Inventor · disambiguated record
Jonathan Joachim Jodry
Also filed as: JODRY JONATHAN JOACHIM
12 granted patents·1 pending application·81 citations·filing 2007–2013
90Inventor score
Top patents by PatentIndex Score
13 records- 0193US8435717B2Compound for photoacid generator, resist composition using the same, and pattern-forming methodHAGIWARA YUJI·Filed 2008·Granted May 7, 2013·16 cites·17 claims
- 0293US8110711B2Processes for production of 2-bromo-2,2-difluoroethanol and 2-(alkylcarbonyloxy)-1,1-difluoroethanesulfonic acid saltJODRY JONATHAN JOACHIM·Filed 2008·Granted Feb 7, 2012·15 cites·14 claims
- 0389US8581009B22-(alkylcarbonyloxy)-1, 1-difluoroethanesulfonic acid salt and method for producing the sameHAGIWARA YUJI·Filed 2008·Granted Nov 12, 2013·8 cites·4 claims
- 0489US8222448B2Processes for production of 2-bromo-2,2-difluoroethanol and 2-(alkylcarbonyloxy)-1, 1-difluoroethanesulfonic acid saltJODRY JONATHAN JOACHIM·Filed 2011·Granted Jul 17, 2012·4 cites·1 claims
- 0589US7956142B2Polymerizable sulfonic acid onium salt and resinJSR CORP·Filed 2007·Granted Jun 7, 2011·9 cites·4 claims
- 0687US7414148B2Process for producing alkoxycarbonylfluoroalkanesulfonatesCENTRAL GLASS CO LTD·Filed 2007·Granted Aug 19, 2008·7 cites·18 claims
- 0778US7906269B2Positive-type resist compositionCENTRAL GLASS CO LTD·Filed 2008·Granted Mar 15, 2011·4 cites·15 claims
- 0876US7887990B2Fluorine-containing compound, fluorine-containing polymer, postive-type resist composition, and patterning process using sameCENTRAL GLASS CO LTD·Filed 2008·Granted Feb 15, 2011·12 cites·17 claims
- 0965US8748672B22-(alkylcarbonyloxy)-1, 1-difluoroethanesulfonic acid salt and method for producing the sameCENTRAL GLASS CO LTD·Filed 2013·Granted Jun 10, 2014·0 cites·2 claims
- 1062US8187787B2Fluorine-containing compound, fluorine-containing polymer, negative-type resist composition, and patterning process using sameISONO YOSHIMI·Filed 2008·Granted May 29, 2012·6 cites·16 claims
- 1160US8513457B2Fluorine-containing compound, fluorine-containing polymer, negative-type resist composition, and patterning process using sameISONO YOSHIMI·Filed 2012·Granted Aug 20, 2013·0 cites·5 claims
- 1257US2013130175A1Compound for Photoacid Generator, Resist Composition Using the Same, and Pattern-Forming MethodCENTRAL GLASS CO LTD·Filed 2013·Application pending·0 cites
- 1352US8592622B2Polymerizable fluorine-containing compoundISONO YOSHIMI·Filed 2011·Granted Nov 26, 2013·0 cites·8 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →