processAPPLIED MATERIALS INC·Filed 1986·Granted Mar 19, 1991·1.1k cites·19 claims
- 0399US4892753AProcess for PECVD of silicon oxide using TEOS decompositionAPPLIED MATERIALS INC·Filed 1988·Granted Jan 9, 1990·503 cites·12 claims
- 0499US4872947ACVD of silicon oxide using TEOS decomposition and in-situ planarization processAPPLIED MATERIALS INC·Filed 1988·Granted Oct 10, 1989·522 cites·14 claims
- 0598US6167834B1Thermal CVD/PECVD reactor and use for thermal chemical vapor deposition of silicon dioxide and in-situ multi-step planarized processAPPLIED MATERIALS INC·Filed 1992·Granted Jan 2, 2001·367 cites·5 claims
- 0694US5354715AThermal chemical vapor deposition of silicon dioxide and in-situ multi-step planarized processAPPLIED MATERIALS INC·Filed 1992·Granted Oct 11, 1994·132 cites·16 claims
- 0790US5755886AApparatus for preventing deposition gases from contacting a selected region of a substrate during deposition processingAPPLIED MATERIALS INC·Filed 1995·Granted May 26, 1998·91 cites·28 claims
- 0888USRE36623EProcess for PECVD of silicon oxide using TEOS decompositionAPPLIED MATERIALS INC·Filed 1996·Granted Mar 21, 2000·79 cites·13 claims
- 0986US5871811AMethod for protecting against deposition on a selected region of a substrateAPPLIED MATERIALS INC·Filed 1995·Granted Feb 16, 1999·69 cites·45 claims
- 1085US7842931B2Extraction electrode manipulatorAXCELIS TECH INC·Filed 2008·Granted Nov 30, 2010·8 cites·20 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →