Inventor · disambiguated record
Johannes Eisenmenger
Also filed as: EISENMENGER JOHANNES
16 granted patents·4 pending applications·39 citations·filing 2009–2024
90Inventor score
Top patents by PatentIndex Score
20 records- 0196US9013684B2Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatusXALTER STEFAN·Filed 2012·Granted Apr 21, 2015·17 cites·18 claims
- 0288US9874819B2Mirror arrayZEISS CARL SMT GMBH·Filed 2016·Granted Jan 23, 2018·4 cites·23 claims
- 0385US8339577B2Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatusXALTER STEFAN·Filed 2009·Granted Dec 25, 2012·9 cites·31 claims
- 0483US9910360B2Lighting system of a microlithographic projection exposure system and method for operating such a lighting systemZEISS CARL SMT GMBH·Filed 2016·Granted Mar 6, 2018·2 cites·15 claims
- 0582US10444631B2Method of operating a microlithographic projection apparatus and illumination system of such an apparatusZEISS CARL SMT GMBH·Filed 2018·Granted Oct 15, 2019·2 cites·22 claims
- 0680US9897925B2Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2015·Granted Feb 20, 2018·1 cites·18 claims
- 0779US9915872B2Optical componentZEISS CARL SMT GMBH·Filed 2015·Granted Mar 13, 2018·2 cites·22 claims
- 0873US9239229B2Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2015·Granted Jan 19, 2016·1 cites·13 claims
- 0966US9001309B2Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2014·Granted Apr 7, 2015·0 cites·30 claims
- 1065US2018246415A1Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2018·Application pending·0 cites
- 1164US9563129B2Monitor system for determining orientations of mirror elements and EUV lithography systemZEISS CARL SMT GMBH·Filed 2015·Granted Feb 7, 2017·1 cites·29 claims
- 1262US2025258437A1Euv multi-mirror arrangementZEISS CARL SMT GMBH·Filed 2024·Application pending·0 cites
- 1360US9019475B2Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2014·Granted Apr 28, 2015·0 cites·26 claims
- 1459US10274828B2Lighting system of a microlithographic projection exposure system and method for operating such a lighting systemZEISS CARL SMT GMBH·Filed 2018·Granted Apr 30, 2019·0 cites·20 claims
- 1552US9535331B2Optical system for a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2014·Granted Jan 3, 2017·0 cites·22 claims
- 1646US2010079738A1Optical measurement apparatus for a projection exposure systemZEISS CARL SMT AG·Filed 2009·Application pending·0 cites
- 1744US10018803B2Device and method for controlling positioning of multiple adjustable mirror elements in a multi-mirror arrangementZEISS CARL SMT GMBH·Filed 2016·Granted Jul 10, 2018·0 cites·20 claims
- 1844US9977334B2Lighting system of a microlithographic projection exposure system and method for operating such a lighting systemZEISS CARL SMT GMBH·Filed 2016·Granted May 22, 2018·0 cites·17 claims
- 1935US10409167B2Method for illuminating an object field of a projection exposure systemZEISS CARL SMT GMBH·Filed 2016·Granted Sep 10, 2019·0 cites·17 claims
- 2029US2016077442A1Optical componentZEISS CARL SMT GMBH·Filed 2015·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →