Inventor · disambiguated record
Jos De Klerk
Also filed as: DE KLERK JOS
5 granted patents·47 citations·filing 2003–2005
80Inventor score
Files withASML HOLDING NV5
Top patents by PatentIndex Score
5 records- 0192US7053990B2System to increase throughput in a dual substrate stage double exposure lithography systemASML HOLDING NV·Filed 2005·Granted May 30, 2006·17 cites·4 claims
- 0279US6876439B2Method to increase throughput in a dual substrate stage double exposure lithography systemASML HOLDING NV·Filed 2003·Granted Apr 5, 2005·15 cites·2 claims
- 0378US6781674B1System and method to increase throughput in a dual substrate stage double exposure lithography systemASML HOLDING NV·Filed 2003·Granted Aug 24, 2004·11 cites·2 claims
- 0468US7050156B2Method to increase throughput in a dual substrate stage double exposure lithography systemASML HOLDING NV·Filed 2005·Granted May 23, 2006·2 cites·9 claims
- 0552US6965427B2System to increase throughput in a dual substrate stage double exposure lithography systemASML HOLDING NV·Filed 2004·Granted Nov 15, 2005·2 cites·6 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →