Inventor · disambiguated record
Joydeep Guha
Also filed as: GUHA JOYDEEP
18 granted patents·5 pending applications·656 citations·filing 2012–2018
95Inventor score
Top patents by PatentIndex Score
23 records- 0197US9972478B2Method and process of implementing machine learning in complex multivariate wafer processing equipmentLAM RES CORP·Filed 2016·Granted May 15, 2018·23 cites·14 claims
- 0297US9837286B2Systems and methods for selectively etching tungsten in a downstream reactorLAM RES CORP·Filed 2016·Granted Dec 5, 2017·104 cites·20 claims
- 0396US10622189B2Adjustable side gas plenum for edge rate control in a downstream reactorLAM RES CORP·Filed 2016·Granted Apr 14, 2020·27 cites·7 claims
- 0496US9147581B2Dual chamber plasma etcher with ion acceleratorLAM RES CORP·Filed 2013·Granted Sep 29, 2015·29 cites·12 claims
- 0596US9082826B2Methods and apparatuses for void-free tungsten fill in three-dimensional semiconductor featuresLAM RES CORP·Filed 2014·Granted Jul 14, 2015·37 cites·27 claims
- 0696US8608973B1Layer-layer etch of non volatile materials using plasmaGUHA JOYDEEP·Filed 2012·Granted Dec 17, 2013·23 cites·18 claims
- 0795US10615009B2System implementing machine learning in complex multivariate wafer processing equipmentLAM RES CORP·Filed 2018·Granted Apr 7, 2020·10 cites·16 claims
- 0895US9601319B1Systems and methods for eliminating flourine residue in a substrate processing chamber using a plasma-based processLAM RES CORP·Filed 2016·Granted Mar 21, 2017·104 cites·12 claims
- 0994US8784676B2Waferless auto conditioningGUHA JOYDEEP·Filed 2012·Granted Jul 22, 2014·278 cites·18 claims
- 1090US10134605B2Dual chamber plasma etcher with ion acceleratorLAM RES CORP·Filed 2015·Granted Nov 20, 2018·5 cites·20 claims
- 1187US9431269B2Dual chamber plasma etcher with ion acceleratorLAM RES CORP·Filed 2015·Granted Aug 30, 2016·4 cites·20 claims
- 1285US9018103B2High aspect ratio etch with combination maskLAM RES CORP·Filed 2013·Granted Apr 28, 2015·5 cites·16 claims
- 1384US9870932B1Pressure purge etch method for etching complex 3-D structuresLAM RES CORP·Filed 2016·Granted Jan 16, 2018·4 cites·19 claims
- 1467US9659783B2High aspect ratio etch with combination maskLAM RES CORP·Filed 2015·Granted May 23, 2017·1 cites·16 claims
- 1567US8895323B2Method of forming a magnetoresistive random-access memory deviceLAM RES CORP·Filed 2012·Granted Nov 25, 2014·2 cites·15 claims
- 1646US10242883B2High aspect ratio etch of oxide metal oxide metal stackLAM RES CORP·Filed 2017·Granted Mar 26, 2019·0 cites·18 claims
- 1742US2014051253A1Plasma baffle ring for a plasma processing apparatus and method of useGUHA JOYDEEP·Filed 2012·Application pending·0 cites
- 1842US2015079786A1Method and solution for cleaning metal residueLAM RES CORP·Filed 2013·Application pending·0 cites
- 1941US9514955B2Patterning of a hard mask materialLAM RES CORP·Filed 2015·Granted Dec 6, 2016·0 cites·21 claims
- 2041US2013119018A1Hybrid pulsing plasma processing systemsKANARIK KEREN JACOBS·Filed 2012·Application pending·0 cites
- 2140US9899227B2System, method and apparatus for ion milling in a plasma etch chamberLAM RES CORP·Filed 2013·Granted Feb 20, 2018·0 cites·10 claims
- 2236US2013270227A1Layer-layer etch of non volatile materialsGUHA JOYDEEP·Filed 2012·Application pending·0 cites
- 2334US2017040170A1Systems and Methods for Separately Applying Charged Plasma Constituents and Ultraviolet Light in a Mixed Mode Processing OperationLAM RES CORP·Filed 2015·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →