Inventor · disambiguated record
Johannes Hoogenraad
Also filed as: HOOGENRAAD JOHANNES · HOOGENRAAD JOHANNES H · HOOGENRAAD JOHANNES HERMAN
9 granted patents·2 pending applications·153 citations·filing 1998–2023
88Inventor score
Files withPHILIPS CORP4ASML NETHERLANDS BV33M INNOVATIVE PROPERTIES COMPANY23M INNOVATIVE PROPERTIES CO1FLANNIGAN PAUL J1
Top patents by PatentIndex Score
11 records- 0187US12070633B2Unitary respirator with molded thermoset elastomeric elements3M INNOVATIVE PROPERTIES COMPANY·Filed 2023·Granted Aug 27, 2024·0 cites·7 claims
- 0283US10065056B2Unitary respirator with molded thermoset elastomeric elements3M INNOVATIVE PROPERTIES CO·Filed 2014·Granted Sep 4, 2018·3 cites·5 claims
- 0375US8820326B2Respirator facepiece with thermoset elastomeric face sealFLANNIGAN PAUL J·Filed 2008·Granted Sep 2, 2014·10 cites·15 claims
- 0466US6230045B1Apparatus and method for localizing an object in a turbid mediumPHILIPS CORP·Filed 1998·Granted May 8, 2001·36 cites·10 claims
- 0561US6795164B2Lithographic apparatus, device manufacturing method, and device manufactured therebyASML NETHERLANDS BV·Filed 2002·Granted Sep 21, 2004·12 cites·20 claims
- 0660US11701528B2Unitary respirator with molded thermoset elastomeric elements3M INNOVATIVE PROPERTIES COMPANY·Filed 2018·Granted Jul 18, 2023·0 cites·6 claims
- 0753US6064073AMethod of localizing an object in a turbid mediumPHILIPS CORP·Filed 1998·Granted May 16, 2000·74 cites·11 claims
- 0847US2010225892A1Lithographic Apparatus and Device Manufacturing MethodASML NETHERLANDS BV·Filed 2010·Application pending·0 cites
- 0946US7756660B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2004·Granted Jul 13, 2010·1 cites·5 claims
- 1039US2002035322A1Method of localizing an object in a turbid mediumPHILIPS CORP·Filed 2001·Application pending·0 cites
- 1135US6327489B1Method of localizing an object in a turbid mediumPHILIPS CORP·Filed 1999·Granted Dec 4, 2001·17 cites·6 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →